公开(公告)号：US20160363873A1

公开(公告)日：2016-12-15

申请号：US15250579

申请日：2016-08-29

Applicant: ASML NETHERLANDS B.V.

Inventor： Hans JANSEN ,  Marco Koert Stavenga ,  Jacobus Johannus Leonardus Hendricus Verspay ,  Franciscus Johannes Joseph Janssen ,  Anthorie Kuijper

IPC: G03F7/20

CPC classification number: G03F7/70858 ,  G03F7/2041 ,  G03F7/70341

Abstract: An immersion liquid is provided comprising an ion-forming component, e.g. an acid or a base, which has a relatively high vapor pressure. Also provided are lithography processes and lithography systems using the immersion liquid.

公开(公告)号：US12197140B2

公开(公告)日：2025-01-14

申请号：US17565144

申请日：2021-12-29

Applicant: ASML NETHERLANDS B.V.

Inventor： Marco Koert Stavenga ,  Sergei Shulepov ,  Koen Steffens ,  Matheus Anna Karel Van Lierop ,  Samuel Bertrand Dominique David ,  David Bessems

IPC: G03F7/00 ,  H01L21/68 ,  H01L21/687

Abstract: A substrate table for an immersion lithographic apparatus is disclosed having a recess, configured to receive a substrate of a given size, and a fluid extraction system, configured to extract fluid from a gap between the edge of the substrate and the edge of the recess, the fluid extraction system configured such that the rate of flow of fluid extracted from a localized section of the gap is greater than the rate of flow of fluid extracted from another section of the gap.

公开(公告)号：US12072635B2

公开(公告)日：2024-08-27

申请号：US17531953

申请日：2021-11-22

Applicant: ASML NETHERLANDS B.V.

Inventor： Christian Gerardus Norbertus Hendricus Marie Cloin ,  Nicolaas Ten Kate ,  Nicolaas Rudolf Kemper ,  Marco Koert Stavenga ,  Erik Henricus Egidius Catharina Eummelen ,  Michel Riepen ,  Olga Vladimirovna Elisseeva ,  Tijmen Wilfred Mathijs Gunther ,  Michael Christiaan Van Der Wekken

IPC: G03F7/00

CPC classification number: G03F7/70341 ,  G03F7/707 ,  G03F7/70716 ,  G03F7/70733

Abstract: A lithographic projection apparatus is disclosed that includes a table, a shutter member, a fluid handling structure, and a fluid extraction system. The fluid handling structure may be configured to supply and confine liquid between a projection system and (i) a substrate, or (ii) the table, or (iii) a surface of the shutter member, or (iv) a combination selected from (i)-(iii). The surface of the shutter member may adjoin and be co-planar with a surface of the table. The surfaces of the shutter member and the table may be spaced apart by a gap. The fluid extraction system may be configured to remove liquid from the gap.

公开(公告)号：US11215933B2

公开(公告)日：2022-01-04

申请号：US16657267

申请日：2019-10-18

Applicant: ASML NETHERLANDS B.V.

Inventor： Marco Koert Stavenga ,  Sergei Shulepov ,  Koen Steffens ,  Matheus Anna Karel Van Lierop ,  Samuel Bertrand Dominique David ,  David Bessems

IPC: G03F7/20 ,  H01L21/687 ,  H01L21/68

Abstract: A substrate table for an immersion lithographic apparatus is disclosed having a recess, configured to receive a substrate of a given size, and a fluid extraction system, configured to extract fluid from a gap between the edge of the substrate and the edge of the recess, the fluid extraction system configured such that the rate of flow of fluid extracted from a localized section of the gap is greater than the rate of flow of fluid extracted from another section of the gap.

公开(公告)号：US10509326B2

公开(公告)日：2019-12-17

申请号：US15624419

申请日：2017-06-15

Applicant: ASML NETHERLANDS B.V.

Inventor： Hans Jansen ,  Johannes Jacobus Matheus Baselmans ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Jeroen Johannes Sophia Maria Mertens ,  Johannes Catharinus Hubertus Mulkens ,  Marco Koert Stavenga ,  Bob Streefkerk ,  Jan Cornelis Van Der Hoeven ,  Cedric Desire Grouwstra

IPC: G03B27/42 ,  G03F7/20

Abstract: A method and apparatus for cleaning the inside of an immersion lithographic apparatus is disclosed. In particular, a liquid supply system of the lithographic apparatus may be used to introduce a cleaning fluid into a space between the projection system and the substrate table of the lithographic apparatus. Additionally or alternatively, a cleaning device may be provided on the substrate table and an ultrasonic emitter may be provided to create an ultrasonic cleaning liquid.

