公开(公告)号：US20220010407A1

公开(公告)日：2022-01-13

申请号：US17309280

申请日：2019-11-18

Applicant: BASF SE

Inventor： Wolfgang ROHDE ,  Torben ADERMANN ,  Birgit GERKE

IPC: C22B3/00 ,  C22B7/00 ,  H01M10/54

Abstract: The present disclosure relates to a process for the recovery of transition metals from batteries comprising treating a transition metal material with a leaching agent to yield a leach which contains dissolved salts of nickel and/or cobalt, injecting hydrogen gas in the leach at a temperature above 100° C. and a partial pressure above 5 bar to obtain a nickel and/or cobalt precipitate in elemental form, and separating the obtained nickel and/or cobalt precipitate.

公开(公告)号：US20210147960A1

公开(公告)日：2021-05-20

申请号：US17046766

申请日：2019-04-01

Applicant: BASF SE

Inventor： Wolfgang ROHDE ,  Torben ADERMANN ,  Thomas Michael RYLL ,  Kerstin SCHIERLE-ARNDT ,  Fabian SEELER ,  Sabine WEIGUNY ,  Michael ZEILINGER

IPC: C22B26/12 ,  C22B1/00 ,  C22B7/00 ,  C22B3/44

Abstract: Process for the recovery of transition metal from spent lithium ion batteries containing nickel, wherein said process comprises the steps of (a) heating a lithium containing transition metal oxide material to a temperature in the range of from 400 to 1200° C., (b) treating said heat-treated material with water, (c) treating the solid residue from step (b)with an acid selected from sulfuric acid, hydrochloric acid, nitric acid, methanesulfonic acid, oxalic acid and citric acid, (d) adjusting the pH value to 2.5 to 8, (e) removing compounds of Al, Cu, Fe, Zn or combinations of at least two of the foregoing from the solution or slurry obtained in step (d).

公开(公告)号：US20180320265A1

公开(公告)日：2018-11-08

申请号：US15775856

申请日：2016-11-18

Applicant: BASF SE

Inventor： Torben ADERMANN ,  Daniel LOEFFLER ,  Carolin LIMBURG ,  Falko ABELS ,  Hagen WILMER ,  Monica GILL ,  Matthew GRIFFITHS ,  Sean BARRY

IPC: C23C16/18 ,  C23C16/455 ,  C07F15/06

Abstract: The present invention is in the field of processes for the generation of thin inorganic films on substrates, in particular atomic layer deposition processes. The present invention relates to a process comprising bringing a compound of general formula (I) into the gaseous or aerosol state and depositing the compound of general formula (I) from the gaseous or aerosol state onto a solid substrate, wherein R1, R2, R3, and R4 are independent of each other an alkyl group, an aryl group or a trialkylsilyl group, M is Mn, Ni or Co, X is a ligand which coordinates M, wherein at least one X is a neutrally charged ligand, m is 1, 2 or 3 and n is at least 1 wherein the molecular weight of the compound of general formula (I) is up to 1000 g/mol.