公开(公告)号：US12174550B2

公开(公告)日：2024-12-24

申请号：US17782268

申请日：2020-12-11

Applicant: ASML Netherlands B.V.

Inventor： Daniel Jason Riggs ,  Liane Manuela Matthes ,  Rilpho Ludovicus Donker ,  Martinus Hendrikus Antonius Leenders

IPC: G01B11/24 ,  G03F7/00 ,  H05G2/00

Abstract: A metrology system includes a light beam metrology apparatus configured to sense one or more aspects of an amplified light beam and to make adjustments to the amplified light beam based on the sensed one or more aspects; a target metrology apparatus configured to measure one or more properties of a modified target after a target has interacted with the amplified light beam, and to determine a moment when the modified target achieves a reference calibration state; and a control apparatus configured to: receive the reference calibration state and the moment at which the reference calibration state is achieved from the target metrology apparatus; determine a light beam calibration state of the amplified light beam based on the received reference calibration state and the moment at which the reference calibration state is achieved; and provide the light beam calibration state to the light beam metrology apparatus.

公开(公告)号：US20200260564A1

公开(公告)日：2020-08-13

申请号：US16859042

申请日：2020-04-27

Applicant: ASML Netherlands B.V.

Inventor： Daniel Jason Riggs ,  Robert Jay Rafac

IPC: H05G2/00

Abstract: A method includes providing a target material that comprises a component that emits extreme ultraviolet (EUV) light when converted to plasma; directing a first beam of radiation toward the target material to deliver energy to the target material to modify a geometric distribution of the target material to form a modified target; directing a second beam of radiation toward the modified target, the second beam of radiation converting at least part of the modified target to plasma that emits EUV light; measuring one or more characteristics associated with one or more of the target material and the modified target relative to the first beam of radiation; and controlling an amount of radiant exposure delivered to the target material from the first beam of radiation based on the one or more measured characteristics to within a predetermined range of energies.

公开(公告)号：US20190254152A1

公开(公告)日：2019-08-15

申请号：US16391890

申请日：2019-04-23

Applicant: ASML Netherlands B.V.

Inventor： Daniel Jason Riggs ,  Robert Jay Rafac

IPC: H05G2/00

CPC classification number: H05G2/008

Abstract: A method includes providing a target material that comprises a component that emits extreme ultraviolet (EUV) light when converted to plasma; directing a first beam of radiation toward the target material to deliver energy to the target material to modify a geometric distribution of the target material to form a modified target; directing a second beam of radiation toward the modified target, the second beam of radiation converting at least part of the modified target to plasma that emits EUV light; measuring one or more characteristics associated with one or more of the target material and the modified target relative to the first beam of radiation; and controlling an amount of radiant exposure delivered to the target material from the first beam of radiation based on the one or more measured characteristics to within a predetermined range of energies.

公开(公告)号：US20180139831A1

公开(公告)日：2018-05-17

申请号：US15724104

申请日：2017-10-03

Applicant: ASML Netherlands B.V.

Inventor： Daniel Jason Riggs ,  Robert Jay Rafac

IPC: H05G2/00

CPC classification number: H05G2/008

Abstract: A method includes providing a target material that comprises a component that emits extreme ultraviolet (EUV) light when converted to plasma; directing a first beam of radiation toward the target material to deliver energy to the target material to modify a geometric distribution of the target material to form a modified target; directing a second beam of radiation toward the modified target, the second beam of radiation converting at least part of the modified target to plasma that emits EUV light; measuring one or more characteristics associated with one or more of the target material and the modified target relative to the first beam of radiation; and controlling an amount of radiant exposure delivered to the target material from the first beam of radiation based on the one or more measured characteristics to within a predetermined range of energies.

公开(公告)号：US09713240B2

公开(公告)日：2017-07-18

申请号：US14824147

申请日：2015-08-12

Applicant: ASML Netherlands B.V.

Inventor： Daniel Jason Riggs ,  Robert Jay Rafac

IPC: H05G2/00

CPC classification number: H05G2/008 ,  H05G2/003

Abstract: A method includes providing a target material that includes a component that emits extreme ultraviolet (EUV) light when converted to plasma; directing a first beam of radiation toward the target material to deliver energy to the target material to modify a geometric distribution of the target material to form a modified target; directing a second beam of radiation toward the modified target, the second beam of radiation converting at least part of the modified target to plasma that emits EUV light; controlling a radiant exposure delivered to the target material from the first beam of radiation to within a predetermined range of radiant exposures; and stabilizing a power of the EUV light emitted from the plasma by controlling the radiant exposure delivered to the target material from the first beam of radiation to within the predetermined range of radiant exposures.

公开(公告)号：US20250085641A1

公开(公告)日：2025-03-13

申请号：US18960519

申请日：2024-11-26

Applicant: ASML Netherlands B.V.

