摘要:
The present invention provides a glass composition that has excellent heat resistance and ion exchange ability and can be provided with high strength by a chemical strengthening treatment through an ion exchange. This glass composition includes, in terms of mass %: 59 to 68% of SiO2; 9.5 to 15% of Al2O3; 0 to 1% of Li2O; 3 to 18% of Na2O; 0 to 3.5% of K2O; 0 to 15% of MgO; 1 to 15% of CaO; 0 to 4.5% of SrO; 0 to 1% of BaO; 0 to 2% of TiO2; and 1 to 10% of ZrO2. The glass composition of the present invention is suitable for a glass substrate for magnetic recording media and also can be formed as a chemically strengthened glass article through an ion-exchange treatment.
摘要:
A glass composition is disclosed which has a high modulus of elasticity (Young's modulus) and a high rigidity (modulus of elasticity/specific gravity) and is capable of being effectively inhibited from bending or vibrating. Also disclosed is a substrate for information recording media, which comprises the glass composition. The glass composition comprises the following components in terms of mol %: 40 to 60% SiO2, 8 to 25% Al2O3, 2 to 20% Li2O, 0 to 5% Na2O; provided that the content of R2O (R2O=Li2O+Na2O) is from 2 to 20%, 0 to 10% TiO2, 0 to 10% ZrO2, 5 to 25% MgO, 0 to 25% CaO and 0 to 6% SrO, provided that the content of RO (RO=MgO+CaO+SrO) is from more than 15 to 40%.
摘要:
A glass substrate of the present invention for magnetic recording media having high heat resistance and easy chemical strengthening ability at once has not been obtained, which is a glass composition essentially comprising 60 to 70 wt % SiO2, 5 to 20 wt % Al2O3, 0 to 1 wt % Li2O, 3 to 18 wt % Na2O, 0 to 9 wt % K2O, 0 to 10 wt % MgO, 1 to 15 wt % CaO, 0 to 4.5 wt % SrO, 0 to 1 wt % BaO, 0 to 1 wt % TiO2 and 0 to 1 wt % ZrO2, wherein the sum of Li2O, Na2O and K2O is from 5 to 25 wt %, and the sum of MgO, CaO, SrO and BaO is from 5 to 20 wt %.
摘要:
The present invention improves a method of forming a surface unevenness using a difference in etching rates, and relaxes limitations on substrates in this method. In a method of the present invention, an uneven surface is formed by a method including applying pressure to a predetermined region in a surface of a thin film formed on a substrate, and etching a region including at least a portion of the predetermined region and at least a portion of the reminder of the surface that excludes the predetermined region. An etching rate difference within the thin film increases freedom in selecting a substrate material.
摘要:
A glass substrate for an information recording medium has an acid resistance represented by an etching rate of at most 45 nm/min. upon contact with a hydrofluoric acid having a temperature of 50° C. and a concentration of 0.1 weight %. The glass substrate has a recording surface having an average surface roughness Ra smaller than 0.3 nm.
摘要:
A glass composition is disclosed which has a high modulus of elasticity (Young's modulus) and a high rigidity (modulus of elasticity/specific gravity) and is capable of being effectively inhibited from bending or vibrating. Also disclosed is process for producing the glass composition. The glass composition comprises, in terms of mol %, 40 to 65% SiO2, 5 to 25% Al2O3, 2 to 20% Li2O, 0 to 9% Na2O, 0 to 10% TiO2, 0 to 10% ZrO2, 0 to 25% MgO, 0 to 25% CaO, and 0 to 10% SrO, provided that the content of RO (RO=MgO+CaO+SrO) is from 2 to 40% and the sum of (Li2O)/2 and Na2O is from 1 to 10 mol %, said glass composition further containing, as clarifiers, from 0.01 to 5 mol % SnO2 and up to 0.1 mol % sulfur (S) in terms of the amount of SO3.
摘要:
A glass composition is disclosed which has a high modulus of elasticity (Young's modulus) and a high rigidity (modulus of elasticity/specific gravity) and is capable of being effectively inhibited from bending or vibrating. Also disclosed is a substrate for information recording media, which comprises the glass composition. The glass composition comprises the following components in terms of mol %: 50 to 64% SiO2, 6 to 18% Al2O3, 7 to 15% Li2O, 3 to 12% Na2O, 0 to 2% K2O, 0 to 10% TiO2, 0 to 4% ZrO2, 0 to 6% MgO, 0 to 9% CaO, and 0 to 6% SrO, provided that the content of RO (RO=MgO+CaO+SrO) is from 2 to 15%.
摘要:
A glass substrate for a display, which is formed of a glass having a light weight and having high refinability with decreasing environmental burdens, the glass comprising, by mass %, 50 to 70% of SiO2, 5 to 18% of B2O3, 10 to 25% of Al2O3, 0 to 10% of MgO, 0 to 20% of CaO, 0 to 20% of SrO, 0 to 10% of BaO, 5 to 20% of RO (in which R is at least one member selected from the group consisting of Mg, Ca, Sr and Ba), and over 0.20% but not more than 2.0% of R′2O (in which R′ is at least one member selected from the group consisting of Li, Na and K), and containing, by mass %, 0.05 to 1.5% of oxide of metal that changes in valence number in a molten glass, and substantially containing none of As2O3, Sb2O3 and PbO.
摘要翻译:一种显示器用玻璃基板,其由重量轻且具有降低的环境负荷的高可熔性的玻璃形成,所述玻璃以质量%计含有50〜70%的SiO 2,5〜18%的B 2 O 3,10〜 25%的Al 2 O 3,0〜10%的MgO,0〜20%的CaO,0〜20%的SrO,0〜10%的BaO,5〜20%的RO(其中R为选自 由Mg,Ca,Sr和Ba组成的组)和超过0.20%但不超过2.0%的R'2O(其中R'为选自Li,Na和K中的至少一种), 并且以质量%计含有熔融玻璃中价数变化的金属氧化物的0.05〜1.5%,并且基本上不含有As 2 O 3,Sb 2 O 3和PbO。
摘要:
A glass substrate for a display, which is formed of a glass having a light weight and having high refinability with decreasing environmental burdens, the glass comprising, by mass %, 50 to 70% of SiO2, 5 to 18% of B2O3, 10 to 25% of Al2O3, 0 to 10% of MgO, 0 to 20% of CaO, 0 to 20% of SrO, 0 to 10% of BaO, 5 to 20% of RO (in which R is at least one member selected from the group consisting of Mg, Ca, Sr and Ba), and over 0.20% but not more than 2.0% of R′2O (in which R′ is at least one member selected from the group consisting of Li, Na and K), and containing, by mass %, 0.05 to 1.5% of oxide of metal that changes in valence number in a molten glass, and substantially containing none of As2O3, Sb2O3 and PbO.
摘要:
The present invention improves a method of forming a surface unevenness using a difference in etching rates, and relaxes limitations on substrates in this method. In a method of the present invention, an uneven surface is formed by a method including applying pressure to a predetermined region in a surface of a thin film formed on a substrate, and etching a region including at least a portion of the predetermined region and at least a portion of the reminder of the surface that excludes the predetermined region. An etching rate difference within the thin film increases freedom in selecting a substrate material.