公开(公告)号：US20180268099A1

公开(公告)日：2018-09-20

申请号：US15698585

申请日：2017-09-07

Applicant: Applied Materials Israel Ltd.

Inventor： Ron KATZIR ,  Imry KISSOS ,  Lavi Jacov SHACHAR ,  Amit BATIKOFF ,  Shaul COHEN ,  Noam ZAC

IPC: G06F17/50 ,  G06T7/00 ,  G06T7/73 ,  G06T7/33 ,  G06T3/00

CPC classification number: G06F17/5081 ,  G06T3/0068 ,  G06T7/0006 ,  G06T7/001 ,  G06T7/337 ,  G06T7/74 ,  G06T2200/24 ,  G06T2207/30148

Abstract: There are provided system and method of performing metrology operations related to a specimen. The method comprises: generating an examination recipe in accordance with a metrology application, the examination recipe specifying one or more metrology objects and one or more metrology operations related to the metrology application; obtaining an image-based representation of the specimen and a design-based representation of the specimen; mapping between the design-based representation of at least first metrology object and the image-based representation of at least first metrology object; and performing at least first metrology operation of the one or more metrology operations according to the examination recipe using the mapping, the at least first metrology operation specified as related to the at least first metrology object and to be performed on at least the image-based representation of the specimen.

公开(公告)号：US20180268098A1

公开(公告)日：2018-09-20

申请号：US15460078

申请日：2017-03-15

Applicant: Applied Materials Israel Ltd.

Inventor： Ron KATZIR ,  Imry KISSOS ,  Lavi Jacov SHACHAR ,  Amit BATIKOFF ,  Shaul COHEN ,  Noam ZAC

IPC: G06F17/50

CPC classification number: G06F17/5081 ,  G06F2217/12

Abstract: There are provided system and method of performing metrology operations related to a specimen. The method comprises: accommodating definitions of metrology objects and metrology operations, at least one of the group consisting of the metrology objects and the metrology operations being defined using design data; accommodating a design-based representation and an image-based representation of the specimen, the design-based representation of the specimen comprising design-based representation of at least first metrology object, the image-based representation of the specimen comprising image-based representation of the at least first metrology object, the metrology operations including at least first metrology operation defined as related to the at least first metrology object and performed on at least the image-based representation of the specimen; mapping between the design-based representation and the image-based representation of the at least first metrology object; and performing the at least first metrology operation according to definition thereof using the mapping.