公开(公告)号：US20220099498A1

公开(公告)日：2022-03-31

申请号：US17425646

申请日：2019-12-19

Applicant: ASML Netherlands B.V.

Inventor： Sietse Thijmen VAN DER POST ,  Peter Danny VAN VOORST

IPC: G01J9/00 ,  G21K1/06 ,  G01N23/207 ,  G02B5/18 ,  G02B3/00 ,  G03F7/20

Abstract: Disclosed is a wavefront sensor for measuring a tilt of a wavefront at an array of locations across a beam of radiation, wherein said wavefront sensor comprises a film, for example of Zirconium, having an indent array comprising an indent at each of said array of locations, such that each indent of the indent array is operable to perform focusing of said radiation. Also disclosed is a radiation source and inspection apparatus comprising such a wavefront sensor.

公开(公告)号：US20220221629A1

公开(公告)日：2022-07-14

申请号：US17600420

申请日：2020-03-06

Applicant: ASML Netherlands B.V.

Inventor： Han-Kwang NIENHUYS ,  Sietse Thijmen VAN DER POST

IPC: G02B5/18

Abstract: A grating is provided on a mirror for specularly reflecting and diffracting a grazing-incidence beam of radiation and has a periodic structure with a grating period comprising first (ridge) and second (trench) substructures either side of a sidewall 806 facing the incident beam 800. The ridge is configured to specularly reflect the beam from the flat top 808 of the ridge into a specularly reflected beam 810 in a zeroth-order direction β′=β. The grating is configured with fixed or varying pitch to diffract the beam from the grating periods in one or more non-zero-diffraction-order direction β′≠β. The shape of the trench may be is described by structural parameters top width and depth that define the aspect ratio of the trench. The shape is determined such that any rays (and optionally diffraction) of the beam that reflect once from the trench floor in the zeroth-order direction are obscured by the sidewall.

公开(公告)号：US20220397834A1

公开(公告)日：2022-12-15

申请号：US17774743

申请日：2020-10-20

Applicant: ASML Netherlands B.V.

Inventor： Johan REININK ,  Jeroen COTTAAR ,  Sjoerd Nicolaas Lambertus DONDERS ,  Sietse Thijmen VAN DER POST

IPC: G03F9/00 ,  G03F7/20

Abstract: Apparatus and method for measuring one or more parameters of a substrate (300) using source radiation emitted from a radiation source (100) and directed onto the substrate. The apparatus comprises at least one reflecting element (710a) and at least one detector (720, 721). The at least one reflecting element is configured to receive a reflected radiation resulting from reflection of the source radiation from the substrate and further reflect the reflected radiation into a further reflected radiation. The at least one detector is configured for measurement of the further reflected radiation for determination of at least an alignment of the source radiation and/or the substrate

公开(公告)号：US20160258810A1

公开(公告)日：2016-09-08

申请号：US15053968

申请日：2016-02-25

Applicant: ASML NETHERLANDS B.V.

Inventor： Sietse Thijmen VAN DER POST

IPC: G01J1/44 ,  G03F7/20

CPC classification number: G01J1/44 ,  G01B11/02 ,  G01J2001/444 ,  G01N21/956 ,  G02B21/0016 ,  G03F7/70325 ,  G03F7/70483 ,  G03F7/70516 ,  G03F7/70625 ,  G03F7/70633

Abstract: A method and apparatus for optical metrology is disclosed. There is disclosed, for example, a method involving a radiation intensity distribution for a target measured using an optical component at a gap from the target, the method including calculating a correction factor for the variation of radiation intensity of the radiation intensity distribution as a function of variation of the distance of the gap.

Abstract translation: 公开了一种用于光学计量学的方法和装置。 公开了例如涉及使用与目标的间隙的光学部件测定的目标的放射线强度分布的方法，所述方法包括计算作为功能的辐射强度分布的辐射强度的变化的校正因子 间隙距离的变化。

公开(公告)号：US20190212660A1

公开(公告)日：2019-07-11

申请号：US16331547

申请日：2017-08-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Nitish KUMAR ,  Adrianus Johannes Hendrikus SCHELLEKENS ,  Sietse Thijmen VAN DER POST ,  Ferry ZIJP ,  Willem Maria Julia Marcel COENE ,  Peter Danny VAN VOORST ,  Duygu AKBULUT ,  Sarathi ROY

IPC: G03F7/20

CPC classification number: G03F7/70191 ,  G03F7/70341 ,  G03F7/70516 ,  G03F7/7085 ,  G03F7/70916 ,  G03F7/70941

Abstract: An optical system delivers illuminating radiation and collects radiation after interaction with a target structure on a substrate. A measurement intensity profile is used to calculate a measurement of the property of the structure. The optical system may include a solid immersion lens. In a method, the optical system is controlled to obtain a first intensity profile using a first illumination profile and a second intensity profile using a second illumination profile. The profiles are used to derive a correction for mitigating the effect of, e.g., ghost reflections. Using, e.g., half-moon illumination profiles in different orientations, the method can measure ghost reflections even where a solid immersion lens would cause total internal reflection. The optical system may include a contaminant detection system to control a movement based on received scattered detection radiation. The optical system may include an optical component having a dielectric coating to enhance evanescent wave interaction.

