公开(公告)号：US20230219280A1

公开(公告)日：2023-07-13

申请号：US18179820

申请日：2023-03-07

Applicant: FUJIFILM Corporation

Inventor： Akihiro HAKAMATA

IPC: B29C59/00 ,  B29C59/02

CPC classification number: B29C59/005 ,  B29C59/002 ,  B29C59/02

Abstract: Provided are a method for producing a composition for forming an imprint pattern, including a filtering step of filtering a precursor composition to obtain a composition for forming an imprint pattern, in which in the filtering step, a speed at which the precursor composition passes through a filter does not continuously exceed 0.9 cm per hour for 10 seconds or longer; a method for producing a cured substance formed of the composition for forming an imprint pattern; an imprint pattern producing method using the composition for forming an imprint pattern; and a method for manufacturing a device, which includes the imprint pattern producing method.

公开(公告)号：US20230004079A1

公开(公告)日：2023-01-05

申请号：US17890374

申请日：2022-08-18

Applicant: FUJIFILM Corporation

Inventor： Naoya SHIMOJU ,  Akihiro HAKAMATA

IPC: G03F7/00 ,  G03F7/40 ,  G03F7/031

Abstract: Provided are a curable composition used for forming an interlayer existing between a base material and a curable layer, the curable composition including a curable main agent having a polymerizable functional group, a polymerization inhibitor, and a solvent, in which a content of the polymerization inhibitor is 1 part by mass or greater and lower than 1,000 parts by mass with respect to 1,000,000 parts by mass of the curable main agent; a kit including the curable composition; an interlayer formed from the curable composition; a laminate including the interlayer; an imprint pattern producing method using the laminate; and a method for manufacturing a device including the imprint pattern producing method.

公开(公告)号：US20220009153A1

公开(公告)日：2022-01-13

申请号：US17484582

申请日：2021-09-24

Applicant: FUJIFILM Corporation

Inventor： Yuichiro GOTO ,  Naoya SHIMOJU ,  Akinori SHIBUYA ,  Akihiro HAKAMATA

IPC: B29C59/02 ,  C08F2/50 ,  C08F220/10 ,  G03F7/20 ,  G03F7/004

Abstract: Provided are: a composition for forming a pattern, which contains a polymerizable compound, a photopolymerization initiator, and a sensitizer containing two or more of at least one kind of atom selected from the group consisting of a nitrogen atom and a sulfur atom, in which a length of a specific atom chain from one atom to another atom among the two or more atoms is 2 or 3 in terms of the number of atoms; a kit to which the composition for forming a pattern is applied; a cured film; a laminate; a pattern producing method; and a method for manufacturing a semiconductor element.

公开(公告)号：US20210018833A1

公开(公告)日：2021-01-21

申请号：US17030496

申请日：2020-09-24

Applicant: FUJIFILM Corporation

Inventor： Yuichiro GOTO ,  Akihiro HAKAMATA ,  Naoya SHIMOJU

IPC: G03F7/00 ,  G03F7/004 ,  G03F7/029 ,  C08F2/50 ,  C08F22/10

Abstract: A curable composition for imprinting according to an embodiment of the present invention includes a monofunctional polymerizable compound having the following structure, a photopolymerization initiator, and a release agent represented by the following Formula (I) or Formula (II).
The monofunctional polymerizable compound has the following structure: a linear or branched alkyl group, or an alicyclic ring, an aromatic ring, or an aromatic heterocycle that is substituted with a linear or branched alkyl group. The release agent is represented by the following Formula (I) or Formula (II). A1-(B1)x1-(D1)y1-(E1)z1-F1  Formula (I), A2-(B2)x2-(D2)y2-(E2)z2-F2  Formula (II), A1 and A2 represent a linear aliphatic hydrocarbon group having 4 to 11 carbon atoms, D1 and D2 represent an alkylene oxide structure, F1 represents a polar functional group, and F2 represents a hydrogen atom, or a linear, branched, or cyclic aliphatic hydrocarbon group having 4 to 11 carbon atoms. Further, the present invention relates to a release agent, a cured product, a pattern forming method, and a lithography method that relate to the curable composition for imprinting.