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    METHOD FOR REMOVING CONTAMINATION WITH FLUORINATED COMPOSITIONS
    12.
    发明申请
    METHOD FOR REMOVING CONTAMINATION WITH FLUORINATED COMPOSITIONS 审中-公开
    用氟化物组合物去除污染的方法

    公开(公告)号：US20090029274A1

    公开(公告)日：2009-01-29

    申请号：US11782766

    申请日：2007-07-25

    申请人： Erik D. Olson ,  Philip G. Clark

    发明人： Erik D. Olson ,  Philip G. Clark

    IPC分类号： C11D17/00 ,  G03G17/00

    CPC分类号： H01L21/31133 ,  G03F7/426 ,  H01L21/02071 ,  H01L21/28079 ,  H01L29/78

    摘要： A method of removing contamination from a substrate having an ion-implanted region is described. The method comprises applying a composition comprising a fluorinated solvent and a co-solvent to the substrate in an amount sufficient to assist in the removal of contamination from the substrate. As contaminant is removed, metal patterns or other desired features on the substrate remain. Additionally, the composition for removing contamination is not harmful to the user or the substrate (i.e., non-flammable and/or non caustic).

    摘要翻译： 描述了从具有离子注入区域的衬底去除污染物的方法。 该方法包括以足以帮助从衬底除去污染物的量向基材施加包含氟化溶剂和共溶剂的组合物。 当污染物被去除时，衬底上的金属图案或其它所需特征保留。 另外，用于除去污染物的组合物对使用者或基材无害（即，不可燃和/或不苛性）。

    Method and apparatus for providing mobile and other intermittent connectivity in a computing environment
    14.
    发明授权
    Method and apparatus for providing mobile and other intermittent connectivity in a computing environment 有权
    在计算环境中提供移动和其他间歇连接的方法和装置

    公开(公告)号：US06546425B1

    公开(公告)日：2003-04-08

    申请号：US09330310

    申请日：1999-06-11

    申请人： Aaron D. Hanson ,  Emil A. Sturniolo ,  Anatoly Menn ,  Erik D. Olson ,  Joseph T. Savarese

    发明人： Aaron D. Hanson ,  Emil A. Sturniolo ,  Anatoly Menn ,  Erik D. Olson ,  Joseph T. Savarese

    IPC分类号： G06F1516

    CPC分类号： H04W8/02 ,  H04L1/1809 ,  H04L1/188 ,  H04L1/1887 ,  H04L67/14 ,  H04L67/2814 ,  H04L67/2861 ,  H04L67/40 ,  H04W36/08 ,  H04W80/00 ,  H04W80/04 ,  H04W80/10 ,  H04W88/182

    摘要： A seamless solution transparently addresses the characteristics of nomadic systems, and enables existing network applications to run reliably in mobile environments. The solution extends the enterprise network, letting network managers provide mobile users with easy access to the same applications as stationary users without sacrificing reliability or centralized management. The solution combines advantages of existing wire-line network standards with emerging mobile standards to create a solution that works with existing network applications. A Mobility Management Server coupled to the mobile network maintains the state of each of any number of Mobile End Systems and handles the complex session management required to maintain persistent connections to the network and to other peer processes. If a Mobile End System becomes unreachable, suspends, or changes network address (e.g., due to roaming from one network interconnect to another), the Mobility Management Server maintains the connection to the associated peer task—allowing the Mobile End System to maintain a continuous connection even though it may temporarily lose contact with its network medium. In one example, Mobility Management Server communicates with Mobile End Systems using Remote Procedure Call and Internet Mobility Protocols.

    摘要翻译： 无缝解决方案透明地解决游牧系统的特点，并使现有的网络应用在移动环境中可靠运行。 该解决方案扩展了企业网络，让网络管理员为移动用户提供方便的访问与固定用户相同的应用程序，而不会牺牲可靠性或集中管理。 该解决方案将现有有线网络标准的优点与新兴的移动标准相结合，创造出可与现有网络应用程序配合使用的解决方案。 耦合到移动网络的移动管理服务器维护任何数量的移动终端系统中的每一个的状态，并且处理维持与网络和其他对等进程的持续连接所需的复杂会话管理。 如果移动终端系统变得无法访问，暂停或更改网络地址（例如，由于从一个网络互连漫游到另一个网络互连），则移动性管理服务器维护与相关联的对等任务的连接，从而允许移动终端系统维持连续 连接，即使它可能暂时失去与其网络媒体的接触。 在一个示例中，移动管理服务器使用远程过程调用和Internet移动协议与移动终端系统进行通信。

    Low haze wafer treatment process
    15.
    发明授权
    Low haze wafer treatment process 失效
    低雾晶片处理工艺

    公开(公告)号：US6037271A

    公开(公告)日：2000-03-14

    申请号：US176588

    申请日：1998-10-21

    申请人： Brent D. Carlson ,  Erik D. Olson ,  James R. Oikari

    发明人： Brent D. Carlson ,  Erik D. Olson ,  James R. Oikari

    IPC分类号： H01L21/00 ,  H01L21/306

    CPC分类号： H01L21/02043 ,  H01L21/02032 ,  H01L21/67051

    摘要： A process for removing a plurality of layers of different materials from a substrate having a silicon material base, at least one of said layers being a silicon oxide material and at least one other of said layers comprising a metal and the metal layer being located above the silicon oxide layer. The process includes the steps of treating the substrate with a series of chemical formulations adapted to successively remove the materials of the plurality of layers until the silicon material base is exposed, the silicon oxide layer being removed by treatment with HF, wherein the HF treatment to remove said silicon oxide layer comprises exposing the substrate to:initially, a dilute HF solution of no more than 1.0% concentration;subsequently, a concentrated HF solution of from about 2.5% to about 10% concentration; andfinally, a dilute HF solution of no more than 1.0% concentration.

    摘要翻译： 一种用于从具有硅材料基底的衬底去除多层不同材料的方法，所述层中的至少一个是氧化硅材料，并且所述层中的至少一个包括金属和金属层位于 氧化硅层。 该方法包括以下步骤：用一系列适用于连续除去多个层的材料的化学配方处理衬底，直到硅材料基底露出，氧化硅层通过HF处理除去，其中HF处理 去除所述氧化硅层包括将基底暴露于：最初，浓度不超过1.0％的稀HF溶液; 随后，浓度为约2.5％至约10％的浓缩HF溶液; 最后，浓度不超过1.0％的稀HF溶液。