公开(公告)号：US20130122281A1

公开(公告)日：2013-05-16

申请号：US13690750

申请日：2012-11-30

Applicant: Fujifilm Corporation

Inventor： Shinya HAKUTA ,  Takeharu TANI ,  Naoharu Kiyoto

IPC: B32B5/16

CPC classification number: B32B5/16 ,  B22F1/0055 ,  B22F1/02 ,  B22F7/04 ,  B22F9/24 ,  B32B2311/08 ,  C03C17/007 ,  C03C2217/42 ,  C03C2217/465 ,  C03C2217/479 ,  G02B5/206 ,  G02B5/208 ,  Y10T428/25

Abstract: A heat-ray shielding material including: a substrate; and a metal particle-containing layer containing at least one kind of metal particles, the metal particle-containing layer being on the substrate, wherein the metal particles contain flat metal particles each having a substantially hexagonal shape or a substantially disc shape in an amount of 60% by number or more, and wherein a coefficient of variation of a distribution of distances between centers of the flat metal particles adjacent to each other is 20% or less.

Abstract translation: 一种热射线屏蔽材料，包括：基底; 和含有至少一种金属颗粒的金属颗粒层，所述金属颗粒层位于所述基材上，其中所述金属颗粒包含平均金属颗粒，所述平坦金属颗粒具有大致六边形或基本上圆盘形状的量 60％以上，并且其中相邻的平坦金属颗粒的中心之间的距离分布的变异系数为20％以下。

公开(公告)号：US20240029253A1

公开(公告)日：2024-01-25

申请号：US18479832

申请日：2023-10-03

Applicant: FUJIFILM CORPORATION

Inventor： Takeharu TANI ,  Ryusuke OSAKI

IPC: G06T7/00 ,  G06T7/70 ,  G06T17/00 ,  G01N15/14 ,  G03H1/04 ,  G03H1/00

CPC classification number: G06T7/0012 ,  G06T7/70 ,  G06T17/00 ,  G01N15/1436 ,  G03H1/0443 ,  G03H1/0005 ,  G06T2207/30044 ,  G01N2015/1454 ,  G01N2015/0065

Abstract: Provided is a method for acquiring an evaluation value that can suppress an influence caused by an orientation of an object to be evaluated on an evaluation value derived based on a phase image of the object to be evaluated. The method for acquiring an evaluation value includes generating a phase image showing a phase distribution of light transmitted through an object, deriving an evaluation value of the object based on the phase image, and correcting the evaluation value by using a correction coefficient determined in accordance with an orientation of the object in the phase image.

公开(公告)号：US20220397788A1

公开(公告)日：2022-12-15

申请号：US17828540

申请日：2022-05-31

Applicant: FUJIFILM Corporation

Inventor： Keisuke KODAMA ,  Yujiro YANAI ,  Takeharu TANI ,  Shunya KATOH

IPC: G02F1/137 ,  G02F1/13363 ,  G01J1/04

Abstract: Provided are a bandpass filter having a high light transmittance in a transmission band and a wide wavelength range showing a high transmittance in the transmission band, and a sensor. The bandpass filter is a bandpass filter including a reflective member A and a reflective member B, in which a difference between a reflection center wavelength of the reflective member A and a reflection center wavelength of the reflective member B is larger than a sum of a half width at half maximum of a reflection band of the reflective member A and a half width at half maximum of a reflection band of the reflective member B; the reflective member A has a first cholesteric liquid crystal layer and a second cholesteric liquid crystal layer, and birefringence Δn1 of the first cholesteric liquid crystal layer is larger than birefringence Δn2 of the second cholesteric liquid crystal layer; and the reflective member B has a third cholesteric liquid crystal layer and a fourth cholesteric liquid crystal layer, and birefringence Δn3 of the third cholesteric liquid crystal layer is larger than birefringence Δn4 of the fourth cholesteric liquid crystal layer.

公开(公告)号：US20140327966A1

公开(公告)日：2014-11-06

申请号：US14338547

申请日：2014-07-23

Applicant: FUJIFILM Corporation

Inventor： Takeharu TANI

IPC: G02B1/11

CPC classification number: G02B1/11 ,  G02B1/111 ,  G02B1/118

Abstract: An antireflection film includes a first layer and a second layer formed on a substrate in this order from the substrate side, the second layer being formed to be in contact with an ambient medium. The first layer and the second layer are formed such that an average refractive index n1 of the first layer at a given wavelength λ0, an average refractive index n2 of the second layer at the given wavelength λ0, a film thickness d1 of the first layer, and a film thickness d2 of the second layer satisfy conditional expressions below: 0.96

Abstract translation: 防反射膜包括从基板侧依次形成在基板上的第一层和第二层，第二层形成为与环境介质接触。 第一层和第二层被形成为使得在给定波长λ0处的第一层的平均折射率n1，给定波长λ0处的第二层的平均折射率n2，第一层的膜厚度d1， 并且第二层的膜厚度d2满足以下条件表达式：0.96

公开(公告)号：US20140071316A1

公开(公告)日：2014-03-13

申请号：US14076827

申请日：2013-11-11

Applicant: Fujifilm Corporation

Inventor： Hideki ASANO ,  Takeharu TANI

IPC: H04N5/335

CPC classification number: H04N5/335 ,  G02B5/201 ,  G02B13/001 ,  H01L27/14618 ,  H01L27/14621 ,  H01L27/14627 ,  H01L2924/0002 ,  H04N5/2257 ,  H01L2924/00

Abstract: An imaging apparatus, including imaging optical system having a lens group and an aperture stop, and a solid-state image sensor which includes a photoelectric conversion layer made of an organic material and a color filter layer with color filters of two or more colors and a separation wall. The photoelectric conversion layer has a thickness of 0.1 82 m to 1 μm, each of the color filters has a refractive index of 1.5 to 1.8, the separation wall has a width of 0.05 μm to 0.2 μm and a refractive index of 1.22 to 1.34, and the lens group and the solid-state image sensor are disposed such that the relationship between a pixel pitch D (μm) of the sensor and a maximum angle α (°) of a principal ray incident on the sensor is 45≧α≧25.D−20 where D≦2.6 μm.

Abstract translation: 一种成像装置，包括具有透镜组和孔径光阑的成像光学系统和固态图像传感器，其包括由有机材料制成的光电转换层和具有两种或更多种颜色的滤色器的滤色器层和 隔墙。 光电转换层的厚度为0.1±82μm〜1μm，滤色片的折射率为1.5〜1.8，分隔壁的宽度为0.05〜0.2μm，折射率为1.22〜1.34， 并且透镜组和固态图像传感器被布置成使得传感器的像素间距D（母体）与入射在传感器上的主光线的最大角度α（°）之间的关系为45≥α> = 25.D-20其中D@2.6 mum。