公开(公告)号：US10585360B2

公开(公告)日：2020-03-10

申请号：US15686815

申请日：2017-08-25

Applicant: Applied Materials, Inc.

Inventor： Tamer Coskun ,  Qin Zhong

IPC: G03F7/20 ,  G03F9/00

Abstract: Methods are provided that, in some embodiments that provide alignment of a first layer of a printing plate on a chuck. For example, in one embodiment, images of reference marks on a chuck are captured to determine the initial positions of the reference marks on the chuck. A reference model is created from those initial positions. Images of alignment marks on a reference plate are captured and the locations of the alignment marks are determined. A reference plate model is created from the positions of the alignment marks. A mapping model is then created from the reference model and the reference plate model.

公开(公告)号：US10996572B2

公开(公告)日：2021-05-04

申请号：US16277805

申请日：2019-02-15

Applicant: Applied Materials, Inc.

Inventor： Tamer Coskun ,  Muhammet Poyraz ,  Qin Zhong ,  Pacha Mongkolwongrojn

IPC: G03F7/20

Abstract: The present disclosure generally relates to photolithography systems, and methods for correcting positional errors in photolithography systems. When a photolithography system is first started, the system enters a stabilization period. During the stabilization period, positional readings and data, such as temperature, pressure, and humidity data, are collected as the system prints or exposes a substrate. A model is created based on the collected data and the positional readings. The model is then used to estimate errors in subsequent stabilization periods, and the estimated errors are dynamically corrected during the subsequent stabilization periods.

公开(公告)号：US10935892B2

公开(公告)日：2021-03-02

申请号：US15595497

申请日：2017-05-15

Applicant: Applied Materials, Inc.

Inventor： Tamer Coskun ,  Thomas L. Laidig ,  Jang Fung Chen

IPC: G03F7/20

Abstract: Methods and systems are provided that, in some embodiments, print and process a layer. The layer can be on a wafer or on an application panel. Thereafter, locations of the features that were actually printed and processed are measured. Based upon differences between the measured differences and designed locations for those features at least one distortion model is created. Each distortion model is inverted to create a corresponding correction model. When there are multiple sections, a distortion model and a correction model can be created for each section. Multiple correction models can be combined to create a global correction model.