公开(公告)号：US12106928B2

公开(公告)日：2024-10-01

申请号：US17938466

申请日：2022-10-06

申请人： NuFlare Technology, Inc.

发明人： Ryoei Kobayashi

IPC分类号： H01J37/065 ,  H01J9/04 ,  H01J9/18 ,  H01J37/075 ,  H01J37/317

CPC分类号： H01J37/065 ,  H01J9/04 ,  H01J9/18 ,  H01J37/075 ,  H01J37/3177 ,  H01J2237/032

摘要： A cathode mechanism of an electron emission source includes a crystal that includes an upper part being columnar, truncated conical, or their combined shape, and having a first surface to emit thermoelectrons, and a lower part, integrated with the upper part, having a second surface substantially parallel to the first surface, and a diameter larger than the maximum diameter of the upper part, a holding part that is a column having, in order from the holding part upper side, different inner diameters of a first diameter and a second diameter larger than the first one, and that holds the crystal in the state where the crystal first surface is projecting from the upper surface, and the crystal second surface contacts the holding part inside the column, and a retaining part that retains the crystal, at the back of the crystal lower part, not to be separated from the holding part.

公开(公告)号：US12104638B2

公开(公告)日：2024-10-01

申请号：US17906021

申请日：2021-02-15

申请人： TEM CO., LTD.

发明人： Jin Kyung Park

IPC分类号： F16B39/12 ,  F16B39/26 ,  H01J37/32

CPC分类号： F16B39/12 ,  F16B39/26 ,  H01J37/3255 ,  H01J37/32568 ,  H01J2237/032

摘要： An interlocking fastening upper electrode assembly having an improved fastening force is proposed. The assembly is configured such that a bush inserted into a silicon electrode protrudes above the silicon electrode, and the protruding portion is inserted into and coupled to an anodizing plate so as to suppress rotation of the bush, the assembly including: an inner and outer tab composite nut coupled to an assembly groove of the silicon electrode and an anodizing plate so as to prevent rotation; an inner and outer tab nut assembled in the assembly groove of the silicon electrode and fitted to the outside of the inner and outer tab composite nut; and an assembly module coupled through the inside of a through part of the anodizing plate and assembled with the inner and outer tab composite nut in order to fix the anodizing plate provided above the silicon electrode.

公开(公告)号：US20240186120A1

公开(公告)日：2024-06-06

申请号：US17787689

申请日：2022-05-24

申请人： SHENZHEN CHINA STAR OPTOELECTRONICS SEMICONDUCTOR DISPLAY TECHNOLOGY CO., LTD.

发明人： Zhiyuan LI ,  Xianfu ZENG

IPC分类号： H01J37/32

CPC分类号： H01J37/32568 ,  H01J37/3255 ,  H01J37/32559 ,  H01J2237/032 ,  H01J2237/334

摘要： The present disclosure provides an electrode fixing assembly and a dry etching device. The electrode fixing assembly includes a first fixing element and a second fixing element, wherein a hardness of a material of the first fixing element is greater than a hardness of a material of the second fixing element. The electrode fixing assembly is configured to be arranged in the dry etching device to fix an upper electrode on a device body, a generation of particles is reduced or eliminated, and then problems such as poor etching or the like caused by a substrate to be etched covered by the particles are avoided.

公开(公告)号：US20230386696A1

公开(公告)日：2023-11-30

申请号：US18326935

申请日：2023-05-31

申请人： ASML Netherlands B.V.

发明人： Alexander Hendrik Vincent VAN VEEN ,  Willem Henk URBANUS ,  Marco Jan-Jaco WIELAND

IPC分类号： G21K5/04 ,  H01J37/30 ,  G21K1/02 ,  H01J37/317 ,  H01J37/16 ,  H01J37/12

CPC分类号： G21K5/04 ,  H01J37/3007 ,  G21K1/02 ,  H01J37/3177 ,  H01J37/16 ,  H01J37/12 ,  H01J2237/0216 ,  H01J2237/0262 ,  H01J2237/1215 ,  H01J2237/002 ,  H01J2237/032 ,  H01J2237/30472 ,  H01J2237/16 ,  H01J2237/1825 ,  H01J2237/0213 ,  H01J2237/1207 ,  H01J2237/024

摘要： The invention relates to charged particle beam generator comprising a charged particle source for generating a charged particle beam, a collimator system comprising a collimator structure with a plurality of collimator electrodes for collimating the charged particle beam, a beam source vacuum chamber comprising the charged particle source, and a generator vacuum chamber comprising the collimator structure and the beam source vacuum chamber within a vacuum, wherein the collimator system is positioned outside the beam source vacuum chamber. Each of the beam source vacuum chamber and the generator vacuum chamber may be provided with a vacuum pump.

