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1.发明申请METHOD OF DETERMINING THE CONCAVITY AND CONVEXITY ON SAMPLE SURFACE, AND CHARGED PARTICLE BEAM APPARATUS 审中-公开确定样品表面的浓度和渗透率的方法和带电粒子束装置公开(公告)号：US20120305764A1
公开(公告)日：2012-12-06
申请号：US13570931
申请日：2012-08-09
IPC分类号： G01N23/225
CPC分类号： G01B15/08 , H01J37/28 , H01J2237/2814 , H01J2237/2817
摘要： A method and apparatus suitable for determining the concavity and convexity of line and space patterns formed on a sample. A profile is formed based on a charged-particle beam scan, the profile having a peak. When one foot portion of the peak converges more gradually than the other foot portion, a portion of the sample corresponding to the one foot portion is determined to be a convex portion. Alternatively, when one foot portion of the peak converges more steeply than the other foot portion, a portion of the sample corresponding to the one foot portion is determined to be a concave portion.
摘要翻译： 适用于确定在样品上形成的线和空间图案的凹凸的方法和装置。 基于带电粒子束扫描形成轮廓，轮廓具有峰值。 当峰的一个脚部比另一个脚部更加逐渐收敛时，与一个脚部相对应的部分样本被确定为凸部。 或者，当峰的一个脚部比另一个脚部收敛得更陡峭时，与一个脚部对应的样本的一部分被确定为凹部。
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公开(公告)号：US20070114399A1
公开(公告)日：2007-05-24
申请号：US11651498
申请日：2007-01-10
CPC分类号： H01J37/222 , G01N23/225 , G03F7/70625 , H01J37/28 , H01J2237/24578 , H01J2237/2814
摘要： A pattern measuring method calculates an average pattern shape from a plurality of the same patterns appearing within an image captured using an electron microscope, and compares pattern information at each measuring position with average pattern information to determine roughness.
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公开(公告)号：US20050211897A1
公开(公告)日：2005-09-29
申请号：US11066219
申请日：2005-02-28
IPC分类号： G01B15/00 , G01N23/00 , G01N23/225 , G21K7/00 , H01J37/28
CPC分类号： H01J37/222 , G01N23/225 , G03F7/70625 , H01J37/28 , H01J2237/24578 , H01J2237/2814
摘要： A pattern measuring method calculates an average pattern shape from a plurality of the same patterns appearing within an image captured using an electron microscope, and compares pattern information at each measuring position with average pattern information to determine roughness.
摘要翻译： 图案测量方法从使用电子显微镜拍摄的图像中出现的多个相同图案计算平均图案形状，并且将每个测量位置处的图案信息与平均图案信息进行比较以确定粗糙度。
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公开(公告)号：US07288764B2
公开(公告)日：2007-10-30
申请号：US11651498
申请日：2007-01-10
IPC分类号： H01J37/49
CPC分类号： H01J37/222 , G01N23/225 , G03F7/70625 , H01J37/28 , H01J2237/24578 , H01J2237/2814
摘要： A pattern measuring method calculates an average pattern shape from a plurality of the same patterns appearing within an image captured using an electron microscope, and compares pattern information at each measuring position with average pattern information to determine roughness.
摘要翻译： 图案测量方法从使用电子显微镜拍摄的图像中出现的多个相同图案计算平均图案形状，并且将每个测量位置处的图案信息与平均图案信息进行比较以确定粗糙度。
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公开(公告)号：US07180062B2
公开(公告)日：2007-02-20
申请号：US11066219
申请日：2005-02-28
IPC分类号： H01J37/49
CPC分类号： H01J37/222 , G01N23/225 , G03F7/70625 , H01J37/28 , H01J2237/24578 , H01J2237/2814
摘要： A pattern measuring method calculates an average pattern shape from a plurality of the same patterns appearing within an image captured using an electron microscope, and compares pattern information at each measuring position with average pattern information to determine roughness.
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6.发明申请PATTERN MEASURING METHOD, PATTERN MEASURING APPARATUS, AND PROGRAM USING SAME 有权图案测量方法，图案测量装置和使用其的程序公开(公告)号：US20130216121A1
公开(公告)日：2013-08-22
申请号：US13882147
申请日：2011-10-14
IPC分类号： G06K9/00
CPC分类号： G06K9/00523 , G03F7/70625 , H01J37/28 , H01J2237/24578 , H01J2237/24592 , H01J2237/2817 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： In measuring pattern with large process fluctuation, correct measurement cannot be carried out if noises, such as pattern that is not the subject to be measured, and dirt, are present in periphery of pattern to be measured in previously registered measurement region. Among the image data of sample, predetermined region aligned by pattern matching is set as region not to be measured that is excluded from subjects of pattern measurement. For example, in measuring pattern with large process fluctuation, only region including pattern with small process fluctuation is used in pattern matching, while in measuring the pattern, predetermined region, which was used in pattern matching and aligned, is set as region not to be measured. Stable pattern measurement can be easily carried out with respect to pattern with large process fluctuation, without being affected by region where measurement region and region not to be measured overlap with each other.
