公开(公告)号：US10318170B2

公开(公告)日：2019-06-11

申请号：US15860540

申请日：2018-01-02

Applicant: Intel Corporation

Inventor： Jun Zhao ,  Gowrisankar Damarla ,  David A. Daycock ,  Gordon A. Haller ,  Sri Sai Sivakumar Vegunta ,  John B. Matovu ,  Matthew R. Park ,  Prakash Rau Mokhna Rau

IPC: G11C16/06 ,  G06F3/06 ,  H01L27/11573 ,  H01L27/11575 ,  H01L27/11582 ,  H01L27/11565

Abstract: Solid state memory technology is disclosed. A solid state memory component can include a plurality of bit lines, a source line, and a plurality of non-functional memory pillars. Each non-functional memory pillar is electrically isolated from one or both of the plurality of bit lines and the source line. A solid state memory component can include a plurality of pillars located in a periphery portion of the solid state memory component, and memory cells adjacent to each of the pillars. Associated systems and methods are also disclosed.

公开(公告)号：US20190294330A1

公开(公告)日：2019-09-26

申请号：US16436917

申请日：2019-06-11

Applicant: Intel Corporation

Inventor： Jun Zhao ,  Gowrisankar Damarla ,  David A. Daycock ,  Gordon A. Haller ,  Sri Sai Sivakumar Vegunta ,  John B. Matovu ,  Matthew R. Park ,  Prakash Rau Mokhna Rau

IPC: G06F3/06 ,  H01L27/11582 ,  H01L27/11575 ,  H01L27/11573

Abstract: Solid state memory technology is disclosed. In one example, a solid state memory component can include a plurality of bit lines, a source line, and a plurality of non-functional memory pillars. Each non-functional memory pillar is electrically isolated from one or both of the plurality of bit lines and the source line. In another example, a solid state memory component can include a plurality of pillars located in a periphery portion of the solid state memory component, and memory cells adjacent to each of the pillars. Associated systems and methods are also disclosed.

公开(公告)号：US10002767B2

公开(公告)日：2018-06-19

申请号：US15418618

申请日：2017-01-27

Applicant: Intel Corporation

Inventor： Hongbin Zhu ,  Gordon A. Haller ,  Fatma A. Simsek-Ege

IPC: H01L27/115 ,  H01L21/28 ,  H01L27/11556 ,  H01L27/11524 ,  H01L27/11558

Abstract: A multitier stack of memory cells having an aluminum oxide (AlOx) layer as a noble HiK layer to provide etch stop selectivity. Each tier of the stack includes a memory cell device. The circuit includes a source gate select polycrystalline (SGS poly) layer adjacent the multitier stack of memory cells, wherein the SGS poly layer is to provide a gate select signal for the memory cells of the multitier stack. The circuit also includes a conductive source layer to provide a source conductor for a channel for the tiers of the stack. The AlOx layer is disposed between the source layer and the SGS poly layer and provides both dry etch selectivity and wet etch selectivity for creating a channel to electrically couple the memory cells to the source layer.