公开(公告)号：US11337293B2

公开(公告)日：2022-05-17

申请号：US16894657

申请日：2020-06-05

Applicant: Gigaphoton Inc.

Inventor： Takanari Kobayashi ,  Hirokazu Hosoda

IPC: H05G2/00 ,  G03F7/20

Abstract: An extreme ultraviolet light generation system includes: a chamber; a target generation unit; a laser system configured to output a first pre-pulse laser beam, a second pre-pulse laser beam, and a main pulse laser beam so that fluence of the first pre-pulse laser beam is 1.5 J/cm2 to 16 J/cm2 inclusive at a position where a target is irradiated with the first pre-pulse laser beam; and a control unit configured to control the laser system so that a first delay time from a timing of irradiation of the target with the first pre-pulse laser beam to a timing of irradiation with the second pre-pulse laser beam and a second delay time from the timing of irradiation of the target with the second pre-pulse laser beam to a timing of irradiation with the main pulse laser beam have a following relation: the first delay time

公开(公告)号：US10057972B2

公开(公告)日：2018-08-21

申请号：US15430737

申请日：2017-02-13

Applicant: GIGAPHOTON INC.

Inventor： Yoshifumi Ueno ,  Hirokazu Hosoda ,  Takayuki Yabu

IPC: H05G2/00 ,  H01L21/027 ,  H05H1/24 ,  H01S3/10 ,  H05H15/00 ,  G03F7/20

CPC classification number: H05G2/008 ,  G03F7/70033 ,  H01L21/027 ,  H01S3/10061 ,  H05G2/003 ,  H05G2/006 ,  H05H1/24 ,  H05H15/00

Abstract: An extreme ultraviolet light generation system may include a laser system and a controller. The laser system may irradiate the first target with a first pulse laser beam to disperse the first target and produce a mist target, and irradiate the mist target with a second pulse laser beam. The controller may measure a mist diameter of the mist target and control, based on the mist diameter, at least one of time to emit the second pulse laser beam and energy of a first pulse laser beam to be used to irradiate the second target.

公开(公告)号：US09860967B2

公开(公告)日：2018-01-02

申请号：US15210296

申请日：2016-07-14

Applicant: Gigaphoton Inc.

Inventor： Hirokazu Hosoda ,  Tsukasa Hori

IPC: H05G2/00

CPC classification number: H05G2/008 ,  H05G2/006

Abstract: A target supply apparatus configured to melt a target and supply a molten target into a chamber, the target generating extreme ultraviolet light when the target is irradiated with a laser beam in the chamber, may include: a pair of electrodes spaced from one another and configured to sandwich the target; and a power source configured to supply a current to a solid target sandwiched between the pair of electrodes via the pair of electrodes to melt the solid target to a core of the solid target.