-
公开(公告)号：US20180211888A1
公开(公告)日：2018-07-26
申请号：US15567786
申请日：2017-03-03
发明人： Yudong Liu , Rongcheng Liu , Yunhai Wan
IPC分类号： H01L21/84 , H01L27/12 , H01L21/4757 , H01L21/02 , H01L21/027
CPC分类号： H01L21/84 , H01L21/02271 , H01L21/0273 , H01L21/47573 , H01L27/12 , H01L27/1214
摘要： An array substrate and a manufacturing method thereof are provided. The method for manufacturing the array substrate includes: forming a passivation layer on a base substrate; forming photoresist on the passivation layer, and forming a first photoresist pattern including a photoresist-completely-retained region, a photoresist-partially-retained region and a photoresist-completely-removed region, by exposure and development processes; forming a first through hole in the passivation layer by etching the passivation layer with the first photoresist pattern as a mask; forming a second photoresist pattern by performing ashing on the first photoresist pattern to remove the photoresist in the photoresist-partially-retained region and reduce a thickness of the photoresist in the photoresist-completely-retained region; and etching the passivation layer with the second photoresist pattern as a mask, so as to reduce a thickness of the passivation layer in the photoresist-partially-retained region.
-
公开(公告)号：US11307469B2
公开(公告)日：2022-04-19
申请号：US15776193
申请日：2017-10-20
发明人： Tao Jiang , Yunhai Wan , Binbin Cao , Xianghua Ren
IPC分类号： G02F1/1362 , G02F1/1333 , H01L27/12 , G02F1/1343
摘要： The present disclosure provides an array substrate and a manufacturing method of the array substrate, a display device. An array substrate comprises: a pixel array, each pixel in the pixel array having a pixel electrode; a transistor array, each transistor in the transistor array having a source electrode; and a connection electrode for electrically connecting the pixel electrode to a corresponding source electrode.
-
公开(公告)号：US10310647B2
公开(公告)日：2019-06-04
申请号：US15232949
申请日：2016-08-10
发明人： Yunhai Wan , Wenlong Wang , Tao Ma , Binbin Cao , Chengshao Yang
摘要： Embodiments of the present invention discloses a touch-controlled panel and a method of manufacturing the same, and a display device, to reduce the number of masks and production cost. The method of manufacturing a touch-controlled panel includes: forming a first electrode and a second electrode on a substrate through a patterning process, the first electrode and the second electrode being broken at a position where they are overlapped; depositing a layer of an organic film and forming an organic film fully remained region, an organic film partially remained region and an organic film removed region from the organic film through a mask; depositing a conductive layer and coating a photoresist on the conductive layer, and then forming a photoresist fully remained region, a photoresist partially remained region and a photoresist removed region through the mask.
-
公开(公告)号：US20170199615A1
公开(公告)日：2017-07-13
申请号：US15232949
申请日：2016-08-10
发明人： Yunhai Wan , Wenlong Wang , Tao Ma , Binbin Cao , Chengshao Yang
CPC分类号： G06F3/0412 , G06F3/044 , G06F2203/04103 , G06F2203/04111 , H01L27/1288
摘要： Embodiments of the present invention discloses a touch-controlled panel and a method of manufacturing the same, and a display device, to reduce the number of masks and production cost. The method of manufacturing a touch-controlled panel includes: forming a first electrode and a second electrode on a substrate through a patterning process, the first electrode and the second electrode being broken at a position where they are overlapped; depositing a layer of an organic film and forming an organic film fully remained region, an organic film partially remained region and an organic film removed region from the organic film through a mask; depositing a conductive layer and coating a photoresist on the conductive layer, and then forming a photoresist fully remained region, a photoresist partially remained region and a photoresist removed region through the mask.
-
公开(公告)号：US11177334B2
公开(公告)日：2021-11-16
申请号：US16598675
申请日：2019-10-10
发明人： Liang Lin , Yunhai Wan , Zhixiang Zou , Chuan Chen , Wei He
IPC分类号： H01L27/32 , H01L27/12 , G02F1/135 , H01L29/786 , H01L21/77
摘要： A display substrate, display panel, and method of fabricating the display substrate. The display substrate includes: a first thin film transistor on a substrate; a second thin film transistor on the substrate and on the same side of the substrate as first thin film transistor; a light blocking structure between the substrate and an active region of first thin film transistor. The light blocking structure is configured to block at least a portion of light incident on the active region of first thin film transistor, such that a ratio of area of an illuminated portion of the active region of first thin film transistor to an area of the active region of first thin film transistor is less than a ratio of area of an illuminated portion of an active region of second thin film transistor to an area of the active region of second thin film transistor.
