-
公开(公告)号:US11833590B2
公开(公告)日:2023-12-05
申请号:US17319430
申请日:2021-05-13
Applicant: HAMILTON SUNDSTRAND CORPORATION
Inventor: Diana Giulietti , Alexander Madinger
CPC classification number: B22F7/08 , B22F10/30 , B33Y10/00 , B33Y70/00 , B33Y80/00 , B22F10/25 , B22F2301/00 , B22F2301/052
Abstract: An additive manufacturing product is provided. The additive manufacturing product includes an embedded electronic, a transition zone, and a base material. The transition zone encases the embedded electronic. The transition zone includes transition material. The base material encases the transition zone. The transition material includes an intermediate melting point that is lower than a melting point of the base material.
-
公开(公告)号:US11433615B2
公开(公告)日:2022-09-06
申请号:US17095011
申请日:2020-11-11
Applicant: Hamilton Sundstrand Corporation
Inventor: Alexander Madinger , Diana Giulietti
IPC: B29C64/35 , B29C64/218 , B33Y30/00 , B33Y40/00 , B29C64/153 , B33Y10/00
Abstract: A method of cleaning a recoater of an additive manufacturing machine includes installing a cleaning fixture into the additive manufacturing machine, the cleaning fixture including one or more cleaning elements, advancing the recoater into contact with the one or more cleaning elements, and rotating the recoater about a recoater axis thus dislodging material from a recoater outer surface due to frictional contact with the one or more cleaning elements.
-
公开(公告)号:US20210268587A1
公开(公告)日:2021-09-02
申请号:US17325779
申请日:2021-05-20
Applicant: Hamilton Sundstrand Corporation
Inventor: Sergey Mironets , Alexander Madinger , Diana Giulietti , Dmitri Novikov
Abstract: A splatter shield system for an additive manufacturing machine includes one or more splatter shields configured to cover at least a portion of a build area during energy application such that the at least one splatter shield is positioned between an energy source of an additive manufacturing machine and the build area during energy application. The one or more splatter shields are transparent to an energy source (e.g., a laser) of the additive manufacturing system such that energy application occurs through the splatter shield.
-
公开(公告)号:US20210260660A1
公开(公告)日:2021-08-26
申请号:US17319430
申请日:2021-05-13
Applicant: HAMILTON SUNDSTRAND CORPORATION
Inventor: Diana Giulietti , Alexander Madinger
Abstract: An additive manufacturing product is provided. The additive manufacturing product includes an embedded electronic, a transition zone, and a base material. The transition zone encases the embedded electronic. The transition zone includes transition material. The base material encases the transition zone. The transition material includes an intermediate melting point that is lower than a melting point of the base material.
-
公开(公告)号:US20210069982A1
公开(公告)日:2021-03-11
申请号:US17095011
申请日:2020-11-11
Applicant: Hamilton Sundstrand Corporation
Inventor: Alexander Madinger , Diana Giulietti
IPC: B29C64/35 , B29C64/218 , B29C64/153
Abstract: A method of cleaning a recoater of an additive manufacturing machine includes installing a cleaning fixture into the additive manufacturing machine, the cleaning fixture including one or more cleaning elements, advancing the recoater into contact with the one or more cleaning elements, and rotating the recoater about a recoater axis thus dislodging material from a recoater outer surface due to frictional contact with the one or more cleaning elements.
-
公开(公告)号:US10427246B2
公开(公告)日:2019-10-01
申请号:US15901532
申请日:2018-02-21
Applicant: Hamilton Sundstrand Corporation
Inventor: Alexander Madinger , William Louis Wentland , Diana Giulietti
IPC: C23F1/20 , B23K26/342 , B33Y40/00 , B33Y10/00 , H01J37/34
Abstract: A hybrid manufacturing method may comprise depositing a secondary material onto a workpiece, finishing the secondary material to form a finished surface on the secondary material, depositing a primary material onto the finished surface, subsequent to depositing the secondary material, wherein a surface of the primary material interfaces the finished surface, and the surface of the primary material is complementary to the finished surface, and removing the secondary material.
-
-
-
-
-