Inventor： Daniel Jason Riggs ,  Liane Manuela Matthes ,  Rilpho Ludovicus Donker ,  Martinus Hendrikus Antonius Leenders

IPC: G03F7/00 ,  G01B11/24 ,  H05G2/00

Abstract: A metrology system includes a light beam metrology apparatus configured to sense one or more aspects of an amplified light beam and to make adjustments to the amplified light beam based on the sensed one or more aspects; a target metrology apparatus configured to measure one or more properties of a modified target after a target has interacted with the amplified light beam, and to determine a moment when the modified target achieves a reference calibration state; and a control apparatus configured to: receive the reference calibration state and the moment at which the reference calibration state is achieved from the target metrology apparatus; determine a light beam calibration state of the amplified light beam based on the received reference calibration state and the moment at which the reference calibration state is achieved; and provide the light beam calibration state to the light beam metrology apparatus.

公开(公告)号：US20230269858A1

公开(公告)日：2023-08-24

申请号：US18010251

申请日：2021-06-08

Applicant: ASML Netherlands B.V.

Inventor： Poorya Haghi ,  Sean W. McGrogan ,  Robert N. Jacques ,  Daniel Jason Riggs ,  Liane Manuela Matthes

IPC: H05G2/00 ,  G03F7/20

CPC classification number: H05G2/008 ,  G03F7/70033 ,  H05G2/005

Abstract: Systems, apparatuses, and methods are provided for steering aligning a laser beam and a fuel target. An example method can include generating, at a first rate, first sensing data indicative of a first overlap between a fuel target and a laser beam. The example method can further include generating, at a second rate, second sensing data indicative of a second overlap between the fuel target and the laser beam. The method can further include generating, at a third rate, and based on the first sensing data and the second sensing data, a steering control signal configured to steer the laser beam or the fuel target. In some aspects, the second rate can be different from the first rate, and the third rate can be about equal to the first rate. In other aspects, the first rate and the second rate can be about equal to the third rate.

公开(公告)号：US11096266B2

公开(公告)日：2021-08-17

申请号：US16859042

申请日：2020-04-27

Applicant: ASML Netherlands B.V.

Inventor： Daniel Jason Riggs ,  Robert Jay Rafac

IPC: H05G2/00

Abstract: A method includes providing a target material that comprises a component that emits extreme ultraviolet (EUV) light when converted to plasma; directing a first beam of radiation toward the target material to deliver energy to the target material to modify a geometric distribution of the target material to form a modified target; directing a second beam of radiation toward the modified target, the second beam of radiation converting at least part of the modified target to plasma that emits EUV light; measuring one or more characteristics associated with one or more of the target material and the modified target relative to the first beam of radiation; and controlling an amount of radiant exposure delivered to the target material from the first beam of radiation based on the one or more measured characteristics to within a predetermined range of energies.

公开(公告)号：US10314153B2

公开(公告)日：2019-06-04

申请号：US15724104

申请日：2017-10-03

Applicant: ASML Netherlands B.V.

Inventor： Daniel Jason Riggs ,  Robert Jay Rafac

IPC: H05G2/00

Abstract: A method includes providing a target material that comprises a component that emits extreme ultraviolet (EUV) light when converted to plasma; directing a first beam of radiation toward the target material to deliver energy to the target material to modify a geometric distribution of the target material to form a modified target; directing a second beam of radiation toward the modified target, the second beam of radiation converting at least part of the modified target to plasma that emits EUV light; measuring one or more characteristics associated with one or more of the target material and the modified target relative to the first beam of radiation; and controlling an amount of radiant exposure delivered to the target material from the first beam of radiation based on the one or more measured characteristics to within a predetermined range of energies.

公开(公告)号：US20170048960A1

公开(公告)日：2017-02-16

申请号：US14824289

申请日：2015-08-12

Applicant: ASML Netherlands B.V.

Inventor： Daniel Jason Riggs ,  Robert Jay Rafac

IPC: H05G2/00

CPC classification number: H05G2/008 ,  H05G1/30 ,  H05G2/003

Abstract: In a laser produced plasma (LPP) extreme ultraviolet (EUV) system, a plasma created from droplets irradiated by a laser pulse can become destabilized. The instability of the plasma can reduce the amount of EUV energy generated over time. While other systems seek to stabilize the plasma by varying a pulse width of the laser pulses, the systems and methods described herein stabilize the plasma by varying an intensity of the laser pulses. The intensity of the laser pulses is varied based on a comparison of the amount of EUV energy generated from current pulse to an expected amount of EUV energy. The intensity of the laser pulses can be varied on a pulse-by-pulse basis by an EUV controller that instructs a pulse actuator.

Abstract translation: 在激光产生的等离子体（LPP）极紫外（EUV）系统中，由激光脉冲照射的液滴产生的等离子体变得不稳定。 等离子体的不稳定性可以减少随时间产生的EUV能量的量。 虽然其他系统通过改变激光脉冲的脉冲宽度来寻求稳定等离子体，但是本文所述的系统和方法通过改变激光脉冲的强度来稳定等离子体。 激光脉冲的强度基于从当前脉冲产生的EUV能量与预期的EUV能量的比较而变化。 激光脉冲的强度可以通过指示脉冲致动器的EUV控制器逐脉冲地改变。