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    POST-TEMPERABLE NANOCRYSTAL ELECTROCHROMIC DEVICES
    7.
    发明申请
    POST-TEMPERABLE NANOCRYSTAL ELECTROCHROMIC DEVICES 有权
    后温度纳米晶体电致变色器件

    公开(公告)号：US20160139475A1

    公开(公告)日：2016-05-19

    申请号：US14882319

    申请日：2015-10-13

    Applicant: HELIOTROPE TECHNOLOGIES, INC.

    Inventor： Guillermo GARCIA ,  Jason HOLT ,  Scott THOMSEN

    IPC: G02F1/155 ,  C03B27/00 ,  C03C17/23 ,  G02F1/15 ,  C03C17/00

    CPC classification number: G02F1/155 ,  B32B17/06 ,  C03B27/00 ,  C03C17/007 ,  C03C17/23 ,  C03C2217/42 ,  C03C2217/70 ,  G02F1/1523 ,  G02F2001/1555 ,  G02F2202/36

    Abstract: An electrochromic device may include a working electrode that includes a high temperature stable material and nanoparticles of an active core material, a counter electrode, and an electrolyte deposited between the working electrode and the counter electrode. The high temperature stable material may prevent fusing of the nanoparticles of the active core material at temperatures up to 700° C. The high temperature stable material may include tantalum oxide. The high temperature stable material may form a spherical shell or a matrix around the nanoparticles of the active core material. A method of forming an electrochromic device may include depositing a working electrode onto a first substrate, in which the working electrode comprises a high temperature stable material and nanoparticles of an active core material, and heat tempering the working electrode and the first substrate.

    Abstract translation: 电致变色装置可以包括工作电极，其包括高温稳定材料和活性芯材料，对电极和沉积在工作电极和对电极之间的电解质的纳米颗粒。 高温稳定材料可以防止活性芯材料的纳米颗粒在高达700℃的温度下熔合。高温稳定材料可以包括氧化钽。 高温稳定材料可以在活性芯材料的纳米颗粒周围形成球形壳或基体。 形成电致变色器件的方法可以包括将工作电极沉积到第一衬底上，其中工作电极包括高温稳定材料和活性芯材料的纳米颗粒，以及对工作电极和第一衬底进行回火。

    METHOD OF FABRICATING NANOSTRUCTURES USING MACRO PRE-PATTERNS
    8.
    发明申请
    METHOD OF FABRICATING NANOSTRUCTURES USING MACRO PRE-PATTERNS 审中-公开
    使用宏预制图制作纳米结构的方法

    公开(公告)号：US20160089723A1

    公开(公告)日：2016-03-31

    申请号：US14923910

    申请日：2015-10-27

    Applicant: KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY

    Inventor： Hee-Tae JUNG ,  Hwan-Jin JEON ,  Kyoung-Hwan KIM ,  Youn-Kyoung BAEK

    IPC: B22F7/04 ,  C23C14/58 ,  C23C14/22

    CPC classification number: B22F7/04 ,  B22F1/0018 ,  B22F9/02 ,  B81C1/00031 ,  B82Y10/00 ,  B82Y30/00 ,  B82Y40/00 ,  C03C17/006 ,  C03C2217/42 ,  C03C2218/34 ,  C23C14/221 ,  C30B23/00 ,  C30B29/02 ,  C30B29/16 ,  C30B29/60 ,  C30B33/08 ,  G03F7/0002 ,  G03F7/0037 ,  Y10T428/24479 ,  Y10T428/24612

    Abstract: A method of fabricating nanostructures using macro pre-patterns according to the present invention, which comprises either depositing a target material on a substrate having macro pre-patterns formed thereon, or applying a target material to a substrate and then forming macro pre-patterns on the substrate, and then depositing the target material on the side surface of the macro pre-patterns by an ion bombardment phenomenon occurring during etching, provides a three-dimensional nanostructures with high aspect ratio and uniformity can be fabricated by a simple process at low cost by using the ion bombardment phenomenon occurring during physical ion etching, thereby achieving the high performance of future nano-devices, such as nanosized electronic devices, optical devices, bio devices and energy devices.

    Abstract translation: 使用根据本发明的宏预制图来制造纳米结构的方法，其包括将靶材料沉积在具有形成在其上的宏观预制图案的基底上，或将目标材料施加到基底上，然后在 基板，然后通过蚀刻期间发生的离子轰击现象将目标材料沉积在宏观预制图案的侧表面上，提供具有高纵横比和均匀性的三维纳米结构可以通过简单的方法以低成本制造 通过使用在物理离子蚀刻中发生的离子轰击现象，从而实现纳米尺寸的电子器件，光学器件，生物器件和能量器件等未来的纳米器件的高性能。

    Slot die coating process
    9.
    发明授权
    Slot die coating process 有权
    槽模涂层工艺

    公开(公告)号：US09212089B2

    公开(公告)日：2015-12-15

    申请号：US13254055

    申请日：2010-03-08

    Applicant: Nanning Joerg Arsten ,  Pascal Josef Paul Buskens ,  Marnix Rooijmans

    Inventor： Nanning Joerg Arsten ,  Pascal Josef Paul Buskens ,  Marnix Rooijmans

    IPC: B05D5/06 ,  C03C17/00 ,  B05D1/26 ,  B05D3/02

    CPC classification number: C03C17/006 ,  B05D1/26 ,  B05D3/0254 ,  C03C2217/42 ,  C03C2218/11 ,  C03C2218/32

    Abstract: The present invention relates to a process for applying an optical coating to a substrate comprising the steps of (a) preparing an optical coating formulation comprising a solvent component and a film forming component; (b) using a die coater to form a coated substrate by applying the optical coating to a substrate, where the applied optical coating forms a wet film thereon having a thickness from 8 μm to 100 μm; (c) drying the coated substrate, where the coated substrate is in a substantially horizontal plane thereby converting the wet film to a dry film having a thickness of less than 1 μm. The optical coating formulation comprises greater than 0.3 wt % to no more than 10 wt % solids relative to the total weight of the optical coating formulation. The coated substrate may be optionally cured.

    Abstract translation: 本发明涉及一种将光学涂层施加到基底上的方法，包括以下步骤：（a）制备包含溶剂组分和成膜组分的光学涂层制剂; （b）通过将光学涂层施加到基板上，使用模涂机形成涂布的基板，其中涂布的光学涂层在其上形成厚度为8μm至100μm的湿膜; （c）干燥涂覆的基底，其中涂覆的基底处于基本上水平的平面，从而将湿膜转变成厚度小于1μm的干膜。 光学涂层制剂相对于光学涂层制剂的总重量包含大于0.3重量％至不超过10重量％的固体。 涂覆的基底可以任选地固化。

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