Copper fuse for integrated circuit
    14.
    发明授权
    Copper fuse for integrated circuit 有权
    铜保险丝用于集成电路

    公开(公告)号:US06455913B2

    公开(公告)日:2002-09-24

    申请号:US09495625

    申请日:2000-01-31

    CPC classification number: H01L23/5256 H01L2924/0002 H01L2924/00

    Abstract: A copper fuse structure for integrated circuit employs two copper pads formed over a semiconductor substrate. The two copper pads are electrically insulated by dielectrics. An aluminum line is utilized to cover and electrically connect the two copper pads.

    Abstract translation: 用于集成电路的铜熔丝结构采用在半导体衬底上形成的两个铜焊盘。 两个铜焊盘由电介质电绝缘。 铝线用于覆盖和电连接两个铜焊盘。

    Apparatus and method for controlling subscriber identity module card
    15.
    发明授权
    Apparatus and method for controlling subscriber identity module card 有权
    用于控制用户识别模块卡的装置和方法

    公开(公告)号:US08554276B2

    公开(公告)日:2013-10-08

    申请号:US12472075

    申请日:2009-05-26

    CPC classification number: H04B1/401 H04B1/3816 H04W92/08

    Abstract: A Subscriber Identity Module (SIM) card control apparatus applied to a mobile communication device is provided. The mobile communication device has a first SIM card and a second SIM card. The SIM card control apparatus includes a judgment unit, a SIM card controller and a switch device. The judgment unit is used to generate a selection signal according to a to-be-accessed SIM card among the first and the second SIM cards. The SIM card controller transmits signals via a group of signal lines. The switch device is used to selectively connect the group of signal lines to the first SIM card or the second SIM card according to the selection signal.

    Abstract translation: 提供了一种应用于移动通信设备的用户识别模块(SIM)卡控制设备。 移动通信设备具有第一SIM卡和第二SIM卡。 SIM卡控制装置包括判断单元,SIM卡控制器和开关装置。 判断单元用于根据第一和第二SIM卡中的要被访问的SIM卡生成选择信号。 SIM卡控制器通过一组信号线发送信号。 开关装置用于根据选择信号将信号线组选择性地连接到第一SIM卡或第二SIM卡。

    Method for improving the resolution of optic lithography
    19.
    发明授权
    Method for improving the resolution of optic lithography 有权
    提高光刻分辨率的方法

    公开(公告)号:US06797457B2

    公开(公告)日:2004-09-28

    申请号:US10119688

    申请日:2002-04-11

    Applicant: Chih-Yung Lin

    Inventor: Chih-Yung Lin

    CPC classification number: G03F7/0042 G03F7/265

    Abstract: A method for improving the resolution of optic lithographic is disclosed. The method includes a step of forming an etched layer on the substrate, an inorganic photoresist layer is spun-on the etched layer, and an atomic layer on the inorganic photoresist layer. Then, a deep ultraviolet light is illuminated to the inorganic photoresist layer such that the acid molecular is formed from inorganic photoresist layer. Next, the atomic layer is catalyzed by acid molecular and converted to metallic oxide by active oxygen atom. After oxidation, the oxide pattern can be obtained and it is easy by etching process.

    Abstract translation: 公开了一种用于提高光学光刻的分辨率的方法。 该方法包括在基板上形成蚀刻层的步骤,在蚀刻层上旋转无机光致抗蚀剂层,在无机光致抗蚀剂层上形成原子层。 然后,对无机光致抗蚀剂层照射深紫外光,使得酸分子由无机光致抗蚀剂层形成。 接下来,原子层由酸分子催化并通过活性氧原子转化为金属氧化物。 氧化后,可以获得氧化物图案,并且通过蚀刻工艺容易。

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