公开(公告)号：US20220009152A1

公开(公告)日：2022-01-13

申请号：US17484492

申请日：2021-09-24

Applicant: FUJIFILM Corporation

Inventor： Akihiro HAKAMATA ,  Naoya SHIMOJU ,  Yuichiro GOTO

IPC: B29C59/02 ,  C08F2/50 ,  C08F220/10 ,  G03F7/20 ,  G03F7/004

Abstract: Provided are: a composition for forming an underlayer film in an imprinting method, which includes a high-molecular-weight compound having a polymerizable functional group and a monomer having a plurality of crosslinking functional groups capable of being bonded to the polymerizable functional group, and in which a Hansen solubility parameter distance, which is a difference between a Hansen solubility parameter of the high-molecular-weight compound and a Hansen solubility parameter of the monomer, is 5.0 or less, and regarding the two crosslinking functional groups among the plurality of crosslinking functional groups, the number of atoms, which constitute a shortest atom chain mutually linking crosslinking points in the respective crosslinking functional groups, is 7 or more; a laminate including a layer formed of the composition for forming an underlayer film; and a method for manufacturing a semiconductor element, in which a semiconductor element is manufactured using a pattern obtained by a pattern producing method.

公开(公告)号：US20170247544A1

公开(公告)日：2017-08-31

申请号：US15592749

申请日：2017-05-11

Applicant: FUJIFILM Corporation

Inventor： Kazunari YAGI ,  Keiichi TATEISHI ,  Takashi IIZUMI ,  Akihiro HAKAMATA ,  Yoshihiko FUJIE

IPC: C09B11/28 ,  B41M5/52 ,  D06P1/40 ,  C09D11/328 ,  D06P3/24 ,  B41J3/407 ,  B41J2/21

CPC classification number: C09B11/28 ,  B41J2/01 ,  B41J2/21 ,  B41J3/4078 ,  B41M5/00 ,  B41M5/50 ,  B41M5/52 ,  C09B11/24 ,  C09D11/328 ,  C09D11/54 ,  D06P1/00 ,  D06P1/40 ,  D06P3/04 ,  D06P3/241 ,  D06P5/00

Abstract: Provided are: a coloring composition for dyeing including a compound represented by Formula (1) shown in this specification or a salt thereof; a coloring composition for textile printing in which the coloring composition for dyeing is used for textile printing; a compound which is preferable as a material of the coloring compositions; a textile printing method in which the above-described coloring composition for textile printing is used; an ink for ink jet textile printing including the above-described coloring composition for textile printing; and a dyed fabric.

公开(公告)号：US20230250311A1

公开(公告)日：2023-08-10

申请号：US18188026

申请日：2023-03-22

Applicant: FUJIFILM Corporation

Inventor： Naoya SHIMOJU ,  Akihiro HAKAMATA

IPC: C09D133/14 ,  H01L21/027 ,  B29C59/02

CPC classification number: C09D133/14 ,  H01L21/0271 ,  B29C59/022 ,  B29C59/026

Abstract: Provided are a method for producing a composition for forming an interlayer for nanoimprint, the method including a filtering step of filtering a precursor composition 1 including a resin having a polymerizable group with a filter, a step of adding a solvent to the precursor composition 1 after the step to obtain a precursor composition 2, and a filtering step of filtering the precursor composition 2 with a filter, in which a proportion of a total solid content of the obtained composition is 0.1% to 1.0% by mass; a method for producing a laminate formed of the composition for forming an interlayer; an imprint pattern producing method using the composition for forming an interlayer; and a method for manufacturing a device, which includes the imprint pattern producing method.

公开(公告)号：US20230058755A1

公开(公告)日：2023-02-23

申请号：US17888905

申请日：2022-08-16

Applicant: FUJIFILM Corporation

Inventor： Naoya SHIMOJU ,  Akihiro HAKAMATA

IPC: G03F7/00 ,  G03F7/075 ,  G03F7/34

Abstract: There are provided a curable composition for imprinting, the curable composition including a polymerizable compound having two or more radical polymerizable groups, a radical polymerization initiator, and at least one compound selected from the group consisting of an organopolysiloxane having only one radical polymerizable group and an organopolysiloxane having no or one radical polymerizable group and having a poly(oxyalkylene) group, a cured product of the curable composition for imprinting, a method for producing an imprint pattern using the curable composition for imprinting, and a method for producing a device, the method including the method for producing an imprint pattern.

公开(公告)号：US20230383044A1

公开(公告)日：2023-11-30

申请号：US18360092

申请日：2023-07-27

Applicant: FUJIFILM Corporation

Inventor： Akihiro HAKAMATA

IPC: C08F290/06 ,  C08F299/00 ,  H01L21/027 ,  G03F7/00

CPC classification number: C08F290/068 ,  C08F299/00 ,  H01L21/0273 ,  G03F7/0002 ,  B29C59/02

Abstract: Provided are a composition for forming an imprint pattern, containing a polymerizable compound, a polymerization initiator, and a derivative of the polymerization initiator; a cured substance of the composition for forming an imprint pattern; a device including the cured substance; an imprint pattern producing method using the composition for forming an imprint pattern; and a method for manufacturing a device, including the imprint pattern producing method.