-
公开(公告)号：US10332807B2
公开(公告)日：2019-06-25
申请号：US15567786
申请日：2017-03-03
发明人： Yudong Liu , Rongcheng Liu , Yunhai Wan
IPC分类号： H01L21/027 , H01L21/4757 , H01L21/84 , H01L27/12 , H01L21/02
摘要： An array substrate and a manufacturing method thereof are provided. The method for manufacturing the array substrate includes: forming a passivation layer on a base substrate; forming photoresist on the passivation layer, and forming a first photoresist pattern including a photoresist-completely-retained region, a photoresist-partially-retained region and a photoresist-completely-removed region, by exposure and development processes; forming a first through hole in the passivation layer by etching the passivation layer with the first photoresist pattern as a mask; forming a second photoresist pattern by performing ashing on the first photoresist pattern to remove the photoresist in the photoresist-partially-retained region and reduce a thickness of the photoresist in the photoresist-completely-retained region; and etching the passivation layer with the second photoresist pattern as a mask, so as to reduce a thickness of the passivation layer in the photoresist-partially-retained region.
-
7.发明授权公开(公告)号：US10923597B2
公开(公告)日：2021-02-16
申请号：US16427730
申请日：2019-05-31
发明人： Haijiao Qian , Chengshao Yang , Yinhu Huang , Yunhai Wan
IPC分类号： H01L29/786 , H01L27/12 , H01L29/45 , H01L29/66
摘要： A transistor and a method for manufacturing the same, a display substrate, and a display apparatus are provided. The transistor may include: a substrate; an active region on the substrate and including a polycrystalline silicon region; an etch stop layer at a side of the polycrystalline silicon region distal to the substrate; and a first heavily doped amorphous silicon region and a second heavily doped amorphous silicon region both at a side of the etch stop layer distal to the substrate; the polycrystalline silicon region having a first side surface corresponding to the first heavily doped amorphous silicon region and a second side surface corresponding to the second heavily doped amorphous silicon region; wherein an orthographic projection of the polycrystalline silicon region on a plane in which a lower surface of the etch stop layer lies does not go beyond the lower surface of the etch stop layer.
-
公开(公告)号：US10546882B2
公开(公告)日：2020-01-28
申请号：US15535391
申请日：2017-01-05
发明人： Botao Song , Chengshao Yang , Yinhu Huang , Ning Liu , Jun Ma , Yunhai Wan
IPC分类号： H01L27/12
摘要： The present disclosure provides an array substrate, a display panel comprising the array substrate, and a display device, as well as a manufacturing method of the array substrate. The array substrate comprises a base substrate, a metal layer arranged over the base substrate, a conductive material layer arranged on the metal layer, and a connection hole arranged over the conductive material layer to expose the conductive material layer.
-
公开(公告)号：US10509286B2
公开(公告)日：2019-12-17
申请号：US15518911
申请日：2016-10-09
发明人： Yunhai Wan , Chengshao Yang , Ling Han , Botao Song
IPC分类号： H01L21/28 , G02F1/1368 , H01L29/786 , H01L21/768 , H01L21/84 , H01L27/12 , H01L29/49
摘要： A manufacturing method of the invention, comprising: successively forming an insulation layer and a photoresist layer on a transparent substrate; performing an exposure and a development on the photoresist layer by a back exposure process, so as to form a trench in the photoresist layer, an open area of the trench proximal to the insulation layer is larger than that of the trench distal to the insulation layer; removing a portion of insulation material in a region of the insulation layer exposed through the trench by an etching process, so as to form a slot in the insulation layer; forming a metal layer on a side of the photoresist layer distal to the insulation layer, a portion of the metal layer is embedded in the slot; removing the photoresist layer and the metal layer thereon by a stripping process, and retaining the portion of the metal layer in the slot.
-
-
-
-
-
-
-
-
搜索结果
9 条记录 (耗时 0.027 秒)