摘要翻译： 在具有大的工艺波动的测量图形中，如果在先前记录的测量区域中的要测量的图案的周围存在噪声，例如不被测量的图案和污物，则不能进行正确的测量。 在样本的图像数据中，通过图案匹配对准的预定区域被设置为从图案测量对象排除的不被测量的区域。 例如，在具有大的工艺波动的测量图案中，在图案匹配中仅使用包括具有小的工艺波动的图案的区域，而在测量图案时，在图案匹配和对准中使用的预定区域被设置为不是 测量。 相对于具有大的工艺波动的图案，可以容易地进行稳定的图案测量，而不受测量区域和不被测量的区域彼此重叠的区域的影响。
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7.发明申请CHARGED PARTICLE BEAM ADJUSTING METHOD AND CHARGED PARTICLE BEAM APPARATUS 审中-公开充电颗粒光束调节方法和充电颗粒光束装置公开(公告)号：US20100181478A1
公开(公告)日：2010-07-22
申请号：US12749271
申请日：2010-03-29
IPC分类号： H01J37/28 , H01J37/10 , H01J37/147
CPC分类号： H01J37/21 , H01J37/153 , H01J2237/216 , H01J2237/221
摘要： In an apparatus for obtaining an image by irradiating a charged particle beam on a specimen, a condition of the beam conditioned differently from vertical incidence as in the case of the beam being tilted is required to be adjusted. To this end, the apparatus has a controller for automatically controlling a stigmator, an objective lens and a deflector such that astigmatism is corrected, focus is adjusted and view filed shift is corrected. The controller has a selector for inhibiting at least one of the astigmatism correction, focus adjustment and FOV shift correction from being executed.
摘要翻译： 在用于通过将带电粒子束照射在样本上来获得图像的装置中，需要调整如在光束倾斜的情况下不同于垂直入射而调节的光束的条件。 为此，该装置具有用于自动控制瞄光器，物镜和偏转器的控制器，从而校正像散，调整焦点并校正视野移动。 控制器具有用于禁止执行散光校正，聚焦调整和FOV偏移校正中的至少一个的选择器。
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8.发明授权Pattern measuring method, pattern measuring apparatus, and program using same 有权图案测量方法，图案测量装置和使用其的程序公开(公告)号：US09104913B2
公开(公告)日：2015-08-11
申请号：US13882147
申请日：2011-10-14
CPC分类号： G06K9/00523 , G03F7/70625 , H01J37/28 , H01J2237/24578 , H01J2237/24592 , H01J2237/2817 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： In measuring pattern with large process fluctuation, correct measurement cannot be carried out if noises, such as pattern that is not the subject to be measured, and dirt, are present in periphery of pattern to be measured in previously registered measurement region. Among the image data of sample, predetermined region aligned by pattern matching is set as region not to be measured that is excluded from subjects of pattern measurement. For example, in measuring pattern with large process fluctuation, only region including pattern with small process fluctuation is used in pattern matching, while in measuring the pattern, predetermined region, which was used in pattern matching and aligned, is set as region not to be measured. Stable pattern measurement can be easily carried out with respect to pattern with large process fluctuation, without being affected by region where measurement region and region not to be measured overlap with each other.
摘要翻译： 在具有大的工艺波动的测量图形中，如果在先前记录的测量区域中的要测量的图案的周围存在噪声，例如不被测量的图案和污物，则不能进行正确的测量。 在样本的图像数据中，通过图案匹配对准的预定区域被设置为从图案测量对象排除的不被测量的区域。 例如，在具有大的工艺波动的测量图案中，在图案匹配中仅使用包括具有小的工艺波动的图案的区域，而在测量图案时，在图案匹配和对准中使用的预定区域被设置为不是 测量。 相对于具有大的工艺波动的图案，可以容易地进行稳定的图案测量，而不受测量区域和不被测量的区域彼此重叠的区域的影响。
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9.发明授权公开(公告)号：US07705300B2
公开(公告)日：2010-04-27
申请号：US11104631
申请日：2005-04-13
IPC分类号： G01N23/00
CPC分类号： H01J37/21 , H01J37/153 , H01J2237/216 , H01J2237/221
摘要： In an apparatus for obtaining an image by irradiating a charged particle beam on a specimen, a condition of the beam conditioned differently from vertical incidence as in the case of the beam being tilted is required to be adjusted. To this end, the apparatus has a controller for automatically controlling a stigmator, an objective lens and a deflector such that astigmatism is corrected, focus is adjusted and view filed shift is corrected. The controller has a selector for inhibiting at least one of the astigmatism correction, focus adjustment and FOV shift correction from being executed.
摘要翻译： 在用于通过将带电粒子束照射在样本上来获得图像的装置中，需要调整如在光束倾斜的情况下不同于垂直入射而调节的光束的条件。 为此，该装置具有用于自动控制瞄光器，物镜和偏转器的控制器，从而校正像散，调整焦点并校正视野移动。 控制器具有用于禁止执行散光校正，聚焦调整和FOV偏移校正中的至少一个的选择器。
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10.发明申请公开(公告)号：US20050236570A1
公开(公告)日：2005-10-27
申请号：US11104631
申请日：2005-04-13
IPC分类号： G21K5/04 , G21K1/08 , G21K7/00 , H01J37/153
CPC分类号： H01J37/21 , H01J37/153 , H01J2237/216 , H01J2237/221
摘要： In an apparatus for obtaining an image by irradiating a charged particle beam on a specimen, a condition of the beam conditioned differently from vertical incidence as in the case of the beam being tilted is required to be adjusted. To this end, the apparatus has a controller for automatically controlling a stigmator, an objective lens and a deflector such that astigmatism is corrected, focus is adjusted and view filed shift is corrected. The controller has a selector for inhibiting at least one of the astigmatism correction, focus adjustment and FOV shift correction from being executed.
摘要翻译： 在用于通过将带电粒子束照射在样本上来获得图像的装置中，需要调整如在光束倾斜的情况下不同于垂直入射而调节的光束的条件。 为此，该装置具有用于自动控制瞄光器，物镜和偏转器的控制器，从而校正像散，调整焦点并校正视野移动。 控制器具有用于禁止执行散光校正，聚焦调整和FOV偏移校正中的至少一个的选择器。
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