Column redundancy system and method for a micro-cell embedded DRAM (e-DRAM) architecture

    公开(公告)号:US06674673B1

    公开(公告)日:2004-01-06

    申请号:US10064867

    申请日:2002-08-26

    IPC分类号: G11C700

    CPC分类号: G11C29/846 G11C2207/104

    摘要: A column redundancy system including a column redundancy apparatus for performing a redundancy swapping operation of column elements within the individual micro-cells. The column redundancy apparatus further includes a fuse information storage device, a first bank address decoding mechanism decodes a read bank address corresponding to a first micro-cell accessed for a read operation, and a second bank address decoding mechanism decodes a write bank address corresponding to a second micro-cell accessed for a write operation. If there is at least one defective column element contained within the first micro-cell, then the column redundancy apparatus generates an internal column address corresponding to the at least one defective column element in the first micro-cell. Likewise, if there is at least one defective column element contained within the second micro-cell, then the column redundancy apparatus generates an internal column address corresponding to the at least one defective column element in the second micro-cell.

    Damascene process for forming ferroelectric capacitors
    14.
    发明授权
    Damascene process for forming ferroelectric capacitors 失效
    用于形成铁电电容器的镶嵌工艺

    公开(公告)号:US06238963B1

    公开(公告)日:2001-05-29

    申请号:US09447631

    申请日:1999-11-23

    IPC分类号: H01L218242

    摘要: The difficulty of etching noble metals in ferroelectric capacitors is eliminated by a damascene process that employs chemical-mechanical polishing to remove the unwanted material, resulting in a lower electrode formed in an aperture in a dielectric, having a flat central portion and a wall extending from the central portion to the top surface of the surrounding dielectric; and an upper electrode formed in a two-level aperture, so that the upper electrode structure has a flat central portion, a first vertical wall extending from the central portion to a rim surrounding the central portion and extending over the wall of the lower electrode, and a second vertical wall extending from the rim to the top surface of a surrounding dielectric.

    摘要翻译: 通过使用化学机械抛光去除不想要的材料的镶嵌工艺来消除在铁电电容器中蚀刻贵金属的难度,导致形成在电介质的孔中的下电极,具有平坦的中心部分和从 围绕电介质顶表面的中心部分; 以及形成在两级孔中的上电极,使得上电极结构具有平坦的中心部分,从中心部分延伸到围绕中心部分并在下电极的壁上延伸的边缘的第一垂直壁, 以及从边缘延伸到周围电介质的顶表面的第二垂直壁。