公开(公告)号：US20230207265A1

公开(公告)日：2023-06-29

申请号：US18145413

申请日：2022-12-22

申请人： SEMES CO., LTD.

发明人： Shant ARAKELYAN ,  Ja Myung Gu ,  Ogsen Galstyan

IPC分类号： H01J37/32

CPC分类号： H01J37/32165 ,  H01J37/32128 ,  H01J37/32568 ,  H01J37/3244 ,  H01J2237/032 ,  H01J2237/334

摘要： Provided is a substrate processing apparatus. The substrate processing apparatus may include a chamber having an inner space, an electrode configured to generate plasma in the inner space, and a power supply unit configured to apply an RF voltage to the electrode, in which the power supply unit may include a first power supply configured to apply a first pulse voltage having a first frequency to the electrode, a second power supply configured to apply a second pulse voltage having a second frequency different from the first frequency to the electrode, a third power supply configured to apply an RF voltage having a third frequency different from the first frequency and the second frequency, and a phase control member for controlling at least one of the phases of the first pulse voltage and the second pulse voltage.

公开(公告)号：US10074513B2

公开(公告)日：2018-09-11

申请号：US15414517

申请日：2017-01-24

申请人： APPLIED MATERIALS ISRAEL LTD.

发明人： Alon Litman ,  Efim Vinnitsky ,  Ofir Arzouan ,  Igor Petrov

IPC分类号： H01J37/244 ,  H01J37/28 ,  H01J37/20

CPC分类号： H01J37/244 ,  H01J37/145 ,  H01J37/20 ,  H01J37/28 ,  H01J2237/024 ,  H01J2237/032 ,  H01J2237/047 ,  H01J2237/2445 ,  H01J2237/24475 ,  H01J2237/2448

摘要： A method for evaluating a specimen includes positioning a detector in an inserted position in which a first distance between a tip of the detector and a plane extending along a surface of the specimen is less than a distance between the plane and a tip of charged particle beam optics. While maintaining the detector at the inserted position, the surface of the specimen is scanned by a primary beam that exits from the tip of the charged particle beam optics. The detector detects x-ray photons and/or charged particles emitted or reflected from the specimen as a result of scanning the specimen with the primary beam. After completion of the scanning, the detector is positioned at a retracted position in which a second distance between the tip of the detector and the plane exceeds a distance between the tip of the charged particle beam optics and the plane.

公开(公告)号：US20180157067A1

公开(公告)日：2018-06-07

申请号：US15847363

申请日：2017-12-19

申请人： HKC Corporation Limited ,  Chongqing HKC Optoelectronics Technology Co., ltd.

发明人： CHUNG-KUANG CHIEN

IPC分类号： G02F1/13 ,  H01J37/22 ,  H01J37/28 ,  H01J37/31 ,  H01J37/30 ,  C23C16/02 ,  C23C16/48

CPC分类号： G02F1/1309 ,  C23C16/0227 ,  C23C16/0272 ,  C23C16/483 ,  G02F1/133351 ,  G02F1/1368 ,  H01J37/222 ,  H01J37/28 ,  H01J37/3005 ,  H01J37/31 ,  H01J2237/032 ,  H01J2237/221 ,  H01J2237/24592 ,  H01J2237/28 ,  H01J2237/2801 ,  H01J2237/2813 ,  H01J2237/317 ,  H01J2237/31749

摘要： A detecting method and a detecting equipment therefor are provided. The detecting method includes: inspecting whether a display panel has a defective position; after acquiring the defective position of the display panel by the inspecting, using a first focused ion beam generated by a first ion overhaul apparatus to cut the defective position of the display panel, so as to strip a defect at the defective position and observe morphology of defect; using a repair apparatus to perform a repair treatment on the defective position after the defect is stripped. An inspection apparatus for the inspecting of the defective position, the first ion overhaul apparatus and the repair apparatus are sequentially installed on the same production line.

公开(公告)号：US09905322B2

公开(公告)日：2018-02-27

申请号：US14541233

申请日：2014-11-14

申请人： MAPPER LITHOGRAPHY IP B.V.

