公开(公告)号：US20190382623A1

公开(公告)日：2019-12-19

申请号：US16546996

申请日：2019-08-21

Applicant: FUJIFILM Corporation

Inventor： Naoya SHIMOJU ,  Akinori SHIBUYA ,  Yuichiro GOTO

IPC: C09J7/30 ,  C09J5/00 ,  H01L21/027 ,  B32B7/12 ,  B32B3/26 ,  B32B37/12 ,  B32B37/15 ,  B32B38/00 ,  B32B9/00 ,  B32B9/04 ,  B32B27/30

Abstract: There are provided a composition for forming an adhesive film for imprinting having excellent adhesiveness and wettability, an adhesive film, a laminate, a method for producing a cured product pattern, and a method for manufacturing a circuit substrate. A composition for forming an adhesive film for imprinting contains a resin having a polymerizable group; and a solvent, in which the resin has at least one kind of a repeating unit derived from a polymerizable compound having a C log P value less than or equal to 0, and solubility of the resin in water at 25° C. is greater than or equal to 1 mass %, provided that the C log P value is a coefficient showing affinity of an organic compound with respect to water and 1-octanol.

公开(公告)号：US20160009945A1

公开(公告)日：2016-01-14

申请号：US14865949

申请日：2015-09-25

Applicant: FUJIFILM Corporation

Inventor： Yuichiro ENOMOTO ,  Hirotaka KITAGAWA ,  Tadashi OOMATSU ,  Yuichiro GOTO

IPC: C09D133/14 ,  H01L21/02 ,  C09D133/08

CPC classification number: C09D133/14 ,  C08F290/06 ,  C08F299/02 ,  C08F2222/1093 ,  C09D4/00 ,  C09D133/08 ,  G03F7/0002 ,  G03F7/11 ,  H01L21/02345

Abstract: Provided is a composition capable of producing an underlying film which demonstrates a good adhesiveness between a substrate and a layer to be imprinted, showing a good in-plane uniformity of the thickness, and a small defect density. The composition includes a polymerizable compound, a first solvent, and a second solvent, the first solvent having a boiling point at 1 atm of 160° C. or higher, the second solvent having a boiling point at 1 atm of lower than 160° C., and the content of the polymerizable compound in the composition being less than 1% by mass.

Abstract translation: 本发明提供一种能够生产下面的膜的组合物，其表现出基板和待印刷层之间良好的粘合性，表现出良好的厚度的面内均匀性和小的缺陷密度。 所述组合物包含可聚合化合物，第一溶剂和第二溶剂，所述第一溶剂的沸点在1atm下为160℃以上，所述第二溶剂的沸点在1atm以下，低于160℃ ，组合物中的聚合性化合物的含量小于1质量％。

公开(公告)号：US20220009153A1

公开(公告)日：2022-01-13

申请号：US17484582

申请日：2021-09-24

Applicant: FUJIFILM Corporation

Inventor： Yuichiro GOTO ,  Naoya SHIMOJU ,  Akinori SHIBUYA ,  Akihiro HAKAMATA

IPC: B29C59/02 ,  C08F2/50 ,  C08F220/10 ,  G03F7/20 ,  G03F7/004

Abstract: Provided are: a composition for forming a pattern, which contains a polymerizable compound, a photopolymerization initiator, and a sensitizer containing two or more of at least one kind of atom selected from the group consisting of a nitrogen atom and a sulfur atom, in which a length of a specific atom chain from one atom to another atom among the two or more atoms is 2 or 3 in terms of the number of atoms; a kit to which the composition for forming a pattern is applied; a cured film; a laminate; a pattern producing method; and a method for manufacturing a semiconductor element.

公开(公告)号：US20210018833A1

公开(公告)日：2021-01-21

申请号：US17030496

申请日：2020-09-24

Applicant: FUJIFILM Corporation

Inventor： Yuichiro GOTO ,  Akihiro HAKAMATA ,  Naoya SHIMOJU

IPC: G03F7/00 ,  G03F7/004 ,  G03F7/029 ,  C08F2/50 ,  C08F22/10

Abstract: A curable composition for imprinting according to an embodiment of the present invention includes a monofunctional polymerizable compound having the following structure, a photopolymerization initiator, and a release agent represented by the following Formula (I) or Formula (II).
The monofunctional polymerizable compound has the following structure: a linear or branched alkyl group, or an alicyclic ring, an aromatic ring, or an aromatic heterocycle that is substituted with a linear or branched alkyl group. The release agent is represented by the following Formula (I) or Formula (II). A1-(B1)x1-(D1)y1-(E1)z1-F1  Formula (I), A2-(B2)x2-(D2)y2-(E2)z2-F2  Formula (II), A1 and A2 represent a linear aliphatic hydrocarbon group having 4 to 11 carbon atoms, D1 and D2 represent an alkylene oxide structure, F1 represents a polar functional group, and F2 represents a hydrogen atom, or a linear, branched, or cyclic aliphatic hydrocarbon group having 4 to 11 carbon atoms. Further, the present invention relates to a release agent, a cured product, a pattern forming method, and a lithography method that relate to the curable composition for imprinting.

