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公开(公告)号：US06803573B2
公开(公告)日：2004-10-12
申请号：US10615864
申请日：2003-07-10
申请人： Satoru Yamaguchi , Takashi Iizumi , Osamu Komuro , Hidetoshi Morokuma , Tatsuya Maeda , Juntaro Arima , Yasuhiko Ozawa
发明人： Satoru Yamaguchi , Takashi Iizumi , Osamu Komuro , Hidetoshi Morokuma , Tatsuya Maeda , Juntaro Arima , Yasuhiko Ozawa
IPC分类号： H01J3728
CPC分类号： H01J37/28 , G01N23/04 , G01N23/225 , G06T7/74 , G06T2207/10056 , G06T2207/30148 , H01J37/222 , H01J2237/2817
摘要： An object of the present invention is to provide a scanning electron microscope for reducing a process concerning inspection positioning or an input operation, thereby functioning with high precision at high speed. To accomplish the above object, the present invention provides a scanning electron microscope having a function for identifying a desired position on the basis of a pattern registered beforehand, which includes a means for setting information concerning the pattern kind, the interval between a plurality of parts constituting the pattern, and the size of parts constituting the pattern and a means for forming a pattern image composed of a plurality of parts on the basis of the information obtained by the concerned means.
摘要翻译： 本发明的目的是提供一种用于减少与检查定位或输入操作相关的处理的扫描电子显微镜，从而以高速度高精度地运行。 为了实现上述目的，本发明提供了一种扫描电子显微镜，其具有基于预先登记的图案来识别期望位置的功能，该扫描电子显微镜包括用于设置关于图案种类的信息的装置，多个部分之间的间隔 构成图案的部分，以及构成图案的部分的尺寸，以及基于由相关装置获得的信息形成由多个部分组成的图案图像的装置。
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公开(公告)号：US06627888B2
公开(公告)日：2003-09-30
申请号：US09792721
申请日：2001-02-23
申请人： Satoru Yamaguchi , Takashi Iizumi , Osamu Komuro , Hidetoshi Morokuma , Tatsuya Maeda , Juntaro Arima , Yasuhiko Ozawa
发明人： Satoru Yamaguchi , Takashi Iizumi , Osamu Komuro , Hidetoshi Morokuma , Tatsuya Maeda , Juntaro Arima , Yasuhiko Ozawa
IPC分类号： H01J3728
CPC分类号： H01J37/28 , G01N23/04 , G01N23/225 , G06T7/74 , G06T2207/10056 , G06T2207/30148 , H01J37/222 , H01J2237/2817
摘要： An object of the present invention is to provide a scanning electron microscope for reducing a process concerning inspection positioning or an input operation, thereby functioning with high precision at high speed. To accomplish the above object, the present invention provides a scanning electron microscope having a function for identifying a desired position on the basis of a pattern registered beforehand, which includes a means for setting information concerning the pattern kind, the interval between a plurality of parts constituting the pattern, and the size of parts constituting the pattern and a means for forming a pattern image composed of a plurality of parts on the basis of the information obtained by the concerned means.
摘要翻译： 本发明的目的是提供一种用于减少检查定位或输入操作的过程的扫描电子显微镜，从而以高精度高功能运行。为了实现上述目的，本发明提供一种扫描电子显微镜，其具有 用于基于预先登记的图案来识别期望位置的功能，其包括用于设置关于图案种类的信息的装置，构成图案的多个部分之间的间隔和构成图案的部分的尺寸的装置，以及用于 基于由相关装置获得的信息，形成由多个部分组成的图案图像。
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公开(公告)号：US07369703B2
公开(公告)日：2008-05-06
申请号：US11501843
申请日：2006-08-10
CPC分类号： G01N23/2251 , G01N21/95684 , G03F7/70616 , G06T7/0004 , G06T2207/30148 , H01J2237/2817
摘要： A system for measuring a pattern on a sample, including: a data processing system that processes a set of two-dimensional distribution data of intensities from the sample, to calculate: a set of edge points indicative of position of edges of the pattern in a two-dimensional plane from the two-dimensional distribution data; an approximation edge indicative of the edge of the pattern; an edge fluctuation data by calculating a difference between the set of edge points and the approximation edge; and a correlation between a first portion of the edge fluctuation data and a second portion of the edge fluctuation data.
摘要翻译： 一种用于测量样本上的图案的系统，包括：数据处理系统，处理来自样本的一组强度的二维分布数据，以计算：一组边缘点，其指示图案的边缘的位置 二维平面从二维分布数据; 指示图案的边缘的近似边缘; 通过计算边缘点集合和近似边缘之间的差异的边缘波动数据; 以及边缘波动数据的第一部分与边缘波动数据的第二部分之间的相关性。
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公开(公告)号：US20060269121A1
公开(公告)日：2006-11-30
申请号：US11501843
申请日：2006-08-10
IPC分类号： G06K9/00
CPC分类号： G01N23/2251 , G01N21/95684 , G03F7/70616 , G06T7/0004 , G06T2207/30148 , H01J2237/2817
摘要： A system for measuring a pattern on a sample, including: a data processing system that processes a set of two-dimensional distribution data of intensities from the sample, to calculate: a set of edge points indicative of position of edges of said pattern in a two-dimensional plane from said two-dimensional distribution data; an approximation edge indicative of the edge of the pattern; an edge roughness data by calculating a difference between the set of edge points and said approximation edge; and a correlation between a first portion of the edge roughness data and a second portion of the edge roughness data.
