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公开(公告)号:US20180327352A1
公开(公告)日:2018-11-15
申请号:US15774722
申请日:2016-11-08
Applicant: BASF SE
Inventor: Jan SPIELMANN , Michael KOCH , Juergen WORTMANN , Sabine WEIGUNY , Feelly RUETHER , Robert SENGPIEL
IPC: C07C303/44
CPC classification number: C07C303/44 , C07C309/04
Abstract: The invention relates to a method of reprocessing alkanesulfonic acid employed in a chemical process as an agent, catalyst or solvent and comprising the steps of: (a) removing an alkanesulfonic acid-comprising stream from a reaction mixture generated in the chemical process, (b) feeding the alkanesulfonic acid-comprising stream into a melt crystallization as the starting melt to form crystals of the alkanesulfonic acid, of hydrates of the alkanesulfonic acid or of a mixture of both suspended in mother liquor, (c) performing a solid-liquid separation to remove the crystals from the mother liquor, (d) optionally washing the crystals to remove mother liquor adhering to the crystals, (e) recycling the washed or unwashed crystals removed from the mother liquor into the chemical process.
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公开(公告)号:US20180319739A1
公开(公告)日:2018-11-08
申请号:US15774847
申请日:2016-11-08
Applicant: BASF SE
Inventor: Jan SPIELMANN , Michael KOCH , Juergen WORTMANN , Feelly RUETHER , Sabine WEIGUNY , Frieder BORGMEIER
IPC: C07C303/44 , B01D9/00 , B01D3/00 , B01D3/14
Abstract: The invention relates to a process for purifying alkanesulfonic acids which comprises the steps of: (a) distilling a melt comprising crude alkanesulfonic acid (1) to completely or partly remove low boilers, wherein the low boilers are drawn off at the top of a distillation column (3) or of a one-stage evaporation apparatus and a material stream (7) comprising alkanesulfonic acid, high boilers and residual low boilers is withdrawn at the bottom of the distillation column (3) or of the one-stage evaporation apparatus, (b) sending the stream (7) comprising alkanesulfonic acid, high boilers and residual low boilers into a melt crystallization (9) as the starting melt to form crystals of the alkanesulfonic acid, of hydrates of the alkanesulfonic acid or of a mixture of both suspended in mother liquor, (c) performing a solid-liquid separation to remove the crystals from the mother liquor, (d) optionally washing the crystals to remove mother liquor adhering to the crystals.
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公开(公告)号:US20220298637A1
公开(公告)日:2022-09-22
申请号:US17616736
申请日:2020-05-27
Applicant: BASF SE , Wayne State University
Inventor: Sinja Verena KLENK , David Dominique SCHWEINFURTH , Lukas MAYR , Sabine WEIGUNY , Charles Winter , Nilanka WEERATHUNGA SIRIKKATHUGE , Tharindu KARUNARATNE
IPC: C23C16/455 , C07F5/06
Abstract: The present invention is in the field of processes for preparing inorganic metal- or semimetal-containing films. The process comprising (a) depositing a metal- or semimetal-containing compound from the gaseous state onto a solid substrate and (b) bringing the solid substrate in contact with a compound of general formula (I), (II), or (III) in the gaseous state (I) (II) (III) wherein A is NR, NR2, PR, PR2, O, OR, S, or SR, E is N, NR, P, PR, O or S, n is 1, 2, or 3, R is an alkyl group, an alkenyl group, an aryl group, or a silyl group and R′ is hydrogen, an alkyl group, an alkenyl group, an aryl group, or a silyl group, and A, E, and n are chosen such that the compound of general formula (I), (II), or (III) is electronically neutral.
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公开(公告)号:US20160348243A1
公开(公告)日:2016-12-01
申请号:US15114666
申请日:2015-01-22
Applicant: BASF SE
Inventor: Ke XU , Christian SCHILDKNECHT , Jan SPIELMANN , Juergen FRANK , Florian BLASBERG , Daniel LOEFFLER , Martin GAERTNER , Sabine WEIGUNY , Kerstin SCHIERLE-ARNDT , Katharina FEDERSEL , Falko ABELS
IPC: C23C16/455 , C07F15/06 , C07F15/04 , B01J13/00 , C07F3/00
CPC classification number: C23C16/45553 , C07F3/00 , C07F3/003 , C07F15/045 , C07F15/065
Abstract: The present invention relates to a process for the generation of thin inorganic films on substrates, in particular an atomic layer deposition process. This process comprises bringing a compound of general formula (I) into the gaseous or aerosol state and depositing the compound of general formula (I) from the gaseous or aerosol state onto a solid substrate, wherein R1, R2, R3, R4, R5, and R6 are independent of each other hydrogen, an alkyl group, or a trialkylsilyl group, n is an integer from 1 to 3, M is a metal or semimetal, 1 X is a ligand which coordinates M, and m is an integer from 0 to 4.
