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公开(公告)号：US08243288B2
公开(公告)日：2012-08-14
申请号：US12838521
申请日：2010-07-19
Applicant: Ayumu Taguchi
Inventor： Ayumu Taguchi
Abstract: Disclosed herein is an object detection system including, a light radiation section, a light sweeping block, a light reflection body, a reflected-light detection section, and a reflected-light analysis section.
Abstract translation: 这里公开了一种物体检测系统，包括光照射部，光扫除块，光反射体，反射光检测部和反射光分析部。
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Patent Agency Ranking
公开(公告)号：US20120196775A1
公开(公告)日：2012-08-02
申请号：US13326021
申请日：2011-12-14
Applicant: Ayumu Taguchi
Inventor： Ayumu Taguchi
IPC: C40B60/12
CPC classification number: G01N21/6452 , G01N21/6454 , G01N21/6486 , G01N2021/6471 , G01N2021/6482 , G01N2201/0446 , G01N2201/061
Abstract: An emission intensity measuring device includes a light receiving unit that is disposed opposed to a biochip having a plurality of compartments in which a sample is housed, and includes a plurality of light receiving elements that are arranged, and a determining section that determines a weighting rate of each of the light receiving elements based on a noise characteristic of the light receiving element, acquired in advance. The emission intensity measuring device further includes a multiplying section that multiplies the output of each of the light receiving elements by the weighting rate to calculate a weighted output of each of the light receiving elements, and an adding section that adds the weighted outputs of the light receiving elements opposed to a respective one of the compartments.
Abstract translation: 一种发光强度测量装置，包括：光接收单元，其与具有容纳有样品的多个隔室的生物芯片相对设置，并且包括布置的多个光接收元件;以及确定部，其确定加权率 基于预先获取的光接收元件的噪声特性的每个光接收元件。 发光强度测量装置还包括：乘法部分，用于将每个光接收元件的输出乘以加权速率，以计算每个光接收元件的加权输出;以及相加部分，其将光的加权输出相加 接收元件与相应的一个隔室相对。
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公开(公告)号：US20110019203A1
公开(公告)日：2011-01-27
申请号：US12838521
申请日：2010-07-19
Applicant: Ayumu Taguchi
Inventor： Ayumu Taguchi
IPC: G01B11/14
Abstract: Disclosed herein is an object detection system including, a light radiation section, a light sweeping block, a light reflection body, a reflected-light detection section, and a reflected-light analysis section.
Abstract translation: 这里公开了一种物体检测系统，包括光照射部，光扫除块，光反射体，反射光检测部和反射光分析部。
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14.发明授权Aggregate of electronic device chips, electronic device chip, aggregate of diffraction grating light modulators, and diffraction grating light modulator 失效电子器件芯片，电子器件芯片，衍射光栅光调制器的聚集体和衍射光栅光调制器的集合体公开(公告)号：US07466470B2
公开(公告)日：2008-12-16
申请号：US11208190
申请日：2005-08-18
Applicant: Ayumu Taguchi , Masato Nishida , Yasuyuki Ito , Hitoshi Tamada
Inventor： Ayumu Taguchi , Masato Nishida , Yasuyuki Ito , Hitoshi Tamada
CPC classification number: G02B26/0808
Abstract: A diffraction grating light modulator composed of a plurality of diffraction grating light modulating elements formed on a substrate, each consisting of a lower electrode, belt-like fixed electrodes and movable electrodes supported above the lower electrode, and exposed connecting terminals (for electrical connection to external circuits) electrically connected to the movable electrodes, the fixed electrodes and the movable electrodes constituting a diffraction grating upon application of a voltage to the lower electrode, the diffraction grating light modulator having a protective electrode surrounding the connecting terminals, so that the diffraction grating light modulating element is certainly protected from damage by static electricity.
Abstract translation: 由形成在基板上的多个衍射光栅光调制元件构成的衍射光栅光调制器，每个衍射光栅光调制元件分别由下电极，带状固定电极和支撑在下电极上的可动电极组成，以及露出的连接端子 外部电路），电连接到可动电极，固定电极和可动电极构成衍射光栅，当向下电极施加电压时，衍射光栅光调制器具有围绕连接端子的保护电极，使得衍射光栅 光调制元件当然可以防止静电损坏。
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公开(公告)号：US06451492B2
公开(公告)日：2002-09-17
申请号：US09727144
申请日：2000-11-30
Applicant: Yutaka Imai , Ayumu Taguchi , Hitoshi Tamada , Hiroyuki Wada
Inventor： Yutaka Imai , Ayumu Taguchi , Hitoshi Tamada , Hiroyuki Wada
IPC: G03F900
CPC classification number: G01N21/956
Abstract: The imaging magnification of an imaging optical system 6 is set such that the image resolution of an ultraviolet CCD camera 5 is within a range from 10 nm to 30 nm, on a resist pattern 102 to be inspected. In addition, every time when the ultraviolet CCD camera 5 picks up an image, the resist pattern 102 to be inspected is irradiated at an irradiation light amount within a range from 0.5 mJ/cm2 to an irradiation threshold value at which the resist pattern 102 is not caused to contract or an irradiation threshold value at which an absorption rate of an anti-reflection film provided near the resist pattern is not caused to change.
Abstract translation: 成像光学系统6的成像倍率被设定为使得紫外线CCD照相机5的图像分辨率在10nm至30nm的范围内，在待检查的抗蚀剂图案102上。 此外，每当紫外线CCD照相机5拾取图像时，将以0.5mJ / cm 2的范围内的照射光量照射到要被检查的抗蚀剂图案102到抗蚀剂图案102的照射阈值 不会导致收缩，也不会使设置在抗蚀剂图案附近的防反射膜的吸收率不发生变化的照射阈值。
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16.发明授权
公开(公告)号：US5249250A
公开(公告)日：1993-09-28
申请号：US727942
申请日：1991-07-10
Applicant: Masahiro Yamada , Koichiro Kishima , Ayumu Taguchi
Inventor： Masahiro Yamada , Koichiro Kishima , Ayumu Taguchi
CPC classification number: G02F1/3775 , G02F1/3558 , G02F2001/3548 , G02F2202/20
Abstract: An optical device having a periodic inverted domain construction is used for second harmonic generating devices or the like. The optical device comprises a ferroelectric crystal substrate which is provided in this surface with a periodic inverted domain structure consisting of a plurality of parallel inverted domain regions arranged at intervals. The thickness t and width w of the inverted domain regions and the thickness T of the ferroelectric crystal substrate meet the criteria expressed by: t/w.gtoreq.1 and 0.1
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