摘要翻译： 一种用于测量样本上的图案的系统，包括：数据处理系统，处理来自样本的一组强度的二维分布数据，以计算：一组指示所述图案的边缘位置的边缘点， 二维平面从所述二维分布数据; 指示图案的边缘的近似边缘; 通过计算所述一组边缘点和所述近似边缘之间的差异的边缘粗糙度数据; 以及边缘粗糙度数据的第一部分与边缘粗糙度数据的第二部分之间的相关性。
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公开(公告)号：US07095884B2
公开(公告)日：2006-08-22
申请号：US10071097
申请日：2002-02-11
IPC分类号： G06K9/00
CPC分类号： G01N23/2251 , G01N21/95684 , G03F7/70616 , G06T7/0004 , G06T2207/30148 , H01J2237/2817
摘要： The present invention provides a circuit pattern edge inspection method of finding out a failure in a fabricating process and image distortion in an observing apparatus by analyzing, by a non-destructive inspection, the shape of an edge of a line of a fine pattern in which characteristics of the material, process, and an exposure optical system in a semiconductor fabricating process appear, and performing analysis quantitatively. The method includes a step of detecting a set of edge points indicative of positions of edges of the pattern in a two-dimensional plane by a threshold method; a step of obtaining an approximation line for the set of edge points detected; and a step of obtaining an edge roughness shape and a characteristic by calculating the difference between the set of the edge points and the approximation line. A plurality of values are used as thresholds used for the threshold method.
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16.发明申请METHOD OF DETERMINING THE CONCAVITY AND CONVEXITY ON SAMPLE SURFACE, AND CHARGED PARTICLE BEAM APPARATUS 审中-公开确定样品表面的浓度和渗透率的方法和带电粒子束装置公开(公告)号：US20120305764A1
公开(公告)日：2012-12-06
申请号：US13570931
申请日：2012-08-09
IPC分类号： G01N23/225
CPC分类号： G01B15/08 , H01J37/28 , H01J2237/2814 , H01J2237/2817
摘要： A method and apparatus suitable for determining the concavity and convexity of line and space patterns formed on a sample. A profile is formed based on a charged-particle beam scan, the profile having a peak. When one foot portion of the peak converges more gradually than the other foot portion, a portion of the sample corresponding to the one foot portion is determined to be a convex portion. Alternatively, when one foot portion of the peak converges more steeply than the other foot portion, a portion of the sample corresponding to the one foot portion is determined to be a concave portion.
摘要翻译： 适用于确定在样品上形成的线和空间图案的凹凸的方法和装置。 基于带电粒子束扫描形成轮廓，轮廓具有峰值。 当峰的一个脚部比另一个脚部更加逐渐收敛时，与一个脚部相对应的部分样本被确定为凸部。 或者，当峰的一个脚部比另一个脚部收敛得更陡峭时，与一个脚部对应的样本的一部分被确定为凹部。
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公开(公告)号：US07619751B2
公开(公告)日：2009-11-17
申请号：US12125444
申请日：2008-05-22
申请人： Atsuko Yamaguchi , Hiroshi Fukuda , Osamu Komuro , Hiroki Kawada
发明人： Atsuko Yamaguchi , Hiroshi Fukuda , Osamu Komuro , Hiroki Kawada
CPC分类号： G01N23/2251
摘要： A quantity (or dispersion value) of a distribution of edge position due to random noise is expected to be reduced statistically to 1/N when N edge position data items are averaged. Using this property, the single page image is averaged in a vertical direction with various values of parameter S, and then the edge roughness index is calculated. The S-dependence of the edge roughness index is analyzed and a term of a dispersion value directly proportional to 1/S is determined as being due to noise.
摘要翻译： 当N个边缘位置数据项被平均时，由于随机噪声导致的边缘位置分布的数量（或色散值）预期在统计上降低到1 / N。 使用该属性，将单页图像在垂直方向上与参数S的各种值进行平均，然后计算边缘粗糙度指数。 分析边缘粗糙度指数的S依赖性，并将与1 / S成正比的色散值的项确定为由噪声引起的。
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公开(公告)号：US20090226096A1
公开(公告)日：2009-09-10
申请号：US12393321
申请日：2009-02-26
IPC分类号： G06K9/48
CPC分类号： G06K9/4609 , G06T7/13
摘要： An object of the present invention is to provide an edge detection technique and equipment which are capable of stably detecting an edge by suppressing the influence of noise even in the case where the image is obtained by charged particle radiation equipment, such as a scanning electron microscope and has a low S/N ratio. More specifically, the present invention is to propose a technique and equipment which are configured to determine a peak position (edge) on the basis of the following two edge extraction techniques. That is, the present invention is to propose a technique and equipment wherein at least two peaks are formed by using, as edge detection techniques, for example, one peak detection technique having a relatively high sensitivity and the other peak detection technique which is relatively less susceptible to the influence of noise than the one peak detection technique, and wherein a position where the peaks coincide with each other is determined as a true peak position (edge position).
