公开(公告)号：USD614747S1

公开(公告)日：2010-04-27

申请号：US29341797

申请日：2009-08-12

Applicant: Victor Hoernig ,  Chia Ying Lee

Designer： Victor Hoernig ,  Chia Ying Lee

公开(公告)号：USD602136S1

公开(公告)日：2009-10-13

申请号：US29296515

申请日：2007-10-23

Applicant: Chia Ying Lee ,  Victor Hoernig

Designer： Chia Ying Lee ,  Victor Hoernig

公开(公告)号：USD594739S1

公开(公告)日：2009-06-23

申请号：US29303787

申请日：2008-02-18

Applicant: Chia Ying Lee

Designer： Chia Ying Lee

公开(公告)号：US20090100591A1

公开(公告)日：2009-04-23

申请号：US11876791

申请日：2007-10-23

Applicant: Chia Ying Lee ,  Victor Hoernig

Inventor： Chia Ying Lee ,  Victor Hoernig

IPC: A47K3/022

CPC classification number: A47K1/00 ,  A47K10/08

Abstract: A utility tub is provided with a sink area having support surfaces for removably supporting a tray. The tray may hold items that are drying. In addition, the utility tub may be provided with an enlarged area for supporting other items, and various accessories such as a towel rack or towel pegs.

Abstract translation: 公用浴盆设置有具有用于可移除地支撑托盘的支撑表面的水槽区域。 托盘可能会保持正在干燥的物品。 此外，公用浴缸可以设置有用于支撑其他物品的扩大区域，以及诸如毛巾架或毛巾钉的各种附件。

公开(公告)号：USD583445S1

公开(公告)日：2008-12-23

申请号：US29296514

申请日：2007-10-23

Applicant: Chia Ying Lee ,  Victor Hoernig

Designer： Chia Ying Lee ,  Victor Hoernig

公开(公告)号：USD578779S1

公开(公告)日：2008-10-21

申请号：US29303782

申请日：2008-02-18

Applicant: Chia Ying Lee ,  James Leroy Daniels

Designer： Chia Ying Lee ,  James Leroy Daniels

公开(公告)号：USD564857S1

公开(公告)日：2008-03-25

申请号：US29286156

申请日：2007-04-25

Applicant: Chia Ying Lee

Designer： Chia Ying Lee

公开(公告)号：US08697537B2

公开(公告)日：2014-04-15

申请号：US13364119

申请日：2012-02-01

Applicant: Chia Ying Lee ,  Chih-Yuan Ting ,  Jyu-Horng Shieh

Inventor： Chia Ying Lee ,  Chih-Yuan Ting ,  Jyu-Horng Shieh

IPC: H01L21/76

CPC classification number: H01L21/0337 ,  H01L21/3086 ,  H01L21/31144 ,  H01L21/76224 ,  H01L21/76816

Abstract: A method that includes forming a masking element on a semiconductor substrate and overlying a defined space. A first feature and a second feature are each formed on the semiconductor substrate. The space interposes the first and second features and extends from a first end of the first feature to a first end of the second feature. A third feature is then formed adjacent and substantially parallel the first and second features. The third feature extends at least from the first end of the first feature to the first end of the second feature.

Abstract translation: 一种方法，其包括在半导体衬底上形成掩模元件并覆盖在限定的空间上。 第一特征和第二特征各自形成在半导体衬底上。 该空间插入第一和第二特征并且从第一特征的第一端延伸到第二特征的第一端。 然后，第三特征与第一和第二特征相邻并基本上平行。 第三特征至少从第一特征的第一端延伸到第二特征的第一端。

公开(公告)号：US20130157462A1

公开(公告)日：2013-06-20

申请号：US13328680

申请日：2011-12-16

Applicant: Chia Ying Lee ,  Chih-Yuan Ting ,  Jyu-Horng Shieh ,  Minghsing Tsai ,  Syun-Ming Jang

Inventor： Chia Ying Lee ,  Chih-Yuan Ting ,  Jyu-Horng Shieh ,  Minghsing Tsai ,  Syun-Ming Jang

IPC: H01L21/28 ,  H01L21/302

CPC classification number: H01L21/3086 ,  H01L21/0337 ,  H01L21/0338 ,  H01L21/31144 ,  H01L21/32

Abstract: The present disclosure provides a method including providing a semiconductor substrate and forming a first layer and a second layer on the semiconductor substrate. The first layer is patterned to provide a first element, a second element, and a space interposing the first and second elements. Spacer elements are then formed on the sidewalls on the first and second elements of the first layer. Subsequently, the second layer is etched using the spacer elements and the first and second elements as a masking element.

公开(公告)号：USD614746S1

公开(公告)日：2010-04-27

申请号：US29341795

申请日：2009-08-12

Applicant: Victor Hoernig ,  Chia Ying Lee

Designer： Victor Hoernig ,  Chia Ying Lee