公开(公告)号：US20180019097A1

公开(公告)日：2018-01-18

申请号：US15544788

申请日：2015-12-21

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Minoru HARADA ,  Yuji TAKAGI ,  Takehiro HIRAI

IPC: H01J37/22 ,  G06T5/50 ,  G01B15/04 ,  G06T7/00

CPC classification number: H01J37/22 ,  G01B15/04 ,  G01B2210/48 ,  G01N23/22 ,  G06T5/50 ,  G06T7/001 ,  G06T2207/10061 ,  G06T2207/30148

Abstract: An inspection method uses a charged particle microscope to observe a sample and view a defect site or a circuit pattern. A plurality of images is detected by a plurality of detectors and a mixed image is generated by automatically adjusting and mixing weighting factors required when the plurality of images are synthesized with each other. The sample is irradiated and scanned with a charged particle beam so that the plurality of detectors arranged at different positions from the sample detects a secondary electron or a reflected electron generated from the sample. The mixed image is generated by mixing the plurality of images of the sample with each other for each of the plurality of detectors, which are obtained by causing each of the plurality of detectors arranged at the different positions to detect the secondary electron or the reflected electron. The generated mixed image is displayed on a screen.