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15 条记录 (耗时 0.023 秒)

    Low haze wafer treatment process
    1.
    发明授权
    Low haze wafer treatment process 失效
    低雾晶片处理工艺

    公开(公告)号：US6037271A

    公开(公告)日：2000-03-14

    申请号：US176588

    申请日：1998-10-21

    申请人： Brent D. Carlson ,  Erik D. Olson ,  James R. Oikari

    发明人： Brent D. Carlson ,  Erik D. Olson ,  James R. Oikari

    IPC分类号： H01L21/00 ,  H01L21/306

    CPC分类号： H01L21/02043 ,  H01L21/02032 ,  H01L21/67051

    摘要： A process for removing a plurality of layers of different materials from a substrate having a silicon material base, at least one of said layers being a silicon oxide material and at least one other of said layers comprising a metal and the metal layer being located above the silicon oxide layer. The process includes the steps of treating the substrate with a series of chemical formulations adapted to successively remove the materials of the plurality of layers until the silicon material base is exposed, the silicon oxide layer being removed by treatment with HF, wherein the HF treatment to remove said silicon oxide layer comprises exposing the substrate to:initially, a dilute HF solution of no more than 1.0% concentration;subsequently, a concentrated HF solution of from about 2.5% to about 10% concentration; andfinally, a dilute HF solution of no more than 1.0% concentration.

    摘要翻译： 一种用于从具有硅材料基底的衬底去除多层不同材料的方法，所述层中的至少一个是氧化硅材料，并且所述层中的至少一个包括金属和金属层位于 氧化硅层。 该方法包括以下步骤：用一系列适用于连续除去多个层的材料的化学配方处理衬底，直到硅材料基底露出，氧化硅层通过HF处理除去，其中HF处理 去除所述氧化硅层包括将基底暴露于：最初，浓度不超过1.0％的稀HF溶液; 随后，浓度为约2.5％至约10％的浓缩HF溶液; 最后，浓度不超过1.0％的稀HF溶液。

    Process for enhanced photoresist removal in conjunction with various methods and chemistries
    2.
    发明授权
    Process for enhanced photoresist removal in conjunction with various methods and chemistries 失效
    结合各种方法和化学物质增强光致抗蚀剂去除的方法

    公开(公告)号：US5861064A

    公开(公告)日：1999-01-19

    申请号：US819670

    申请日：1997-03-17

    申请人： James R. Oikari ,  Erik D. Olson

    发明人： James R. Oikari ,  Erik D. Olson

    IPC分类号： G03F7/42 ,  H01L21/027 ,  H01L21/304 ,  H01L21/306 ,  H01L21/311 ,  B08B3/00 ,  B08B7/00 ,  C23F1/00 ,  C23G1/02

    CPC分类号： H01L21/02052 ,  H01L21/31133

    摘要： A novel method is disclosed for the removal of organic material, particularly hardened photoresist, from the surface of a substrate. Layers of organic material are removed using at least two treatment cycles, each of which includes the steps of a) applying an acid-containing composition, optionally mixed with an oxidizer, to the substrate surface, and then b) applying water to the substrate surface. The process is characterized by higher temperature spikes, shorter process times and lower chemical usage than is obtained with conventional photoresist stripping methods which do not employ repetitious treatments. The method may be practiced with spray processing equipment.

    摘要翻译： 公开了一种从衬底的表面去除有机材料，特别是硬化的光致抗蚀剂的新方法。 使用至少两个处理循环去除有机材料层，每个处理循环包括以下步骤：a）将任选与氧化剂混合的含酸组合物施加到基材表面，然后b）将水施加到基材表面 。 该方法的特征在于比不使用重复处理的常规光刻胶剥离方法获得的更高的温度峰值，更短的处理时间和更低的化学品用量。 该方法可以用喷雾处理设备来实施。

    Method and apparatus for providing mobile and other intermittent connectivity in a computing environment
    3.
    发明授权
    Method and apparatus for providing mobile and other intermittent connectivity in a computing environment 有权
    在计算环境中提供移动和其他间歇连接的方法和装置

    公开(公告)号：US09473925B2

    公开(公告)日：2016-10-18

    申请号：US11781318

    申请日：2007-07-23

    申请人： Aaron D. Hanson ,  Emil A. Sturniolo ,  Anatoly Menn ,  Erik D. Olson ,  Joseph T. Savarese

    发明人： Aaron D. Hanson ,  Emil A. Sturniolo ,  Anatoly Menn ,  Erik D. Olson ,  Joseph T. Savarese

    IPC分类号： H04W8/02 ,  H04W28/08 ,  H04W36/00 ,  H04W36/08 ,  H04W80/04 ,  H04W88/18 ,  H04L29/08

    CPC分类号： H04W8/02 ,  H04L67/14 ,  H04L67/28 ,  H04L67/2861 ,  H04W28/08 ,  H04W36/0011 ,  H04W36/08 ,  H04W80/04 ,  H04W88/182

    摘要： A seamless solution transparently addresses the characteristics of nomadic systems, and enables existing network applications to run reliably in mobile environments. A Mobility Management Server coupled to the mobile network maintains the state of each of any number of Mobile End Systems and handles the complex session management required to maintain persistent connections to the network and to other peer processes. If a Mobile End System becomes unreachable, suspends, or changes network address (e.g., due to roaming from one network interconnect to another), the Mobility Management Server maintains the connection to the associated peer task—allowing the Mobile End System to maintain a continuous connection even though it may temporarily lose contact with its network medium. An interface-based listener uses network point of attachment information supplied by a network interface to determine roaming conditions and to efficiently reestablish connection upon roaming. The Mobility Management Server can distribute lists to Mobile End Systems specifying how to contact it over disjoint networks.

    摘要翻译： 无缝解决方案透明地解决游牧系统的特点，并使现有的网络应用在移动环境中可靠运行。 耦合到移动网络的移动管理服务器维护任何数量的移动终端系统中的每一个的状态，并且处理维持与网络和其他对等进程的持续连接所需的复杂会话管理。 如果移动终端系统变得无法访问，暂停或更改网络地址（例如，由于从一个网络互连漫游到另一个网络互连），则移动性管理服务器维护与相关联的对等任务的连接，从而允许移动终端系统维持连续 连接，即使它可能暂时失去与其网络媒体的接触。 基于接口的侦听器使用由网络接口​​提供的网络连接点信息来确定漫游条件，并在漫游时有效地重新建立连接。 移动管理服务器可以将列表分发到移动终端系统，指定如何通过不相交的网络与其联系。