MASK PLATE AND METHOD FOR DETECTING EXPOSURE DEFECTS USING THE SAME
    11.
    发明申请
    MASK PLATE AND METHOD FOR DETECTING EXPOSURE DEFECTS USING THE SAME 有权
    用于检测曝光缺陷的掩模板和方法

    公开(公告)号:US20140377691A1

    公开(公告)日:2014-12-25

    申请号:US14236193

    申请日:2013-12-11

    Inventor: Dawei Shi Jian Guo

    CPC classification number: G03F1/44 G03F7/40

    Abstract: Embodiments of the invention disclose a mask plate and a method for detecting an exposure defect using the mask plate. The mask includes a mask pattern, and the mask further includes a plurality of detection-mark mask patterns arranged along a scan direction of an exposure machine, the detection-mark mask patterns are arranged at an edge of the mask pattern. The detection-mark mask patterns are adapted for forming detection marks on a substrate. The detection marks are adapted for reflecting exposure defects of the exposure machine. With the mask plate of the invention, the reason for the exposure defect may be precisely decided, thereby improving the exposure effect and improving the parameter index of the substrate.

    Abstract translation: 本发明的实施例公开了掩模板和使用掩模板检测曝光缺陷的方法。 掩模包括掩模图案,并且掩模还包括沿着曝光机的扫描方向布置的多个检测标记掩模图案,检测标记掩模图案被布置在掩模图案的边缘。 检测标记掩模图案适于在基板上形成检测标记。 检测标记适于反映曝光机的曝光缺陷。 利用本发明的掩模板,可以精确地确定曝光缺陷的原因,从而提高曝光效果并提高基板的参数指数。

    Method for fabricating array substrate, display panel and display device

    公开(公告)号:US11329075B2

    公开(公告)日:2022-05-10

    申请号:US16075272

    申请日:2018-01-04

    Abstract: An array substrate, its fabricating method, a display panel and a display device are disclosed. The method includes forming an active layer on a substrate, forming a gate layer on a side of the active layer facing or away from the substrate; forming an interlayer dielectric layer on a side of the active layer away from the substrate, which includes a first, second, third and fourth film stacked in this order in a direction away from the substrate; forming a via hole extending from the interlayer dielectric layer to the active layer; forming a source and drain layer on a side of the interlayer dielectric layer away from the substrate, and in a region not covered by the source and drain layer, removing the fourth film in the interlayer dielectric layer at a same time as forming the source and drain layer.

    DISPLAY PANEL, PRODUCTION METHOD, AND DISPLAY APPARATUS

    公开(公告)号:US20190129238A1

    公开(公告)日:2019-05-02

    申请号:US15974672

    申请日:2018-05-08

    Abstract: This disclosure provides a display panel, a production method, and a display apparatus. The display panel comprises a first substrate, a second substrate, and a liquid crystal layer provided between the first substrate and the second substrate. The first substrate is provided with a black matrix, and the second substrate is provided oppositely to the first substrate and is provided with a light-shielding layer pattern. A surface of the light-shielding layer pattern has a light-reflecting property, and a projection of at least a part of the light-shielding layer pattern on the second substrate extends beyond a projection of the black matrix on the second substrate.

    Exposure system
    17.
    发明授权

    公开(公告)号:US09690211B2

    公开(公告)日:2017-06-27

    申请号:US14500260

    申请日:2014-09-29

    Inventor: Dawei Shi Jian Guo

    Abstract: The present invention provides an exposure system including a light source and a carrier which are arranged opposite to each other. The carrier is used for placing a to-be-exposed film, and the to-be-exposed film is to be exposed to light emitted from the light source. The exposure system further includes a thickness measurement unit and a light intensity adjustment unit which are electrically connected to each other. The thickness measurement unit is used for measuring thicknesses of different regions of the to-be-exposed film, and the light intensity adjustment unit is used for adjusting exposure-light intensities of different regions of the to-be-exposed film according to the thicknesses of corresponding regions of the to-be-exposed film measured by the thickness measurement unit.

    Mask plate and method for detecting exposure defects using the same
    18.
    发明授权
    Mask plate and method for detecting exposure defects using the same 有权
    掩模板及其检测方法

    公开(公告)号:US09383640B2

    公开(公告)日:2016-07-05

    申请号:US14236193

    申请日:2013-12-11

    Inventor: Dawei Shi Jian Guo

    CPC classification number: G03F1/44 G03F7/40

    Abstract: Embodiments of the invention disclose a mask plate and a method for detecting an exposure defect using the mask plate. The mask includes a mask pattern, and the mask further includes a plurality of detection-mark mask patterns arranged along a scan direction of an exposure machine, the detection-mark mask patterns are arranged at an edge of the mask pattern. The detection-mark mask patterns are adapted for forming detection marks on a substrate. The detection marks are adapted for reflecting exposure defects of the exposure machine. With the mask plate of the invention, the reason for the exposure defect may be precisely decided, thereby improving the exposure effect and improving the parameter index of the substrate.

    Abstract translation: 本发明的实施例公开了掩模板和使用掩模板检测曝光缺陷的方法。 掩模包括掩模图案,并且掩模还包括沿着曝光机的扫描方向布置的多个检测标记掩模图案,检测标记掩模图案被布置在掩模图案的边缘。 检测标记掩模图案适于在基板上形成检测标记。 检测标记适于反映曝光机的曝光缺陷。 利用本发明的掩模板,可以精确地确定曝光缺陷的原因,从而提高曝光效果并提高基板的参数指数。

Patent Agency Ranking