摘要:
A memory storage system includes a plurality of memory storage banks and a cache in communication therewith. Both the plurality of memory storage banks and the cache further include destructive read memory storage elements configured for delayed write back scheduling thereto.
摘要:
A memory storage system is disclosed. In an exemplary embodiment, the memory storage system includes a plurality of memory storage banks and a cache in communication therewith. Both the plurality of memory storage banks and the cache further include destructive read memory storage elements.
摘要:
A column redundancy system including a column redundancy apparatus for performing a redundancy swapping operation of column elements within the individual micro-cells. The column redundancy apparatus further includes a fuse information storage device, a first bank address decoding mechanism decodes a read bank address corresponding to a first micro-cell accessed for a read operation, and a second bank address decoding mechanism decodes a write bank address corresponding to a second micro-cell accessed for a write operation. If there is at least one defective column element contained within the first micro-cell, then the column redundancy apparatus generates an internal column address corresponding to the at least one defective column element in the first micro-cell. Likewise, if there is at least one defective column element contained within the second micro-cell, then the column redundancy apparatus generates an internal column address corresponding to the at least one defective column element in the second micro-cell.
摘要:
The difficulty of etching noble metals in ferroelectric capacitors is eliminated by a damascene process that employs chemical-mechanical polishing to remove the unwanted material, resulting in a lower electrode formed in an aperture in a dielectric, having a flat central portion and a wall extending from the central portion to the top surface of the surrounding dielectric; and an upper electrode formed in a two-level aperture, so that the upper electrode structure has a flat central portion, a first vertical wall extending from the central portion to a rim surrounding the central portion and extending over the wall of the lower electrode, and a second vertical wall extending from the rim to the top surface of a surrounding dielectric.