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公开(公告)号：US08279409B1
公开(公告)日：2012-10-02
申请号：US12536425
申请日：2009-08-05
申请人： Abdurrahman Sezginer , Hsu-Ting Huang , Jesus Orsely Carrero , Tatung Chow , Kostyantyn Chuyeshov , Gokhan Percin
发明人： Abdurrahman Sezginer , Hsu-Ting Huang , Jesus Orsely Carrero , Tatung Chow , Kostyantyn Chuyeshov , Gokhan Percin
CPC分类号： G03F1/70 , G03F1/36 , G03F7/70441 , G03F7/705 , G03F7/70516
摘要： The present invention provides a method for calibrating a computational model of a lithography process by calculating a demerit function using an intensity measurement at a location of a wafer; and calibrating the lithography model or a mask making model by determining values of parameters of the computational model using the calculated demerit function. The method may also use a second demerit function that is defined by the sum of squares of differences between a simulated and measured critical dimensions of a feature on the wafer.
摘要翻译： 本发明提供了一种用于通过使用在晶片的位置处的强度测量来计算缺点函数来校准光刻处理的计算模型的方法; 并通过使用计算的缺点函数确定计算模型的参数值来校准光刻模型或掩模制作模型。 该方法还可以使用由晶片上的特征的模拟和测量的临界尺寸之间的差的平方和定义的第二缺点函数。
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公开(公告)号：US07743359B2
公开(公告)日：2010-06-22
申请号：US11203330
申请日：2005-08-13
IPC分类号： G06F17/50
CPC分类号： G06F17/5009 , G03F1/36 , G03F7/70441 , G06F17/5068
摘要： An apparatus and method of synthesizing a photolithographic data set includes using a first computational model to calculate a first figure-of-merit for the photolithographic data set; changing a first part of the photolithographic data set to increase the first figure-of-merit; and then using a second computational model to calculate a second figure-of-merit of the photolithographic data set; and changing a second part of the photolithographic data set to increase the second figure-of-merit. The second computational model enables figure-of-merit calculations to be executed at a significantly faster execution rate than the first computational model.
摘要翻译： 合成光刻数据集的装置和方法包括使用第一计算模型来计算光刻数据集的第一像素值; 改变光刻数据集的第一部分以增加第一品质因数; 然后使用第二计算模型来计算光刻数据集的第二像素值; 以及改变光刻数据集的第二部分以增加第二品质因数。 第二种计算模型能够以比第一种计算模型快得多的执行速度执行品质因数计算。
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公开(公告)号：US07230703B2
公开(公告)日：2007-06-12
申请号：US10858587
申请日：2004-06-02
IPC分类号： G01B11/00
CPC分类号： G03F7/70633 , G01B11/26 , G01J3/2823
摘要： A method for measuring overlay in a sample includes obtaining an image of an overlay target that includes a series of grating stacks each having an upper and lower grating, each grating stack having a unique offset between its upper and lower grating. The image is obtained with a set of illumination and collection optics where the numerical aperture of the collection optics is larger than the numerical aperture of the illumination optics and with the numerical apertures of the illumination and collection optics are selected so that the unit cells of gratings are not resolved, the grating stacks are resolved and they appear to have a uniform color within the image of the overlay target.
摘要翻译： 用于测量样本中覆盖层的方法包括获得包括一系列具有上和下光栅的一系列光栅堆叠的覆盖目标的图像，每个光栅堆叠在其上和下光栅之间具有唯一的偏移。 利用一组照明和收集光学器件获得图像，其中收集光学器件的数值孔径大于照明光学器件的数值孔径，并且选择照明和收集光学器件的数值孔径，使得光栅的单元电池 没有解决，光栅堆栈被解决，并且它们在覆盖目标的图像内看起来具有均匀的颜色。
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公开(公告)号：US20060248498A1
公开(公告)日：2006-11-02
申请号：US11203330
申请日：2005-08-13
IPC分类号： G06F17/50
CPC分类号： G06F17/5009 , G03F1/36 , G03F7/70441 , G06F17/5068
摘要： An apparatus and method of synthesizing a photolithographic data set includes using a first computational model to calculate a first figure-of-merit for the photolithographic data set; changing a first part of the photolithographic data set to increase the first figure-of-merit; and then using a second computational model to calculate a second figure-of-merit of the photolithographic data set; and changing a second part of the photolithographic data set to increase the second figure-of-merit. The second computational model enables figure-of-merit calculations to be executed at a significantly faster execution rate that the first computational model.
摘要翻译： 合成光刻数据集的装置和方法包括使用第一计算模型来计算光刻数据集的第一像素值; 改变光刻数据集的第一部分以增加第一品质因数; 然后使用第二计算模型来计算光刻数据集的第二像素值; 以及改变光刻数据集的第二部分以增加第二品质因数。 第二计算模型使得能够以优于第一计算模型的执行速率执行优质图计算。
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15.发明申请公开(公告)号：US20060248496A1
公开(公告)日：2006-11-02
申请号：US11203498
申请日：2005-08-13
IPC分类号： G06F17/10
CPC分类号： G03F1/36
摘要： An apparatus and method for modifying a mask data set includes calculating a derivative of a figure-of-merit, indicative of a data set defined by a plurality of polygon edges and then segmenting polygon edges in response to said step of calculating.
摘要翻译： 用于修改掩模数据集的装置和方法包括计算表示由多个多边形边界定义的数据集的品质因数的导数，然后响应于所述计算步骤来分割多边形边缘。
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