公开(公告)号：US20190107786A1

公开(公告)日：2019-04-11

申请号：US16144013

申请日：2018-09-27

Applicant: ASML Netherlands B.V.

Inventor： Johan Maria VAN BOXMEER ,  Marinus Johannes Maria VAN DAM ,  Koos VAN BERKEL ,  Sietse Thijmen VAN DER POST ,  Johannes Hubertus Antonius VAN DE RIJDT

IPC: G03F7/20 ,  G01N21/88 ,  G01N21/47 ,  G01J3/18

Abstract: Disclosed is a method of optimizing within an inspection apparatus, the position and/or size (and therefore focus) of a measurement illumination spot relative to a target on a substrate. The method comprises detecting scattered radiation from at least the target resultant from illuminating the target, for different sizes and/or positions of said illumination spot relative to the target; and optimizing said position and/or size of the measurement illumination spot relative to the target based on a characteristic of the detected scattered radiation for the different sizes and/or positions of said illumination spot relative to the target.

公开(公告)号：US20190072853A1

公开(公告)日：2019-03-07

申请号：US16117589

申请日：2018-08-30

Applicant: ASML Netherlands B.V.

Inventor： Sietse Thijmen VAN DER POST ,  Stefan Michael Bruno BÄUMER ,  Peter Danny VAN VOORST ,  Teunis Willem TUKKER ,  Ferry ZIJP ,  Han-Kwang NIENHUYS ,  Jacobus Maria Antonius VAN DEN EERENBEEMD

IPC: G03F7/20 ,  G21K1/06 ,  G01N21/47 ,  G01N21/95

Abstract: An optical system (OS) for focusing a beam of radiation (B) on a region of interest in a metrology apparatus is described. The beam of radiation (B) comprises radiation in a soft X-ray or Extreme Ultraviolet spectral range. The optical system (OS) comprises a first stage (S1) for focusing the beam of radiation at an intermediate focus region. The optical system (OS) comprises a second stage (S2) for focusing the beam of radiation from the intermediate focus region onto the region of interest. The first and second stages each comprise a Kirkpatrick-Baez reflector combination. At least one reflector comprises an aberration-correcting reflector.

公开(公告)号：US20180188658A1

公开(公告)日：2018-07-05

申请号：US15580500

申请日：2016-07-05

Applicant: ASML Netherlands B.V.

Inventor： Sietse Thijmen VAN DER POST ,  Ferry ZIJP ,  Sander Bas ROOBOL

IPC: G03F7/20

CPC classification number: G03F7/70633 ,  G03F7/705 ,  G03F7/70625 ,  G03F7/7085

Abstract: A method involving a radiation intensity distribution for a target measured using an optical component at a gap from the target, the method including: determining a value of a parameter of interest using the measured radiation intensity distribution and a mathematical model describing the target, the model including an effective medium approximation for roughness of a surface of the optical component or a part thereof.

公开(公告)号：US20170102620A1

公开(公告)日：2017-04-13

申请号：US15286319

申请日：2016-10-05

Applicant: ASML NETHERLANDS B.V.

Inventor： Ferry ZIJP ,  Sietse Thijmen VAN DER POST ,  Fanhe KONG ,  Duygu AKBULUT

IPC: G03F7/20

CPC classification number: G03F7/70133 ,  G01N21/956 ,  G02B21/242 ,  G03F7/70625 ,  G03F7/70633

Abstract: A method including obtaining a plurality of radiation distributions of measurement radiation redirected by the target, each of the plurality of radiation distributions obtained at a different gap distance between the target and an optical element of a measurement apparatus, the optical element being the nearest optical element to the target used to provide the measurement radiation to the target, and determining a parameter related to the target using data of the plurality of radiation distributions in conjunction with a mathematical model describing the measurement target.

公开(公告)号：US20220134693A1

公开(公告)日：2022-05-05

申请号：US17433774

申请日：2020-01-28

Applicant: ASML Netherlands B.V.

Inventor： Sander Bas ROOBOL ,  Sietse Thijmen VAN DER POST

IPC: B29D11/00 ,  G03F7/20 ,  G03F7/00

Abstract: Disclosed is a method of manufacturing a reflector. The method comprises polishing (520) at least the uppermost surface of the uppermost substantially flat substrate of a plurality of substantially flat substrates, deforming (530) each substantially flat substrate into the desired shape, and bonding (540) the deformed substrates together to form said reflector. In an embodiment, the deforming and bonding is performed together using a mold.