摘要翻译： 本发明的目的是提供一种能够通过抑制噪声的影响来稳定地检测边缘的边缘检测技术和设备，即使在通过诸如扫描电子显微镜的带电粒子辐射设备获得图像的情况下 并具有较低的S / N比。 更具体地，本发明是提出一种被配置为基于以下两个边缘提取技术来确定峰值位置（边缘）的技术和设备。 也就是说，本发明提出一种技术和设备，其中通过使用作为边缘检测技术的至少两个峰形成例如具有相对较高灵敏度的一个峰值检测技术和相对较少的另一个峰值检测技术 容易受到噪声的影响而不是一个峰值检测技术，并且其中峰值彼此一致的位置被确定为真正的峰值位置（边缘位置）。
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公开(公告)号：US20090020699A1
公开(公告)日：2009-01-22
申请号：US12208389
申请日：2008-09-11
申请人： Fumihiro Sasajima , Osamu Komuro , Fumio Mizuno
发明人： Fumihiro Sasajima , Osamu Komuro , Fumio Mizuno
IPC分类号： G01N23/225
CPC分类号： G03F7/70608 , G01N23/225 , G06T7/0004 , H01J37/265 , H01J37/28 , H01J2237/221 , H01J2237/24592 , H01J2237/2487
摘要： The edges of the reticle are detected with respect to the microstructured patterns exposed by the stepper, and the shapes of the microstructured patterns at the surface and at the bottom of the photoresist are detected. The microstructured patterns are evaluated by calculating, and displaying on the screen, the dislocation vector that represents the relationship in position between the detected patterns on the surface and at the bottom of the photoresist. Furthermore, dislocation vectors between the microstructured patterns at multiple positions in a single-chip or single-shot area or on one wafer are likewise calculated, then the sizes and distribution status of the dislocation vectors at each such position are categorized as characteristic quantities, and the corresponding tendencies are analyzed. Thus, stepper or wafer abnormality is detected.
摘要翻译： 相对于由步进器暴露的微结构化图案检测掩模版的边缘，并且检测光致抗蚀剂表面和底部处的微结构图案的形状。 通过在屏幕上计算和显示代表光刻胶表面和底部上检测到的图案之间的位置关系的位错矢量来评估微结构化图案。 此外，同样计算单芯片或单次照射区域或一个晶片上的多个位置处的微结构化图案之间的位错矢量，则将每个这样的位置处的位错矢量的尺寸和分布状态分类为特征量，并且 分析相应的趋势。 因此，检测到步进器或晶片异常。
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公开(公告)号：US07435959B2
公开(公告)日：2008-10-14
申请号：US11798395
申请日：2007-05-14
申请人： Fumihiro Sasajima , Osamu Komuro , Fumio Mizuno
发明人： Fumihiro Sasajima , Osamu Komuro , Fumio Mizuno
IPC分类号： G01N23/225
CPC分类号： G03F7/70608 , G01N23/225 , G06T7/0004 , H01J37/265 , H01J37/28 , H01J2237/221 , H01J2237/24592 , H01J2237/2487
摘要： The edges of the reticle are detected with respect to the microstructured patterns exposed by the stepper, and the shapes of the microstructured patterns at the surface and at the bottom of the photoresist are detected. The microstructured patterns are evaluated by calculating, and displaying on the screen, the dislocation vector that represents the relationship in position between the detected patterns on the surface and at the bottom of the photoresist. Furthermore, dislocation vectors between the microstructured patterns at multiple positions in a single-chip or single-shot area or on one wafer are likewise calculated, then the sizes and distribution status of the dislocation vectors at each such position are categorized as characteristic quantities, and the corresponding tendencies are analyzed. Thus, stepper or wafer abnormality is detected.
摘要翻译： 相对于由步进器暴露的微结构化图案检测掩模版的边缘，并且检测光致抗蚀剂表面和底部处的微结构图案的形状。 通过在屏幕上计算和显示代表光刻胶表面和底部上检测到的图案之间的位置关系的位错矢量来评估微结构化图案。 此外，同样计算单芯片或单次照射区域或一个晶片上的多个位置处的微结构化图案之间的位错矢量，则将每个这样的位置处的位错矢量的尺寸和分布状态分类为特征量，并且 分析相应的趋势。 因此，检测到步进器或晶片异常。
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