公开(公告)号：US20220380505A1

公开(公告)日：2022-12-01

申请号：US17874727

申请日：2022-07-27

Applicant: FUJIFILM Corporation

Inventor： Akihiro HAKAMATA

IPC: C08F222/10 ,  C08F2/50 ,  G03F7/00

Abstract: Provided are a composition for forming an imprint pattern, containing a polymerizable compound, a polymerization initiator, and a dye, in which the dye is a compound which has no metal element in a chemical structure; a cured substance consisting of the composition for forming an imprint pattern; an imprint pattern producing method using the composition for forming an imprint pattern; and a method for manufacturing a device, including the imprint pattern producing method.

公开(公告)号：US20210403630A1

公开(公告)日：2021-12-30

申请号：US17473302

申请日：2021-09-13

Applicant: FUJIFILM Corporation

Inventor： Akihiro HAKAMATA ,  Yuichiro Goto ,  Naoya Shimoju

IPC: C08F290/12 ,  C08F299/00 ,  B29C59/02 ,  G03F7/00 ,  H01L21/027

Abstract: Provided are: a composition for forming an underlayer film for imprinting, which contains a high-molecular-weight compound having a polymerizable group, a chelating agent, and a solvent, and a method for producing the same; a kit including the composition for forming an underlayer film; a pattern producing method using the composition for forming an underlayer film; and a method for manufacturing a semiconductor element, which includes the pattern producing method as a step.

公开(公告)号：US20220204814A1

公开(公告)日：2022-06-30

申请号：US17696885

申请日：2022-03-17

Applicant: FUJIFILM Corporation

Inventor： Naoya SHIMOJU ,  Akihiro HAKAMATA

IPC: C09J7/30 ,  C09J7/20 ,  C09J125/18 ,  C09J125/02 ,  G03F7/00 ,  H01L21/027

Abstract: Provided are a composition for forming an adhesive film for imprinting, including a resin having a specific aromatic ring and a polymerizable functional group in a side chain, in which the specific aromatic ring is an unsubstituted aromatic ring, or an aromatic ring having one or more substituents, in which a formula weight of each of the one or more substituents is 1000 or less, and a proportion of a polymerizable functional group including a heterocyclic ring in the polymerizable functional group is less than 3 mol %; an adhesive film to which the composition for forming an adhesive film is applied; a laminate; a method for manufacturing a laminate; a pattern producing method; and a method for manufacturing a semiconductor element.

公开(公告)号：US20210206910A1

公开(公告)日：2021-07-08

申请号：US17211843

申请日：2021-03-25

Applicant: FUJIFILM Corporation

Inventor： Yuichiro GOTO ,  Akihiro HAKAMATA

IPC: C08G61/04 ,  C08K3/08 ,  C08F222/10 ,  H01L21/027 ,  G03F7/00

Abstract: Provided are a composition for forming an underlayer film for imprinting, including a curable component, and a particulate metal which has a particle diameter of 10 nm or larger, as measured by a single particle ICP-MASS method, and contains at least one kind of iron, copper, titanium, or lead, in which a content of the particulate metal is 50 ppt by mass to 10 ppb by mass with respect to the composition; a method for producing a composition for forming an underlayer film for imprinting; a pattern producing method; a method for manufacturing a semiconductor element; a cured product; and a kit.

公开(公告)号：US20200278610A1

公开(公告)日：2020-09-03

申请号：US16876687

申请日：2020-05-18

Applicant: FUJIFILM Corporation

Inventor： Tatsuya SHIMOYAMA ,  Akihiro HAKAMATA

IPC: G03F7/033 ,  G03F7/038 ,  G03F7/20 ,  G03F7/26 ,  C08F220/18 ,  C08F222/20 ,  C08F220/52 ,  B32B27/16 ,  B32B27/26 ,  G06F3/044 ,  H05K3/28

Abstract: A transfer film includes a temporary support; and a photosensitive layer, in which the photosensitive layer includes a polymer A containing a constitutional unit represented by Formula A1, a constitutional unit derived from a monomer having an alicyclic structure, and a constitutional unit having a radically polymerizable group, a radically polymerizable compound, and a photopolymerization initiator, a content of the constitutional unit represented by Formula A1 is 10% by mass or more with respect to a total mass of the polymer A, a content of the constitutional unit derived from the monomer having the alicyclic structure is 15% by mass or more with respect to a total mass of the polymer A, and a glass transition temperature of a homopolymer of the monomer having the alicyclic structure is 120° C. or higher.