公开(公告)号：US20250060338A1

公开(公告)日：2025-02-20

申请号：US18939121

申请日：2024-11-06

Applicant: Infineon Technologies AG

Inventor： Derek Debie ,  Klaus Elian ,  Ludwig Heitzer ,  David Tumpold ,  Jens Pohl ,  Cyrus Ghahremani ,  Thorsten Meyer ,  Christian Geissler ,  Andreas Allmeier

IPC: G01N29/22 ,  G01N25/00 ,  G01N29/02 ,  G01N29/24

Abstract: A radiation source device includes at least one membrane layer, a radiation source structure to emit electromagnetic or infrared radiation, a substrate and a spacer structure, wherein the substrate and the at least one membrane form a chamber, wherein a pressure in the chamber is lower than or equal to a pressure outside of the chamber, and wherein the radiation source structure is arranged between the at least one membrane layer and the substrate.

公开(公告)号：US20230194478A1

公开(公告)日：2023-06-22

申请号：US18050178

申请日：2022-10-27

Applicant: Infineon Technologies AG

Inventor： Derek Debie ,  Klaus Elian ,  Ludwig Heitzer ,  David Tumpold ,  Jens Pohl ,  Cyrus Ghahremani ,  Thorsten Meyer ,  Christian Geissler ,  Andreas Allmeier

IPC: G01N29/22 ,  G01N29/02 ,  G01N25/00 ,  G01N29/24

CPC classification number: G01N29/222 ,  G01N29/02 ,  G01N25/00 ,  G01N29/2425 ,  G01N2291/021

Abstract: A radiation source device includes at least one membrane layer, a radiation source structure to emit electromagnetic or infrared radiation, a substrate and a spacer structure, wherein the substrate and the at least one membrane form a chamber, wherein a pressure in the chamber is lower than or equal to a pressure outside of the chamber, and wherein the radiation source structure is arranged between the at least one membrane layer and the substrate.