公开(公告)号：US08899408B2

公开(公告)日：2014-12-02

申请号：US13956631

申请日：2013-08-01

Applicant: Applied Materials, Inc.

Inventor： Alexander S. Polyak

IPC: B65G23/44 ,  B65G15/60 ,  H01L31/18

CPC classification number: B65G15/60 ,  B65G23/44 ,  H01L31/18

Abstract: Aspects of the present invention generally provide tensioner for varying tension applied to a continuous drive member based on temperature changes. In one embodiment, a temperature compensating chain tensioner is provided. The temperature compensating chain tensioner includes a fixed support member, a first idler sprocket coupled to the fixed support member, a support arm having a proximal end pivotably coupled to the fixed support member, a second idler sprocket coupled to a distal end of the support arm, and a spring form coupled intermediate of the fixed support member and the support arm, wherein the spring form has a spring constant that increases with increasing temperature, which causes the distal end of the support arm to move relative to the fixed support member.

Abstract translation: 本发明的方面通常提供张紧器，用于根据温度变化改变施加到连续驱动构件上的张力。 在一个实施例中，提供了温度补偿链张紧器。 所述温度补偿链张紧器包括固定的支撑构件，联接到所述固定支撑构件的第一惰轮链轮，具有可枢转地联接到所述固定支撑构件的近端的支撑臂，联接到所述支撑臂的远端的第二惰轮链轮 以及联接在固定支撑构件和支撑臂之间的弹簧形式，其中弹簧形式具有随温度升高而增加的弹簧常数，这导致支撑臂的远端相对于固定支撑构件移动。

公开(公告)号：US11501957B2

公开(公告)日：2022-11-15

申请号：US17011977

申请日：2020-09-03

Applicant: Applied Materials, Inc.

Inventor： Gopu Krishna ,  Alexander S. Polyak ,  Sanjeev Baluja

IPC: H01J37/32

Abstract: Process chambers and methods for calibrating components of a processing chamber while the chamber volume is under vacuum are described. The process chamber includes a motor shaft connected to the process chamber with a plurality of motor bolts. A support plate is positioned under the chamber floor to accommodate for deflection of the chamber floor due to vacuum conditions within the chamber volume. A bellows assembly extending from the chamber floor to the support plate maintains vacuum conditions within the chamber.

公开(公告)号：US20220068608A1

公开(公告)日：2022-03-03

申请号：US17011977

申请日：2020-09-03

Applicant: Applied Materials, Inc.

Inventor： Gopu Krishna ,  Alexander S. Polyak ,  Sanjeev Baluja

IPC: H01J37/32

Abstract: Process chambers and methods for calibrating components of a processing chamber while the chamber volume is under vacuum are described. The process chamber includes a motor shaft connected to the process chamber with a plurality of motor bolts. A support plate is positioned under the chamber floor to accommodate for deflection of the chamber floor due to vacuum conditions within the chamber volume. A bellows assembly extending from the chamber floor to the support plate maintains vacuum conditions within the chamber.

公开(公告)号：US20200087816A1

公开(公告)日：2020-03-19

申请号：US16685447

申请日：2019-11-15

Applicant: Applied Materials, Inc.

Inventor： Joseph Yudovsky ,  Alexander S. Polyak

IPC: C30B25/10 ,  H01L21/67 ,  H01L21/687 ,  C23C16/455 ,  C23C16/458 ,  C23C16/46 ,  C30B25/12

Abstract: Susceptor assemblies comprising a susceptor with a top surface with a plurality of recesses and a bottom surface are described. A heater is positioned below the susceptor to heat the susceptor. A shield is positioned between the bottom surface of the susceptor and the heater. The shield increases deposition uniformity across the susceptor.

公开(公告)号：US20200032396A1

公开(公告)日：2020-01-30

申请号：US16467817

申请日：2017-12-05

Applicant: Applied Materials, Inc.

Inventor： Alexander S. Polyak ,  Joseph Yudovsky

IPC: C23C16/455

Abstract: A dual channel showerhead comprising a first plurality of channels formed in the back surface of the showerhead and extending from a first end to a second end, a second plurality of channels formed through the thickness of the showerhead and extending from a first end to a second end, a first end plenum in fluid connection with the second plurality of channels at the first end and a second end plenum in fluid connection with the second plurality of channels at the second end. Processing chambers including the dual channel showerhead and a blocker ring separating the edge ring from the pumping ring are also discussed.

公开(公告)号：US10415137B2

公开(公告)日：2019-09-17

申请号：US15392489

申请日：2016-12-28

Applicant: Applied Materials, Inc.

Inventor： Alexander S. Polyak ,  Joseph Yudovsky

IPC: C23C16/455 ,  C23C16/54 ,  C23C16/44 ,  C23C16/46 ,  H01L21/02

Abstract: Gas distribution assemblies and processing chambers using same are described. The gas distribution assemblies comprise a cooling plate with a quartz puck, a plurality of reactive gas sectors and a plurality of purge gas sectors suspended therefrom. The reactive gas sectors and purge gas sectors having a coaxial gas inlet with inner tubes and outer tubes, the inner tubes and outer tubes in fluid communication with different gas or vacuum ports in the front faces of the sectors. The sectors may be suspended from the cooling plate by a plurality of suspension rods comprising a metal rod body with an enlarged lower end positioned within a quartz frame with a silicon washer around the enlarged lower end.

公开(公告)号：US20180002830A1

公开(公告)日：2018-01-04

申请号：US15637772

申请日：2017-06-29

Applicant: Applied Materials, Inc.

Inventor： Joseph Yudovsky ,  Alexander S. Polyak

IPC: C30B25/10 ,  C23C16/46 ,  C23C16/458 ,  H01L21/67 ,  C30B25/12 ,  C23C16/455

CPC classification number: C30B25/10 ,  C23C16/45546 ,  C23C16/45548 ,  C23C16/4584 ,  C23C16/4586 ,  C23C16/46 ,  C30B25/12 ,  H01L21/67103 ,  H01L21/67109 ,  H01L21/67161 ,  H01L21/68764 ,  H01L21/68771

Abstract: Susceptor assemblies comprising a susceptor with a top surface with a plurality of recesses and a bottom surface are described. A heater is positioned below the susceptor to heat the susceptor. A shield is positioned between the bottom surface of the susceptor and the heater. The shield increases deposition uniformity across the susceptor.

公开(公告)号：US20170191159A1

公开(公告)日：2017-07-06

申请号：US15392489

申请日：2016-12-28

Applicant: Applied Materials, Inc.

Inventor： Alexander S. Polyak ,  Joseph Yudovsky

IPC: C23C16/455 ,  C23C16/44 ,  H01L21/02 ,  C23C16/46

Abstract: Gas distribution assemblies and processing chambers using same are described. The gas distribution assemblies comprise a cooling plate with a quartz puck, a plurality of reactive gas sectors and a plurality of purge gas sectors suspended therefrom. The reactive gas sectors and purge gas sectors having a coaxial gas inlet with inner tubes and outer tubes, the inner tubes and outer tubes in fluid communication with different gas or vacuum ports in the front faces of the sectors. The sectors may be suspended from the cooling plate by a plurality of suspension rods comprising a metal rod body with an enlarged lower end positioned within a quartz frame with a silicon washer around the enlarged lower end.