公开(公告)号：US20200379360A1

公开(公告)日：2020-12-03

申请号：US16071380

申请日：2017-01-26

Applicant: ASML NETHERLANDS B.V.

Inventor： Han-Kwang Nienhuys ,  Gunes Nakiboglu ,  Rita Marguerite Albin Lambertine Petit ,  Hermen Folken Pen ,  Remco Yuri Van de Moesdijk ,  Frank Johannes Jacobus Van Boxtel ,  Borgert Kruizinga

IPC: G03F7/20 ,  G03F1/84

Abstract: A measurement system to determine a deformation of an object having a front surface, a back surface and a pattern. The measurement system includes a processor system and an interferometer system. The interferometer system has a radiation source and a detector system. The source is configured to emit, to each of a plurality of locations on the object, measurement beams in order to generate, at each of the respective plurality of locations, reflected measurement beams off the front and back surfaces of the object respectively. The detector system is configured to receive the respective reflected measurement beams and output signals representative of the received reflected measurement beams to the processor system. The processor system is configured to receive the signals; determine, based on the signals as received, a characteristic of the object; and determine a deformation of the pattern based on the characteristic.

公开(公告)号：US10114295B2

公开(公告)日：2018-10-30

申请号：US15520193

申请日：2015-10-13

Applicant: ASML NETHERLANDS B.V.

Inventor： Günes Nakiboglu ,  Jan Steven Christiaan Westerlaken ,  Frank Johannes Jacobus Van Boxtel ,  Maria del Carmen Mercado ,  Thibault Simon Mathieu Laurent

IPC: G03F7/20 ,  G03F9/00

Abstract: A lithographic apparatus including: a projection system to project radiation onto a substrate supported on a substrate stage, during an exposure phase; a sensing system to sense a property of the substrate on the stage during a sensing phase; and a positioning system to determine a position of the stage relative to a reference system via a radiation path between the stage and the reference system, wherein the apparatus is configured to control stage movement relative to the reference system in the sensing phase and to control other movement relative to the reference system during the exposure phase; the stage or reference system having an outlet to provide a gas curtain to reduce ingress of ambient gas into the path; and the apparatus is operative such that a characteristic of the gas curtain is different in at least part of the sensing phase compared to in the exposure phase.

公开(公告)号：US11048178B2

公开(公告)日：2021-06-29

申请号：US16772444

申请日：2018-11-22

Applicant: ASML NETHERLANDS B.V.

Inventor： Federico La Torre ,  Laurentius Johannes Adrianus Van Bokhoven ,  José Nilton Fonseca, Jr. ,  Gerben Pieterse ,  Erik Henricus Egidius Catharina Eummelen ,  Frank Johannes Jacobus Van Boxtel

IPC: G03F7/20

Abstract: A plate to be positioned between a movable stage and a projection system of a lithographic apparatus, the plate having a surface to face the movable stage; an opening through the plate for passage of patterned radiation beam; one or more gas outlets in a side of the opening and in the surface of the plate, wherein the one or more gas outlets are configured to supply gas to a region between the movable stage and the projection system, wherein all of the one or more gas outlets in the surface of the plate are positioned such that, for each of such one or more gas outlets, a line that is both orthogonal to the surface and intersects the gas outlet does not intersect the patterning device at any point during the entire range of movement of the patterning device.

公开(公告)号：US11036148B2

公开(公告)日：2021-06-15

申请号：US16700586

申请日：2019-12-02

Applicant: ASML NETHERLANDS B.V.

Inventor： Hakki Ergün Cekli ,  Güneş Nakìbo{hacek over (g)}lu ,  Frank Johannes Jacobus Van Boxtel ,  Jean-Philippe Xavier Van Damme ,  Richard Johannes Franciscus Van Haren

IPC: G03F7/20

Abstract: A patterning device cooling system for thermally conditioning a patterning device of a lithographic apparatus, wherein the patterning device in use, is being irradiated by exposure radiation, wherein the patterning device cooling system comprises: a thermal conditioner configured to thermally condition the patterning device; and a controller configured to control the thermal conditioner to thermally condition the patterning device dependent on an amount of the exposure radiation absorbed by the patterning device.

公开(公告)号：US10345717B2

公开(公告)日：2019-07-09

申请号：US15959115

申请日：2018-04-20

Applicant: ASML Netherlands B.V.

Inventor： Günes Nakiboglu ,  Suzanne Johanna Antonetta Geertruda Cosijns ,  Anne Willemijn Bertine Quist ,  Lukasz Sosniak ,  Frank Johannes Jacobus Van Boxtel ,  Engelbertus Antonius Fransiscus Van Der Pasch

IPC: G03F7/20

Abstract: A lithographic apparatus includes an optical sensor, a movable body, a support, a deflector system, a first drive system and a second drive system. The movable body is moveable relative to the sensor. The support is for holding the sensor. The first drive system is arranged to move the movable body relative to the sensor. The second drive system is arranged to move the first drive system relative to the sensor. The second drive system is arranged to move the deflector system relative to the sensor. A disturbance is induced by a movement of the movable body. The deflector system is arranged to create a deflecting area for reflecting the disturbance away from the support.

公开(公告)号：US10222707B2

公开(公告)日：2019-03-05

申请号：US15054010

申请日：2016-02-25

Applicant: ASML NETHERLANDS B.V.