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公开(公告)号:US20210262091A1
公开(公告)日:2021-08-26
申请号:US17251250
申请日:2019-06-04
Applicant: BASF SE
Inventor: David Dominique SCHWEINFURTH , Sabine WEIGUNY , Lukas MAYR , Sinja Verena KLENK
IPC: C23C16/455 , C07F17/00 , C23C16/08 , C23C16/56
Abstract: The present invention is in the field of processes for the generation of thin inorganic films on substrates. The present invention relates to a process for preparing metal- or semimetal-containing films comprising (a) depositing a metal- or semimetal-containing compound from the gaseous state onto a solid substrate and (b) bringing the solid substrate with the deposited metal- or semi-metal-containing compound in contact with a compound of general formula (Ia), (Ib), (Ic), (Id) or (Ie), wherein E is Ti, Zr, Hf, V, Nb, or Ta, L1 and L2 is a pentadienyl or a cyclopentadienyl ligand, and X1 and X2 is nothing or a neutral ligand, R1, R2, R3, R4, R5, R6, R7, R8, R9, R10, R11, R12, R13, R14, R15, R16, R17, R18, R19, R20, R21, R22, R23, R24, R25, and R26 is hydrogen, an alkyl group, an alkenyl group, an aryl group or a silyl group, wherein for compound (Ia), at least one of R1 to R10 contains at least one carbon and/or silicon atom and A is an alkyl group, an alkenyl group, an aryl group or a silyl group.
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公开(公告)号:US20190137188A1
公开(公告)日:2019-05-09
申请号:US16096319
申请日:2017-04-20
Applicant: BASF SE
Inventor: Juergen WORTMANN , Sabine WEIGUNY , Katharina FEDERSEL , Matthias HINRICHS , Stephan MAURER
Abstract: Use of a nitrate salt composition Z comprising Z1 at least one alkali metal nitrate and optionally alkaline earth metal nitrate and also Z2 at least one alkali metal nitrite and optionally alkaline earth metal nitrite in an amount of Z2 in the range from 1.1 to 15.0 mol % based on the sum of Z1 plus Z2 as heat transfer or heat storage medium in apparatuses in which these heat transfer or heat storage media are comprised at a temperature in the range from 500 to 620° C. and an oxygen partial pressure over the nitrate salt composition in the range from 0.1 to 1.0 atm, wherein the molar amount of the alkali metal nitrite and optionally alkaline earth metal nitrite for a desired temperature selected from the range indicated above and for a desired oxygen partial pressure selected from the range indicated above is calculated by means of the following formula x nitrite = K 6 ( T ) K 6 ( T ) + P O 2 where the variables have the following meanings: xnitrate is the mole fraction of nitrite in a nitrite/nitrate mixture, K6(T) is the temperature-dependent equilibrium constant of the reaction nitrate⇄nitrite+½ oxygen (NO3−⇄ NO2−+½ O2), pO2 is the oxygen partial pressure and T is the temperature of the nitrate salt composition, and the calculated value of the molar concentration of the component Z2 is optionally reduced by 40% or increased by 20% and the nitrate salt composition Z is heated to a maximum operating temperature in the range from 500 to 620° C. in the first start-up of said apparatuses.
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公开(公告)号:US20220136084A1
公开(公告)日:2022-05-05
申请号:US16956516
申请日:2018-12-10
Applicant: BASF SE
Inventor: Wolfgang ROHDE , Michael ZEILINGER , Torben ADERMANN , Sabine WEIGUNY , Fabian SEELER , Kerstin SCHIERLE-ARNDT , Thomas Michael RYLL
Abstract: Process for the recovery of transition metal from cathode active materials containing nickel and lithium, wherein said process comprises the steps of (a) treating a lithium containing transition metal oxide material with a leaching agent (preferably an acid selected from sulfuric acid, hydrochloric acid, nitric acid, methanesulfonic acid, oxalic acid and citric acid), (b) adjusting the pH value to 2.5 to 8, and (c) treating the solution obtained in step (b)with metallic nickel, cobalt or manganese or a combination of at least two of the foregoing.
