Array substrate, display panel and display device

    公开(公告)号:US10651205B2

    公开(公告)日:2020-05-12

    申请号:US15951466

    申请日:2018-04-12

    摘要: An array substrate and a display device are provided. The array substrate includes a base substrate; a first active layer, located on the base substrate; a first insulating layer, located on the first active layer and the base substrate; a gate electrode, located at a side of the first insulating layer away from the first active layer; a second insulating layer, located on the gate electrode and the first insulating layer; a second active layer, located on the second insulating layer away from the gate electrode; a first drain electrode and a first source electrode, being in partial contact with the first active layer, respectively; a second drain electrode and a second source electrode, being in partial contact with the second active layer, respectively; and a pixel electrode, the first drain electrode and the second drain electrode are electrically connected, the first source electrode and the second source electrode are electrically connected, and the pixel electrode is electrically connected with at least one of the first drain electrode and the second drain electrode. The array substrate can improve the responding speed and charging efficiency, and avoid increasing the aperture opening ratio at the same time.

    Touch-controlled panel, method of manufacturing the same, and display device

    公开(公告)号:US10310647B2

    公开(公告)日:2019-06-04

    申请号:US15232949

    申请日:2016-08-10

    IPC分类号: H01L27/12 G06F3/041 G06F3/044

    摘要: Embodiments of the present invention discloses a touch-controlled panel and a method of manufacturing the same, and a display device, to reduce the number of masks and production cost. The method of manufacturing a touch-controlled panel includes: forming a first electrode and a second electrode on a substrate through a patterning process, the first electrode and the second electrode being broken at a position where they are overlapped; depositing a layer of an organic film and forming an organic film fully remained region, an organic film partially remained region and an organic film removed region from the organic film through a mask; depositing a conductive layer and coating a photoresist on the conductive layer, and then forming a photoresist fully remained region, a photoresist partially remained region and a photoresist removed region through the mask.

    Array substrate, liquid crystal display panel and display device

    公开(公告)号:US10139686B2

    公开(公告)日:2018-11-27

    申请号:US15209045

    申请日:2016-07-13

    摘要: The embodiment of the present application discloses an array substrate, a liquid crystal display panel, and a display device, with first common electrode compensation lines being arranged within pixel regions which correspond to pixels provided with a minimal transmittance, by which first common electrode compensation lines a common electrode is charged so as to ensure a constant voltage on the common electrode. Moreover, since the first common electrode compensation lines are configured to overlap neither first signal lines nor second signal lines, a repairmen of the first signal lines or the second signal lines will not be adversely affected in case that there is short-circuit or open-circuit thereon. Besides, since the common electrode compensation lines are arranged within pixel regions provided with the lowest transmittance, the influence onto overall transmittance of the display panel is minimized relatively.

    Manufacturing Method of Array Substrate, Array Substrate and Display Device

    公开(公告)号:US20210202537A1

    公开(公告)日:2021-07-01

    申请号:US16074976

    申请日:2017-11-14

    IPC分类号: H01L27/12

    摘要: A manufacturing method of an array substrate, an array substrate and a display device are disclosed. The manufacturing method of the array substrate includes: providing a base substrate (200); forming a semiconductor layer on the base substrate; depositing an etch stop layer material on the semiconductor layer; subjecting the etch stop layer material to a wet etching process to form an etch stop layer; subjecting the semiconductor layer to a dry etching process to form an active layer, wherein the active layer includes a first region and a second region surrounding the first region, an orthographic projection of the etch stop layer on the base substrate completely coincides with an orthographic projection of the first region of the active layer on the base substrate.

    Transistor and method for manufacturing the same, display substrate, and display apparatus

    公开(公告)号:US10923597B2

    公开(公告)日:2021-02-16

    申请号:US16427730

    申请日:2019-05-31

    摘要: A transistor and a method for manufacturing the same, a display substrate, and a display apparatus are provided. The transistor may include: a substrate; an active region on the substrate and including a polycrystalline silicon region; an etch stop layer at a side of the polycrystalline silicon region distal to the substrate; and a first heavily doped amorphous silicon region and a second heavily doped amorphous silicon region both at a side of the etch stop layer distal to the substrate; the polycrystalline silicon region having a first side surface corresponding to the first heavily doped amorphous silicon region and a second side surface corresponding to the second heavily doped amorphous silicon region; wherein an orthographic projection of the polycrystalline silicon region on a plane in which a lower surface of the etch stop layer lies does not go beyond the lower surface of the etch stop layer.