公开(公告)号：US10274832B2

公开(公告)日：2019-04-30

申请号：US15971065

申请日：2018-05-04

Applicant: ASML NETHERLANDS B.V.

Inventor： Jacobus Johannus Leonardus Hendricus Verspay ,  Hans Jansen ,  Marco Koert Stavenga

IPC: G03F7/20

Abstract: In an immersion lithography apparatus in which immersion liquid is supplied to a localized space, the space is substantially polygonal in plan substantially parallel to the substrate. In an embodiment, two corners of the space have a radius of curvature no greater than the width of a transition zone between the space configured to contain liquid and a surrounding configured not to contain liquid.

公开(公告)号：US20170285488A1

公开(公告)日：2017-10-05

申请号：US15624419

申请日：2017-06-15

Applicant: ASML NETHERLANDS B.V.

Inventor： Hans Jansen ,  Johannes Jacobus Matheus Baselmans ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Jeroen Johannes Sophia Maria Mertens ,  Johannes Catharinus Huberts Mulkens ,  Marco Koert Stavenga ,  Bob Streefkerk ,  Jan Cornelis Van Der Hoeven ,  Cedric Desire Grouwstra

IPC: G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70925

Abstract: A method and apparatus for cleaning the inside of an immersion lithographic apparatus is disclosed. In particular, a liquid supply system of the lithographic apparatus may be used to introduce a cleaning fluid into a space between the projection system and the substrate table of the lithographic apparatus. Additionally or alternatively, a cleaning device may be provided on the substrate table and an ultrasonic emitter may be provided to create an ultrasonic cleaning liquid.

公开(公告)号：US09164391B2

公开(公告)日：2015-10-20

申请号：US14504130

申请日：2014-10-01

Applicant: ASML NETHERLANDS B.V.

Inventor： Hans Jansen ,  Marco Koert Stavenga ,  Jacobus Johannus Leonardus Hendricus Verspay ,  Franciscus Johannes Joseph Janssen ,  Anthonie Kuijper

IPC: H01L21/67 ,  G03F7/20

CPC classification number: G03F7/70858 ,  G03F7/2041 ,  G03F7/70341

Abstract: An immersion liquid is provided comprising an ion-forming component, e.g. an acid or a base, which has a relatively high vapor pressure. Also provided are lithography processes and lithography systems using the immersion liquid.

Abstract translation: 提供了一种浸没液体，其包括离子形成组分，例如 酸或碱，其具有较高的蒸气压。 还提供了使用浸液的光刻工艺和光刻系统。

公开(公告)号：US20220082948A1

公开(公告)日：2022-03-17

申请号：US17531953

申请日：2021-11-22

Applicant: ASML NETHERLANDS B.V.

Inventor： Christian Gerardus Norbertus Hendricus Marie CLOIN ,  Nicolaas Ten Kate ,  Nicolaas Rudolf Kemper ,  Marco Koert Stavenga ,  Erik Henricus Egidius Catharina Eummelen ,  Michel Riepen ,  Olga Vladimirovna Elisseeva ,  Tijmen Wilfred Mathijs Gunther ,  Michael Christiaan Van Der Wekken

IPC: G03F7/20

Abstract: A lithographic projection apparatus is disclosed that includes a table, a shutter member, a fluid handling structure, and a fluid extraction system. The fluid handling structure may be configured to supply and confine liquid between a projection system and (i) a substrate, or (ii) the table, or (iii) a surface of the shutter member, or (iv) a combination selected from (i)-(iii). The surface of the shutter member may adjoin and be co-planar with a surface of the table. The surfaces of the shutter member and the table may be spaced apart by a gap. The fluid extraction system may be configured to remove liquid from the gap.

公开(公告)号：US10712675B2

公开(公告)日：2020-07-14

申请号：US15707703

申请日：2017-09-18

Applicant: ASML NETHERLANDS B.V.

Inventor： Hans Jansen ,  Marco Koert Stavenga ,  Jacobus Johannus Leonardus Hendricus Verspay ,  Franciscus Johannes Joseph Janssen ,  Anthonie Kuijper

IPC: G03F7/20

Abstract: An immersion liquid is provided comprising an ion-forming component, e.g. an acid or a base, which has a relatively high vapor pressure. Also provided are lithography processes and lithography systems using the immersion liquid.