公开(公告)号：US20150248944A1

公开(公告)日：2015-09-03

申请号：US14607736

申请日：2015-01-28

Applicant: Hitachi High-Technologies Corporation

Inventor： Zhaohui Cheng ,  Hideo Kashima ,  Hiroaki Baba ,  Takeyoshi Ohashi ,  Tomonori Nakano ,  Kotoko Urano ,  Naomasa Suzuki

IPC: G21K1/093 ,  H01J37/153

CPC classification number: H01J37/153 ,  H01J2237/032 ,  H01J2237/1534

Abstract: Provided are an aberration corrector that reduces irregularity of a magnetic field of a multipole to obtain an image of high resolution and a charged particle beam apparatus using the same. The aberration corrector includes a plurality of magnetic field type poles, a ring that magnetically connects the plurality of poles with one another and an adjustment member disposed between the pole and the ring to adjust a spacing between the pole and the ring per pole.

Abstract translation: 提供了减少多极的磁场的不规则性以获得高分辨率的图像和使用其的带电粒子束装置的像差校正器。 像差校正器包括多个磁场型磁极，将多个磁极彼此磁连接的环和设置在磁极和环之间的调节构件，以调节磁极与每个磁极之间的间隔。

公开(公告)号：US20140246585A1

公开(公告)日：2014-09-04

申请号：US14349375

申请日：2012-09-27

Applicant: Hitachi High-Technologies Corporation

Inventor： Takeyoshi Ohashi ,  Junichi Tanaka ,  Tomoko Sekiguchi ,  Hiroki Kawada

IPC: H01J37/28

CPC classification number: H01J37/28 ,  G01B15/04 ,  G01B2210/56 ,  G01N23/22 ,  H01J2237/24578 ,  H01J2237/2817

Abstract: The objective of the invention is to provide a measuring method that can determine pattern contours and dimensions with high precision even if an object to be measured shrinks due to electron beam radiations. In order to achieve this objective, a method, which performs measurements by irradiating an electron beam onto a sample having a pattern formed on a primary coating thereof, prepares an SEM image and contour of the pattern (S201, S202), material parameters of the pattern part and primary coating part of the sample (S203, S204), and a beam condition in irradiating the electron beam onto the sample (S205), and uses these prepared things to calculate a pattern shape or dimensions before the irradiation of the electron beam (S206).

Abstract translation: 本发明的目的是提供一种能够以高精度确定图形轮廓和尺寸的测量方法，即使被测量物体由于电子束辐射而收缩。 为了实现该目的，通过将电子束照射到形成在其一次涂层上的图案的样品上进行测量的方法准备SEM图像和图案的轮廓（S201，S202），材料参数 样品的图案部分和初次涂布部分（S203，S204），以及将电子束照射到样品上的光束条件（S205），并且使用这些制备的物体来计算电子束照射之前的图案形状或尺寸 （S206）。