公开(公告)号：US20200241410A1

公开(公告)日：2020-07-30

申请号：US16826565

申请日：2020-03-23

Applicant: FUJIFILM Corporation

Inventor： Yuichiro GOTO

IPC: G03F7/00 ,  G03F7/16 ,  G03F7/20 ,  H05K1/09

Abstract: Provided are a curable composition for imprinting capable of simultaneously obtaining excellent curing properties and excessive reaction inhibiting properties during light irradiation at a low exposure dose, a method of manufacturing a cured product pattern, a method of manufacturing a circuit substrate, and a cured product. The curable composition for imprinting satisfies the following A to C: A: the curable composition comprises a polyfunctional polymerizable compound having a polymerizable group equivalent of 150 or higher; B: the curable composition comprises a photopolymerization initiator; and C: the curable composition satisfies at least one of a condition that a content of an ultraviolet absorber in which a light absorption coefficient at a maximum emission wavelength of an irradiation light source is 1/2 or higher of a light absorption coefficient of the photopolymerization initiator is 0.5 to 8 mass % with respect to non-volatile components or a condition that a content of a polymerization inhibitor is 0.1 to 5 mass % with respect to the non-volatile components. The non-volatile components refer to components in the curable composition for imprinting other than a solvent.

公开(公告)号：US20170200639A1

公开(公告)日：2017-07-13

申请号：US15468911

申请日：2017-03-24

Applicant: FUJIFILM Corporation

Inventor： Yuichiro GOTO ,  Tadashi OOMATSU

IPC: H01L21/768 ,  B29C44/12 ,  H01L23/532 ,  H01L23/522 ,  H01L23/528 ,  B29C44/02 ,  H01L21/02

CPC classification number: H01L21/76817 ,  B29C37/0053 ,  B29C44/02 ,  B29C44/12 ,  B29C44/1219 ,  B29K2033/12 ,  B29K2105/0002 ,  B29K2105/0094 ,  B29K2105/041 ,  B29K2105/045 ,  B29K2909/02 ,  B29K2995/0006 ,  B29L2031/3406 ,  H01L21/02118 ,  H01L21/02203 ,  H01L21/311 ,  H01L21/76807 ,  H01L21/7682 ,  H01L21/76877 ,  H01L23/5226 ,  H01L23/5283 ,  H01L23/53228 ,  H01L23/5329 ,  H01L2221/1047 ,  H01L2924/0002 ,  H01L2924/00

Abstract: Provided are a method of manufacturing a porous body capable of easily manufacturing a porous body, a porous body, a method of manufacturing a device, a device, a method of manufacturing a wiring structure, and a wiring structure.A photocurable composition including a condensing gas and a polymerizable compound is applied to a substrate or a mold, the photocurable composition is sandwiched between the substrate and the mold and then the photocurable composition is irradiated with light to cure the photocurable composition, and the mold is released from a surface of the cured photocurable composition.

公开(公告)号：US20200373167A1

公开(公告)日：2020-11-26

申请号：US16992481

申请日：2020-08-13

Applicant: FUJIFILM Corporation

Inventor： Yuichiro GOTO ,  Naoya SHIMOJU ,  Akihiro Hakamata

IPC: H01L21/308 ,  H01L21/027 ,  G03F7/038

Abstract: Provided is a kit including a curable composition for imprinting, and a composition for forming an underlayer film for imprinting, in which the composition for forming an underlayer film for imprinting contains a polymer having a polymerizable functional group, and a compound in which the lower one of a boiling point and a thermal decomposition temperature is 480° C. or higher and ΔHSP, which is a Hansen solubility parameter distance from a component with the highest content contained in the curable composition for imprinting, is 2.5 or less. Furthermore, the present invention relates to a composition for forming an underlayer film for imprinting, a pattern forming method, and a method for manufacturing a semiconductor device, which are related to the kit.

