公开(公告)号：US20130224921A1

公开(公告)日：2013-08-29

申请号：US13803291

申请日：2013-03-14

Applicant: Infineon Technologies AG

Inventor： Franz Hirler ,  Uwe Wahl ,  Thorsten Meyer ,  Michael Rüb ,  Armin Willmeroth ,  Markus Schmitt ,  Carolin Tolksdorf ,  Carsten Schaeffer

IPC: H01L29/66

CPC classification number: H01L29/66689 ,  H01L21/26586 ,  H01L29/0696 ,  H01L29/1045 ,  H01L29/1095 ,  H01L29/41758 ,  H01L29/4236 ,  H01L29/42368 ,  H01L29/66666 ,  H01L29/66704 ,  H01L29/78 ,  H01L29/7825

Abstract: A method for production of doped semiconductor regions in a semiconductor body of a lateral trench transistor includes forming a trench in the semiconductor body and introducing dopants into at least one area of the semiconductor body that is adjacent to the trench, by carrying out a process in which dopants enter the at least one area through inner walls of the trench.

Abstract translation: 在横向沟槽晶体管的半导体本体中制造掺杂半导体区域的方法包括：在半导体本体中形成沟槽，并且通过在半导体本体中进行工艺，将掺杂物引入与沟槽相邻的半导体本体的至少一个区域中 所述掺杂剂通过沟槽的内壁进入至少一个区域。