Inventor： Theodorus Wilhelmus Polet ,  Henrikus Herman Marie Cox ,  Ronald Van Der Ham ,  Wilhelmus Franciscus Johannes Simons ,  Jimmy Matheus Wilhelmus Van De Winkel ,  Gregory Martin Mason Corcoran ,  Frank Johannes Jacobus Van Boxtel

IPC: G03F7/20

Abstract: A lithographic apparatus having: a substrate table constructed to hold a substrate; a projection system configured to project a patterned radiation beam onto a target portion of the substrate; a substrate surface actuator including a fluid opening for fluid flow therethrough from/onto a facing surface facing the substrate surface actuator to generate a force between the substrate surface actuator and the facing surface, the facing surface being a top surface of the substrate or a surface substantially co-planar with the substrate; and a position controller to control the position and/or orientation of a part of the facing surface by varying fluid flow through the fluid opening to displace the part of the facing surface relative to the projection system.

公开(公告)号：US09977348B2

公开(公告)日：2018-05-22

申请号：US15502466

申请日：2015-06-25

Applicant: ASML Netherlands B.V.

Inventor： Günes Nakiboglu ,  Suzanne Johanna Antonetta Geertruda Cosijns ,  Anne Willemijn Bertine Quist ,  Lukasz Sosniak ,  Frank Johannes Jacobus Van Boxtel ,  Engelbertus Antonius Fransiscus Van Der Pasch

IPC: G03F7/20

CPC classification number: G03F7/7085 ,  G03F7/70775 ,  G03F7/709

Abstract: A lithographic apparatus includes an optical sensor, a movable body, a support, a deflector system, a first drive system and a second drive system. The movable body is moveable relative to the sensor. The support is for holding the sensor. The first drive system is arranged to move the movable body relative to the sensor. The second drive system is arranged to move the first drive system relative to the sensor. The second drive system is arranged to move the deflector system relative to the sensor. A disturbance is induced by a movement of the movable body. The deflector system is arranged to create a deflecting area for reflecting the disturbance away from the support.

公开(公告)号：US11762304B2

公开(公告)日：2023-09-19

申请号：US15570934

申请日：2016-03-29

Applicant: ASML Netherlands B.V.

Inventor： Güneş Nak{dot over (i)}boğlu ,  Maarten Holtrust ,  Martinus Van Duijnhoven ,  Francis Fahrni ,  Frank Johannes Jacobus Van Boxtel ,  Anne Willemijn Bertine Quist ,  Bart Dinand Paarhuis ,  Daan Daniel Johannes Antonius Van Sommeren

IPC: G03F7/20 ,  G03F7/00

CPC classification number: G03F7/70858 ,  G03F7/709 ,  G03F7/70308 ,  G03F7/70883 ,  G03F7/70891

Abstract: A lithographic apparatus has: a conduit through which a gas can flow; a gas mover configured to cause the gas to flow in the conduit; a wall in contact with the gas in the conduit and defining a membrane aperture therein; and an acoustic filter including a flexible membrane fixed in the membrane aperture. The acoustic filter reduces transmission of acoustic disturbances without adding any flow resistance.

公开(公告)号：US11009800B2

公开(公告)日：2021-05-18

申请号：US16071380

申请日：2017-01-26

Applicant: ASML NETHERLANDS B.V.

Inventor： Han-Kwang Nienhuys ,  Güneş Nakiboğlu ,  Rita Marguerite Albin Lambertine Petit ,  Hermen Folken Pen ,  Remco Yuri Van De Moesdijk ,  Frank Johannes Jacobus Van Boxtel ,  Borgert Kruizinga

IPC: G03F7/20 ,  G03F1/84

Abstract: A measurement system to determine a deformation of an object having a front surface, a back surface and a pattern. The measurement system includes a processor system and an interferometer system. The interferometer system has a radiation source and a detector system. The source is configured to emit, to each of a plurality of locations on the object, measurement beams in order to generate, at each of the respective plurality of locations, reflected measurement beams off the front and back surfaces of the object respectively. The detector system is configured to receive the respective reflected measurement beams and output signals representative of the received reflected measurement beams to the processor system. The processor system is configured to receive the signals; determine, based on the signals as received, a characteristic of the object; and determine a deformation of the pattern based on the characteristic.

公开(公告)号：US10133197B2

公开(公告)日：2018-11-20

申请号：US15325987

申请日：2015-06-08

Applicant: ASML Netherlands B.V.

Inventor： Günes Nakiboglu ,  Frank Johannes Jacobus Van Boxtel ,  Thomas Petrus Hendricus Warmerdam ,  Jan Steven Christiaan Westerlaken ,  Johannes Pieter Kroes

IPC: G03B27/42 ,  G03F7/20

Abstract: A lithographic apparatus including: a projection system with an optical axis; an enclosure with an ambient gas; and a physical component accommodated in the enclosure, wherein: the lithographic apparatus is configured to cause the physical component to undergo movement relative to the enclosure, in a predetermined direction and in a plane perpendicular to the optical axis; the lithographic apparatus is configured to let the physical component maintain a predetermined orientation with respect to the enclosure during the movement; the movement induces a flow of the ambient gas relative to the component; the physical component has a surface oriented perpendicularly to the optical axis; the component includes a flow direction system configured to direct the flow of ambient gas away from the surface.