公开(公告)号：US20200216709A1

公开(公告)日：2020-07-09

申请号：US16826488

申请日：2020-03-23

Applicant: FUJIFILM Corporation

Inventor： Naoya SHIMOJU ,  Yuichiro GOTO

IPC: C09D135/02 ,  G03F7/00 ,  H05K3/00

Abstract: There are provided a composition for forming an underlayer film for imprints which imparts excellent uniformity in thickness of a film to be formed, has excellent wettability with respect to a curable composition for imprints, and imparts stability in a film to be formed; a kit; a curable composition for imprints; a laminate; a method for producing a laminate; a method for producing a cured product pattern; and a method for producing a circuit board. A composition for forming an underlayer film for imprints includes a polyfunctional (meth)acrylate that includes at least one aromatic ring or aromatic heterocyclic ring and has a viscosity of 11 to 600 mPa·s at 23° C. and a molecular weight of 200 or more, and a solvent.

公开(公告)号：US20170158905A1

公开(公告)日：2017-06-08

申请号：US15441716

申请日：2017-02-24

Applicant: FUJIFILM Corporation

Inventor： Tadashi OOMATSU ,  Hirotaka KITAGAWA ,  Yuichiro GOTO

IPC: C09D151/00 ,  B29C59/00 ,  H01L21/3105 ,  B29C59/16 ,  H01L21/02 ,  G03F7/00 ,  B29C59/02

CPC classification number: C09D151/003 ,  B29C59/005 ,  B29C59/02 ,  B29C59/16 ,  B29K2033/08 ,  B32B27/00 ,  C08F222/10 ,  C08F290/142 ,  C08F2438/02 ,  C09D5/00 ,  C09D5/32 ,  C09D7/40 ,  C09D7/65 ,  C09D135/02 ,  C09D151/08 ,  C09D201/02 ,  G03F7/0002 ,  G03F7/0752 ,  G03F7/094 ,  H01L21/02118 ,  H01L21/02282 ,  H01L21/02345 ,  H01L21/31058 ,  C08F220/32 ,  C08F2220/325 ,  C08F220/18 ,  C08F220/28 ,  C08F2220/283 ,  C08F220/06 ,  C08F220/20 ,  C08F220/14 ,  C08F2222/1026 ,  C08F2220/185 ,  C08F2220/1858 ,  C08F222/22 ,  C08F2220/281 ,  C08F220/24 ,  C08F2220/1875 ,  C08L33/14

Abstract: Provided are a resin composition for underlayer film formation with which a variation hardly occurs in the line width distribution after processing due to a small thickness of a residual film after mold pressing, a layered product, a method for forming a pattern, an imprint forming kit, and a process for producing a device.Disclosed is a resin composition for underlayer film formation which is used to form an underlayer film by being applied onto a base material, including a first resin having a radical reactive group in the side chain, a second resin containing at least one selected from a fluorine atom and a silicon atom, and a solvent. The second resin is preferably a resin containing a fluorine atom. The radical reactive group of the first resin is preferably a (meth)acryloyl group.

公开(公告)号：US20160211143A1

公开(公告)日：2016-07-21

申请号：US15083352

申请日：2016-03-29

Applicant: FUJIFILM Corporation

Inventor： Hirotaka KITAGAWA ,  Yuichiro GOTO

IPC: H01L21/308 ,  H01L21/02 ,  C09D11/101 ,  G03F7/00 ,  C09D11/30

CPC classification number: H01L21/3081 ,  C09D4/06 ,  C09D11/101 ,  C09D11/30 ,  G03F7/0002 ,  G03F7/027 ,  G03F7/038 ,  G03F7/0388 ,  H01L21/02118 ,  H01L21/02288 ,  H01L21/02345 ,  H01L21/3086 ,  Y10T428/24802 ,  C08F2222/102 ,  C08F2222/1013 ,  C08F220/22 ,  C08F2220/1883 ,  C08F2220/301

Abstract: A curable composition for optical imprinting which is excellent in ink jet adequacy and releasability, a pattern forming method, a fine pattern, and a method for manufacturing a semiconductor device are provided. The curable composition for optical imprinting contains a polymerizable compound (A), a photopolymerization initiator (B), and a compound (C) expressed by General Formula (I); in General Formula (I), A represents a dihydric to hexahydric polyhydric alcohol residue. p represents 0 to 2, q represents 1 to 6, p+q represents an integer of 2 to 6, each of m and n independently represents 0 to 20. r expressed by Formula (1) is 6 to 20. Each R independently represents an alkyl group having 1 to 10 carbon atoms, an aryl group, or an acyl group.

Abstract translation: 提供了一种喷墨适合性和脱模性良好的光学印刷用固化性组合物，图案形成方法，精细图案以及半导体装置的制造方法。 用于光学印迹的可固化组合物含有可聚合化合物（A），光聚合引发剂（B）和由通式（I）表示的化合物（C））。 在通式（I）中，A表示二元至六元多元醇残基。 p表示0〜2，q表示1〜6，p + q表示2〜6的整数，m和n各自独立地表示0〜20。由式（1）表示的r为6〜20。 具有1-10个碳原子的烷基，芳基或酰基。