发明人： Marco Jan-Jaco Wieland ,  Willem Henk Urbanus

IPC分类号： G21K1/02 ,  G21K5/04 ,  H01J37/30 ,  H01J37/24 ,  H01J37/317 ,  H01J37/02 ,  H01J37/16 ,  H01J37/065 ,  H01J37/12

CPC分类号： G21K1/02 ,  G21K5/04 ,  H01J37/026 ,  H01J37/065 ,  H01J37/12 ,  H01J37/16 ,  H01J37/24 ,  H01J37/3002 ,  H01J37/3007 ,  H01J37/3174 ,  H01J37/3175 ,  H01J37/3177 ,  H01J2237/002 ,  H01J2237/0216 ,  H01J2237/024 ,  H01J2237/032 ,  H01J2237/04 ,  H01J2237/1215 ,  H01J2237/16 ,  H01J2237/1825 ,  H01J2237/303 ,  H01J2237/30472

摘要： The invention relates to a collimator electrode stack (70), comprising: —at least three collimator electrodes (71-80) for collimating a charged particle beam along an optical axis (A), wherein each collimator electrode comprises an electrode body with an electrode aperture for allowing passage to the charged particle beam, wherein the electrode bodies are spaced along an axial direction (Z) which is substantially parallel with the optical axis, and wherein the electrode apertures are coaxially aligned along the optical axis; and —a plurality of spacing structures (89) provided between each pair of adjacent collimator electrodes and made of an electrically insulating material, for positioning the collimator electrodes at predetermined distances along the axial direction. Each of the collimator electrodes (71-80) is electrically connected to a separate voltage output (151-160).The invention further relates to a method of operating a charged particle beam generator.

公开(公告)号：US09818575B2

公开(公告)日：2017-11-14

申请号：US14942239

申请日：2015-11-16

申请人： Varian Semiconductor Equipment Associates, Inc.

发明人： Jeffrey A. Burgess

IPC分类号： H01J37/147 ,  H01J37/317

CPC分类号： H01J37/1471 ,  H01J27/024 ,  H01J37/08 ,  H01J37/3171 ,  H01J2237/032

摘要： A low profile extraction electrode assembly including an insulator having a main body, a plurality of spaced apart mounting legs extending from a first face of the main body, a plurality of spaced apart mounting legs extending from a second face of the main body opposite the first face, the plurality of spaced apart mounting legs extending from the second face offset from the plurality of spaced apart mounting legs extending from the first face in a direction orthogonal to an axis of the main body, the low profile extraction electrode assembly further comprising a ground electrode fastened to the mounting legs extending from the first face, and a suppression electrode fastened to the mounting legs extending from the second face, wherein a tracking distance between the ground electrode and the suppression electrode is greater than a focal distance between the ground electrode and the suppression electrode.

公开(公告)号：US20170213685A1

公开(公告)日：2017-07-27

申请号：US15233198

申请日：2016-08-10

申请人： ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE

发明人： Jun Tae KANG ,  Yoon-Ho SONG ,  Jae-Woo KIM ,  Jin-Woo JEONG

IPC分类号： H01J35/06

CPC分类号： H01J37/063 ,  H01J7/18 ,  H01J7/186 ,  H01J9/39 ,  H01J19/48 ,  H01J21/20 ,  H01J29/46 ,  H01J29/488 ,  H01J29/50 ,  H01J35/06 ,  H01J35/065 ,  H01J35/165 ,  H01J35/20 ,  H01J2201/196 ,  H01J2201/317 ,  H01J2209/385 ,  H01J2209/3893 ,  H01J2229/4827 ,  H01J2229/4831 ,  H01J2229/94 ,  H01J2235/068 ,  H01J2235/205 ,  H01J2237/032 ,  H01J2237/036 ,  H01J2237/06375 ,  H01J2237/1825

摘要： Disclosed is an x-ray tube including a hybrid electron emission source, which uses, as an electron emission source, a cathode including both a field electron emission source and a thermal electron emission source. An x-ray tube includes an electron emission source emitting an electron beam, and a target part including a target material that emits an x-ray as the emitted electron beam collides with the target part, wherein the electron emission source includes a thermal electron emission source and a field electron emission source, and emits the electron beam by selectively using at least one of the thermal electron emission source and the field electron emission source.