公开(公告)号：US20180268099A1

公开(公告)日：2018-09-20

申请号：US15698585

申请日：2017-09-07

Applicant: Applied Materials Israel Ltd.

Inventor： Ron KATZIR ,  Imry KISSOS ,  Lavi Jacov SHACHAR ,  Amit BATIKOFF ,  Shaul COHEN ,  Noam ZAC

IPC: G06F17/50 ,  G06T7/00 ,  G06T7/73 ,  G06T7/33 ,  G06T3/00

CPC classification number: G06F17/5081 ,  G06T3/0068 ,  G06T7/0006 ,  G06T7/001 ,  G06T7/337 ,  G06T7/74 ,  G06T2200/24 ,  G06T2207/30148

Abstract: There are provided system and method of performing metrology operations related to a specimen. The method comprises: generating an examination recipe in accordance with a metrology application, the examination recipe specifying one or more metrology objects and one or more metrology operations related to the metrology application; obtaining an image-based representation of the specimen and a design-based representation of the specimen; mapping between the design-based representation of at least first metrology object and the image-based representation of at least first metrology object; and performing at least first metrology operation of the one or more metrology operations according to the examination recipe using the mapping, the at least first metrology operation specified as related to the at least first metrology object and to be performed on at least the image-based representation of the specimen.

公开(公告)号：US20180268098A1

公开(公告)日：2018-09-20

申请号：US15460078

申请日：2017-03-15

Applicant: Applied Materials Israel Ltd.

Inventor： Ron KATZIR ,  Imry KISSOS ,  Lavi Jacov SHACHAR ,  Amit BATIKOFF ,  Shaul COHEN ,  Noam ZAC

IPC: G06F17/50

CPC classification number: G06F17/5081 ,  G06F2217/12

Abstract: There are provided system and method of performing metrology operations related to a specimen. The method comprises: accommodating definitions of metrology objects and metrology operations, at least one of the group consisting of the metrology objects and the metrology operations being defined using design data; accommodating a design-based representation and an image-based representation of the specimen, the design-based representation of the specimen comprising design-based representation of at least first metrology object, the image-based representation of the specimen comprising image-based representation of the at least first metrology object, the metrology operations including at least first metrology operation defined as related to the at least first metrology object and performed on at least the image-based representation of the specimen; mapping between the design-based representation and the image-based representation of the at least first metrology object; and performing the at least first metrology operation according to definition thereof using the mapping.

公开(公告)号：US20170357895A1

公开(公告)日：2017-12-14

申请号：US15668623

申请日：2017-08-03

Applicant: Applied Materials Israel Ltd.

Inventor： Leonid KARLINSKY ,  Boaz COHEN ,  Idan KAIZERMAN ,  Efrat ROSENMAN ,  Amit BATIKOFF ,  Daniel RAVID ,  Moshe ROSENWEIG

IPC: G06N3/08

CPC classification number: G06N3/08 ,  G06K9/036 ,  G06K9/4628 ,  G06K9/6271 ,  G06N3/0454

Abstract: There are provided system and method of segmentation a fabrication process (FP) image obtained in a fabrication of a semiconductor specimen. The method comprises: upon obtaining a Deep Neural Network (DNN) trained to provide segmentation-related data, processing a fabrication process (FP) sample using the obtained trained DNN and, resulting from the processing, obtaining by the computer segments-related data characterizing the FP image to be segmented, the obtained segments-related data usable for automated examination of the semiconductor specimen. The DNN is trained using a segmentation training set comprising a plurality of first training samples and ground truth data associated therewith, each first training sample comprises a training image; FP sample comprises the FP image to be segmented.