公开(公告)号：US20060248496A1

公开(公告)日：2006-11-02

申请号：US11203498

申请日：2005-08-13

Applicant: Abdurrahman Sezginer ,  Bayram Yenikaya ,  Hsu-Ting Huang

Inventor： Abdurrahman Sezginer ,  Bayram Yenikaya ,  Hsu-Ting Huang

IPC: G06F17/10

CPC classification number: G03F1/36

Abstract: An apparatus and method for modifying a mask data set includes calculating a derivative of a figure-of-merit, indicative of a data set defined by a plurality of polygon edges and then segmenting polygon edges in response to said step of calculating.

Abstract translation: 用于修改掩模数据集的装置和方法包括计算表示由多个多边形边界定义的数据集的品质因数的导数，然后响应于所述计算步骤来分割多边形边缘。

公开(公告)号：US08122389B2

公开(公告)日：2012-02-21

申请号：US12690791

申请日：2010-01-20

Applicant: Abdurrahman Sezginer ,  Bayram Yenikaya ,  Hsu-Ting Huang

Inventor： Abdurrahman Sezginer ,  Bayram Yenikaya ,  Hsu-Ting Huang

IPC: G06F17/50

CPC classification number: G03F1/36

Abstract: An apparatus and method for modifying a mask data set includes calculating a derivative of a figure-of-merit, indicative of a data set defined by a plurality of polygon edges and then segmenting polygon edges in response to said step of calculating.

Abstract translation: 用于修改掩模数据集的装置和方法包括计算表示由多个多边形边界定义的数据集的品质因数的导数，然后响应于所述计算步骤来分割多边形边缘。

公开(公告)号：US20100186000A1

公开(公告)日：2010-07-22

申请号：US12690791

申请日：2010-01-20

Applicant: ABDURRAHMAN SEZGINER ,  Bayram Yenikaya ,  Hsu-Ting Huang

Inventor： ABDURRAHMAN SEZGINER ,  Bayram Yenikaya ,  Hsu-Ting Huang

IPC: G06F17/50

CPC classification number: G03F1/36

Abstract: An apparatus and method for modifying a mask data set includes calculating a derivative of a figure-of-merit, indicative of a data set defined by a plurality of polygon edges and then segmenting polygon edges in response to said step of calculating.

Abstract translation: 用于修改掩模数据集的装置和方法包括计算表示由多个多边形边界定义的数据集的品质因数的导数，然后响应于所述计算步骤来分割多边形边缘。

公开(公告)号：US07519940B2

公开(公告)日：2009-04-14

申请号：US11203329

申请日：2005-08-13

Applicant: Hsu-Ting Huang ,  Abdurrahman Sezginer

Inventor： Hsu-Ting Huang ,  Abdurrahman Sezginer

IPC: G06P17/50 ,  G01M11/00

CPC classification number: G03F1/36 ,  G03F1/44

Abstract: An apparatus and method of compensating for lens imperfections in a projection lithography tool, includes extracting from a diffraction image created by the projection lithography tool a lens transmittance function, and then using the extracted lens transmittance function as a compensator in the lithography projection tool. Another preferred apparatus and method of synthesizing a photomask pattern includes obtaining a phase and an amplitude of a transmittance function of an imaging system; forming a computational model of patterning that includes the transmittance function of the imaging system; and then synthesizing a mask pattern from a given target pattern, by minimizing differences between the target pattern and another pattern that the computational model predicts the synthesized mask pattern will form on a wafer.

Abstract translation: 一种用于补偿投影光刻工具中的透镜缺陷的装置和方法，包括从投影光刻工具产生的衍射图像中提取透镜透射函数，然后使用提取的透镜透射函数作为光刻投影工具中的补偿器。 合成光掩模图案的另一优选装置和方法包括获得成像系统的透射率函数的相位和幅度; 形成包括成像系统的透射功能的图案化计算模型; 然后通过最小化计算模型预测在晶片上形成合成的掩模图案的另一图案之间的差异来合成来自给定目标图案的掩模图案。

公开(公告)号：US20050012928A1

公开(公告)日：2005-01-20

申请号：US10858587

申请日：2004-06-02

Applicant: Abdurrahman Sezginer ,  Robert Shinagawa ,  Hsu-Ting Huang

Inventor： Abdurrahman Sezginer ,  Robert Shinagawa ,  Hsu-Ting Huang

IPC: G01B11/26 ,  G01J3/28 ,  G03F7/20 ,  G01B11/00

CPC classification number: G03F7/70633 ,  G01B11/26 ,  G01J3/2823

Abstract: A method for measuring overlay in a sample includes obtaining an image of an overlay target that includes a series of grating stacks each having an upper and lower grating, each grating stack having a unique offset between its upper and lower grating. The image is obtained with a set of illumination and collection optics where the numerical aperture of the collection optics is larger than the numerical aperture of the illumination optics and with the numerical apertures of the illumination and collection optics are selected so that the unit cells of gratings are not resolved, the grating stacks are resolved and they appear to have a uniform color within the image of the overlay target.

Abstract translation: 用于测量样本中覆盖层的方法包括获得包括一系列具有上和下光栅的一系列光栅堆叠的覆盖目标的图像，每个光栅堆叠在其上和下光栅之间具有唯一的偏移。 利用一组照明和收集光学器件获得图像，其中收集光学器件的数值孔径大于照明光学器件的数值孔径，并且选择照明和收集光学器件的数值孔径，使得光栅的单元电池 没有解决，光栅堆栈被解决，并且它们在覆盖目标的图像内看起来具有均匀的颜色。