公开(公告)号：US20200088659A1

公开(公告)日：2020-03-19

申请号：US16574970

申请日：2019-09-18

Applicant: ASML Netherlands B.V.

Inventor： Long MA ,  Chih-Yu JEN ,  Zhonghua DONG ,  Peilei ZHANG ,  Wei FANG ,  Chuan LI

IPC: G01N23/2251 ,  H01J37/28

Abstract: An improved charged particle beam inspection apparatus, and more particularly, a particle beam apparatus for inspecting a wafer including an improved scanning mechanism for detecting fast-charging defects is disclosed. An improved charged particle beam inspection apparatus may include a charged particle beam source that delivers charged particles to an area of the wafer and scans the area. The improved charged particle beam apparatus may further include a controller including a circuitry to produce multiple images of the area over a time sequence, which are compared to detect fast-charging defects.

公开(公告)号：US20230178328A1

公开(公告)日：2023-06-08

申请号：US17913141

申请日：2021-03-18

Applicant: ASML Netherlands B.V.

Inventor： Yongxin WANG ,  Zhonghua DONG ,  Xiaoyu JI ,  Shahedul HOQUE ,  Weiming REN ,  Xuedong LIU ,  Guofan YE ,  Kuo-Chin CHIEN

IPC: H01J37/147

CPC classification number: H01J37/1474 ,  H01J2237/1504

Abstract: An apparatus includes a first charged particle beam manipulator positioned in a first layer configured to influence a charged particle beam and a second charged particle beam manipulator positioned in a second layer configured to influence the charged particle beam. The first and second charged particle beam manipulators may each include a plurality of electrodes having a first set of opposing electrodes and a second set of opposing electrodes. A first driver system electrically connected to the first set may be configured to provide a plurality of discrete output states to the first set. A second driver system electrically connected to the second set may be configured to provide a plurality of discrete output states to the second set. The first and second charged-particle beam manipulators may each comprise a plurality of segments; and a controller having circuitry configured to individually control operation of each of the plurality of segments.

公开(公告)号：US20230005707A1

公开(公告)日：2023-01-05

申请号：US17944121

申请日：2022-09-13

Applicant: ASML Netherlands B.V.

Inventor： Yongxin WANG ,  Zhonghua DONG ,  Rui-Ling LAI

IPC: H01J37/244 ,  H01L27/146

Abstract: Systems and methods for implementing a detector array are disclosed. According to certain embodiments, a substrate comprises a plurality of sensing elements including a first element and a second element. The detector comprises a switching element configured to connect the first element and the second element. The switching region may be controlled based on signals generated in response to the sensing elements receiving electrons with a predetermined amount of energy.

公开(公告)号：US20220415608A1

公开(公告)日：2022-12-29

申请号：US17856848

申请日：2022-07-01

Applicant: ASML NETHERLANDS B.V.

Inventor： Yongxin WANG ,  Zhonghua DONG ,  Rui-Ling LAI

IPC: H01J37/244 ,  H01L27/146

Abstract: Systems and methods for implementing a detector array are disclosed. According to certain embodiments, a substrate comprises a plurality of sensing elements including a first element and a second element, and a switching region therebetween configured to connect the first element and the second element. The switching region may be controlled based on signals generated in response to the sensing elements receiving electrons with a predetermined amount of energy.

公开(公告)号：US20220375716A1

公开(公告)日：2022-11-24

申请号：US17713189

申请日：2022-04-04

Applicant: ASML Netherlands B.V.

Inventor： Yongxin WANG ,  Weiming REN ,  Zhonghua DONG ,  Zhongwei CHEN

IPC: H01J37/244 ,  H01J37/28 ,  G01N23/2251

Abstract: Systems and methods are provided for charged particle detection. The detection system can comprise a signal processing circuit configured to generate a set of intensity gradients based on electron intensity data received from a plurality of electron sensing elements. The detection system can further comprise a beam spot processing module configured to determine, based on the set of intensity gradients, at least one boundary of a beam spot; and determine, based on the at least one boundary, that a first set of electron sensing elements of the plurality of electron sensing elements is within the beam spot. The beam spot processing module can further be configured to determine an intensity value of the beam spot based on the electron intensity data received from the first set of electron sensing elements and also generate an image of a wafer based on the intensity value.

公开(公告)号：US20220301811A1

公开(公告)日：2022-09-22

申请号：US17633176

申请日：2020-08-20

Applicant: ASML Netherlands B.V.

Inventor： Wei FANG ,  Lingling PU ,  Bo WANG ,  Zhonghua DONG ,  Yongxin WANG

IPC: H01J37/22 ,  H01J37/244 ,  H01J37/28 ,  G01N23/2251 ,  G06T5/00 ,  G06T5/50

Abstract: An improved apparatus and method for enhancing an image, and more particularly an apparatus and method for enhancing an image through cross-talk cancellation in a multiple charged-particle beam inspection are disclosed. An improved method for enhancing an image includes acquiring a first image signal of a plurality of image signals from a detector of a multi-beam inspection system. The first image signal corresponds to a detected signal from a first region of the detector on which electrons of a first secondary electron beam and of a second secondary electron beam are incident. The method includes reducing, from the first image signal, cross-talk contamination originating from the second secondary electron beam using a relationship between the first image signal and beam intensities associated with the first secondary electron beam and the second secondary electron beam. The method further includes generating a first image corresponding to first secondary electron beam after reduction.

公开(公告)号：US20200271598A1

公开(公告)日：2020-08-27

申请号：US16812109

申请日：2020-03-06

Applicant: ASML Netherlands B.V.

Inventor： Kuo-Feng TSENG ,  Zhonghua DONG ,  Yixiang WANG ,  Zhong-wei CHEN

IPC: G01N23/203 ,  G01N23/2276 ,  G01N23/2254 ,  G01N23/2252

Abstract: Disclosed herein is an apparatus comprising: a source configured to emit charged particles, an optical system and a stage; wherein the stage is configured to support a sample thereon and configured to move the sample by a first distance in a first direction; wherein the optical system is configured to form probe spots on the sample with the charged particles; wherein the optical system is configured to move the probe spots by the first distance in the first direction and by a second distance in a second direction, simultaneously, while the stage moves the sample by the first distance in the first direction; wherein the optical system is configured to move the probe spots by the first distance less a width of one of the probe spots in an opposite direction of the first direction, after the stage moves the sample by the first distance in the first direction.