摘要:
A virtual production control system (VPCS), and a virtual production control method and a computer program product thereof are provided. At first, the VPCS processes historical work-in-process (WIP) information and a current shipping plan sent from a supplier side, thereby obtaining a plurality of sets of WIP input/output historical data and a goods output schedule. Then, the VPCS performs an integer programming (IP) method to find the latest output schedule in accordance to the current shipping plan; uses a genetic algorithm (GA) to fit the historical distributed-parameters; adopts a neural network (NN) method to predict the future distributed-parameters of production; and finally utilizes a Petri Nets to simulate and obtain a latest feasible input schedule and a latest feasible output schedule.
摘要:
A dual-phase virtual metrology method is disclosed for considering both promptness and accuracy by generating dual-phase virtual metrology (VM) values, wherein a Phase-I conjecture step emphasizes promptness by immediately calculating the Phase-I virtual metrology value (VMI) of a workpiece once the entire process data of the workpiece are completely collected; and a Phase-II conjecture step intensifies accuracy, which does not re-calculate the Phase-II virtual metrology values (VMII) of all the workpieces in the cassette until an actual metrology value (required for tuning or re-training purposes) of a selected workpiece in the same cassette is collected. Besides, the accompanying reliance index (RI) and global similarity index (GSI) of each VMI and VMII are also generated.
摘要:
Provided are a method and a system for virtual metrology in semiconductor manufacturing. Process data and metrology data are received. Prediction data is generated based on the process data and metrology data using a learning control model. The system for virtual metrology in a fabrication facility comprises a fault detection and classification system operable to receive process data, a statistical process control system operable to perform statistical process control on a history of physical metrology data to form metrology data, and a virtual metrology application operable to generate prediction data based on the process data and the metrology data using a learning control model.
摘要:
Provided are a method and a system for virtual metrology in semiconductor manufacturing. Process data and metrology data are received. Prediction data is generated based on the process data and metrology data using a learning control model. The system for virtual metrology in a fabrication facility comprises a fault detection and classification system operable to receive process data, a statistical process control system operable to perform statistical process control on a history of physical metrology data to form metrology data, and a virtual metrology application operable to generate prediction data based on the process data and the metrology data using a learning control model.
摘要:
A generic embedded device (GED) and a mechanism for retrieving and transmitting information of various intelligent-maintenance (IM) applications are disclosed. The GED is an object-oriented and cross-platform device built in an embedded real-time operating system, and can be installed in various kinds of information equipment, and has a generic application interface for the future development of application modules. The present invention enables all kinds of information equipment to retrieve, collect, manage, and analyze equipment data for IM applications; and further to receive/transmit the IM-related equipment information wired or wireless from/to remote clients via communication agents through Internet/Intranet.
摘要:
An advanced process control (APC) system, an APC method, and a computer program product, which, when executed, performs an APC method are provided for incorporating virtual metrology (VM) into APC. The present inventions uses a reliance index (RI) and a global similarity index (GSI) to adjust at least one controller gain of a run-to-run (R2R) controller when the VM value of a workpiece is adopted to replace the actual measurement value of the workpiece. The RI is used for gauging the reliability of the VM value, and the GSI is used for assessing the degree of similarity between the set of process data for generating the VM value and all the sets of historical process data used for building the conjecturing model.
摘要:
A server, a system and a method for automatic virtual metrology (AVM) are disclosed. The AVM system comprises a model-creation server and a plurality of AVM servers. The model-creation server is used to construct the first set of virtual metrology (VM) models (of a certain equipment type) including a VM conjecture model, a RI (Reliance Index) model, a GSI (Global Similarity Index) model, a DQIx (Process Data Quality Index) model, and a DQIy (Metrology Data Quality Index) model. In the AVM method, the model-creation server also can fan out or port the first set of VM models generated to other AVM servers of the same process apparatus (equipment) type, and each individual fan-out-acceptor's AVM server can perform automatic model refreshing processes so as to gain and maintain its VM models' accuracy.
摘要:
A server, a system and a method for automatic virtual metrology (AVM) are disclosed. The AVM system comprises a model-creation server and a plurality of AVM servers. The model-creation server is used to construct the first set of virtual metrology (VM) models (of a certain equipment type) including a VM conjecture model, a RI (Reliance Index) model, a GSI (Global Similarity Index) model, a DQIx (Process Data Quality Index) model, and a DQIy (Metrology Data Quality Index) model. In the AVM method, the model-creation server also can fan out or port the first set of VM models generated to other AVM servers of the same process apparatus (equipment) type, and each individual fan-out-acceptor's AVM server can perform automatic model refreshing processes so as to gain and maintain its VM models' accuracy.
摘要:
A dual-phase virtual metrology method is disclosed for considering both promptness and accuracy by generating dual-phase virtual metrology (VM) values, wherein a Phase-I conjecture step emphasizes promptness by immediately calculating the Phase-I virtual metrology value (VMI) of a workpiece once the entire process data of the workpiece are completely collected; and a Phase-II conjecture step intensifies accuracy, which does not re-calculate the Phase-II virtual metrology values (VMII) of all the workpieces in the cassette until an actual metrology value (required for tuning or re-training purposes) of a selected workpiece in the same cassette is collected. Besides, the accompanying reliance index (RI) and global similarity index (GSI) of each VMI and VMII are also generated.
摘要:
A generic embedded device (GED) and a mechanism for retrieving and transmitting information of various intelligent-maintenance (IM) applications are disclosed. The GED is an object-oriented and cross-platform device built in an embedded real-time operating system, and can be installed in various kinds of information equipment, and has a generic application interface for the future development of application modules. The present invention enables all kinds of information equipment to retrieve, collect, manage, and analyze equipment data for IM applications; and further to receive/transmit the IM-related equipment information wired or wireless from/to remote clients via communication agents through Internet/Intranet.