公开(公告)号：US20190361360A1

公开(公告)日：2019-11-28

申请号：US16331601

申请日：2017-08-17

Applicant: ASML NETHERLANDS B.V.

Inventor： Sietse Thijmen VAN DER POST ,  Koos VAN BERKEL

IPC: G03F7/20 ,  G01N21/956

Abstract: An optical system and detector capture a distribution of radiation modified by interaction with a target structure. The observed distribution is used to calculate a property of the structure (e.g. CD or overlay). A condition error (e.g. focus error) associated with the optical system is variable between observations. The actual condition error specific to each capture is recorded and used to apply a correction for a deviation of the observed distribution due to the condition error specific to the observation. The correction in one practical example is based on a unit correction previously defined with respect to a unit focus error. This unit correction can be scaled linearly, in accordance with a focus error specific to the observation.

公开(公告)号：US20190212655A1

公开(公告)日：2019-07-11

申请号：US16279001

申请日：2019-02-19

Applicant: ASML Netherlands B.V.

Inventor： Sietse Thijmen VAN DER POST ,  Ferry ZIJP ,  Sander Bas ROOBOL

IPC: G03F7/20

CPC classification number: G03F7/705 ,  G03F7/70625 ,  G03F7/70633 ,  G03F7/7085

Abstract: A method involving a radiation intensity distribution for a target measured using an optical component at a gap from the target, the method including: determining a value of a parameter of interest using the measured radiation intensity distribution and a mathematical model describing the target, the model including an effective medium approximation for roughness of a surface of the optical component or a part thereof.

公开(公告)号：US20190101840A1

公开(公告)日：2019-04-04

申请号：US16131450

申请日：2018-09-14

Applicant: ASML Netherlands B.V.

Inventor： Sietse Thijmen VAN DER POST

IPC: G03F9/00 ,  G03F7/20

Abstract: A method of and an apparatus for use in determining one or more alignment properties of an illumination beam of radiation emitted by a radiation source are provided. The illumination beam is for irradiating a target area on a substrate in a metrology apparatus. The method comprises: (a) obtaining a first set of intensity data; (b) obtaining a second set of intensity data; (c) processing said first and second sets of intensity data to determine said one or more alignment properties of said illumination beam of radiation; wherein said processing involves comparing said first and second sets of intensity data to calculate a value which is indicative of a translation of said illumination beam of radiation.

公开(公告)号：US20180254597A1

公开(公告)日：2018-09-06

申请号：US15902454

申请日：2018-02-22

Applicant: ASML Netherlands B.V.

Inventor： Sietse Thijmen VAN DER POST ,  Sander Bas ROOBOL ,  Pavel EVTUSHENKO

IPC: H01S3/0959 ,  H01S3/00 ,  G03F7/20 ,  H01L21/263 ,  H01S3/109 ,  H01J47/02 ,  H01S3/0971

CPC classification number: H01S3/0959 ,  G03F7/70033 ,  G03F7/70641 ,  G03F7/70683 ,  H01J47/026 ,  H01L21/2636 ,  H01S3/0085 ,  H01S3/0092 ,  H01S3/09716 ,  H01S3/1095 ,  H05G2/003 ,  H05G2/008

Abstract: A radiation source arrangement causes interaction between pump radiation (340) and a gaseous medium (406) to generate EUV or soft x-ray radiation by higher harmonic generation (HHG). The operating condition of the radiation source arrangement is monitored by detecting (420/430) third radiation (422) resulting from an interaction between condition sensing radiation and the medium. The condition sensing radiation (740) may be the same as the first radiation or it may be separately applied. The third radiation may be for example a portion of the condition sensing radiation that is reflected or scattered by a vacuum-gas boundary, or it may be lower harmonics of the HHG process, or fluorescence, or scattered. The sensor may include one or more image detectors so that spatial distribution of intensity and/or the angular distribution of the third radiation may be analyzed. Feedback control based on the determined operating condition stabilizes operation of the HHG source.