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公开(公告)号:US20210147960A1
公开(公告)日:2021-05-20
申请号:US17046766
申请日:2019-04-01
Applicant: BASF SE
Inventor: Wolfgang ROHDE , Torben ADERMANN , Thomas Michael RYLL , Kerstin SCHIERLE-ARNDT , Fabian SEELER , Sabine WEIGUNY , Michael ZEILINGER
Abstract: Process for the recovery of transition metal from spent lithium ion batteries containing nickel, wherein said process comprises the steps of (a) heating a lithium containing transition metal oxide material to a temperature in the range of from 400 to 1200° C., (b) treating said heat-treated material with water, (c) treating the solid residue from step (b)with an acid selected from sulfuric acid, hydrochloric acid, nitric acid, methanesulfonic acid, oxalic acid and citric acid, (d) adjusting the pH value to 2.5 to 8, (e) removing compounds of Al, Cu, Fe, Zn or combinations of at least two of the foregoing from the solution or slurry obtained in step (d).
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公开(公告)号:US20240425385A1
公开(公告)日:2024-12-26
申请号:US18570726
申请日:2022-07-12
Applicant: BASF SE
Inventor: Thorsten BEIERLING , Sabine FRISCHHUT , Matthias RAULS , Lukas Karl METZGER , Sabine WEIGUNY , Michael LENNARTZ , Rafael Benjamin BERK
IPC: C01G53/00
Abstract: Disclosed herein is a process for making a particulate (oxy)hydroxide of TM, where TM represents a combination of metals and includes nickel and at least one metal selected from cobalt and aluminum and manganese. The process includes: (a) combining an aqueous slurry of metallic nickel and at least one metal selected from aluminum and transition metals other than nickel with an oxidant selected from oxygen and nitrate in a first reaction vessel or in a first group of reaction vessels at a temperature of from 5° to 40° C., (b) transferring aqueous reaction medium from the first reaction vessel to a second reaction vessel, where the second reaction vessel contains a slurry of a hydroxide of TM, (c) removing the particles from step (b) from the liquid by a solid-liquid separation method, and drying the particles, and (d) returning liquid phase obtained in step (c) to the first reaction vessel.
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公开(公告)号:US20240228279A9
公开(公告)日:2024-07-11
申请号:US17769400
申请日:2020-10-16
Applicant: BASF SE , UNIVERSITY OF CALIFORNIA, OAKLAND
Inventor: Klemens MASSONNE , Hendrik DE WINNE , Torsten MATTKE , Ahmad DEHESTANI , Sabine WEIGUNY , Stephan ZUEND , Eric Wesley MCFARLAND , Behzad TANGEYSH , Shizhao SU , Sabine FRISCHHUT
CPC classification number: C01B7/04 , B01J10/005 , B01J19/02 , B01J19/2465 , B01J27/08 , B01J2219/0263
Abstract: The invention relates to a process for preparation of chlorine from hydrogen chloride comprising circulating a liquid melt comprising copper ions Cun+ with n being a number in the range from 1 to 2, alkali cations and chloride ions Cl in a reactor system comprising three bubble lift reactors I, II and III, each comprising a reaction zone i, ii and iii respectively, wherein: ⋅(a) in the reaction zone i of the first bubble lift reactor I, a liquid melt comprising copper ions Cun+, alkali cations and chloride ions Cl— is contacted with oxygen at a temperature in the range from 395 to 405° C. so that the molar ratio Cun+:Cu+ in the liquid melt increases, obtaining a liquid melt having an increased molar ratio Cun+:Cu+ ⋅(b) the liquid melt obtained in (a) is circulated to the reaction zone ii in the second bubble lift reactor II, where the liquid melt is contacted with hydrogen chloride at a temperature in the range from 395 to 405° C. so that water is formed, obtaining a liquid melt being enriched in chloride anions (CI-) compared to the liquid melt obtained according to (a); ⋅(c) circulating the liquid melt obtained in (b) to the reaction zone iii in the third bubble lift reactor III, which is operated at a temperature in the range from 420 to 430° C. so that chlorine (Cl2) is formed, wherein Cl2 is removed from the reaction zone iii and the third bubble lift reactor III respectively in gaseous form, leaving a liquid melt depleted of Cl-compared to the liquid melt obtained according to (b). The invention further relates to a reactor system comprising three bubble lift reactors I, II and III.
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