Scatterometry system and method for generating non-overlapping and non-truncated diffraction images

    公开(公告)号:US10209183B2

    公开(公告)日:2019-02-19

    申请号:US15650652

    申请日:2017-07-14

    Abstract: A scatterometry measurement system includes an objective lens with a central obscuration and an illumination source configured to illuminate a scatterometry target through the objective lens with a first illumination beam at a first illumination angle and a second illumination beam at a second illumination angle in which the scatterometry target includes periodic structures located in at least two layers. The objective lens collects at least one diffracted order from the first illumination beam and at least one diffracted order from the second illumination beam such that the at least one diffracted order from the first illumination beam and the at least one diffracted order from the second illumination beam have a non-overlapping distribution in a portion of an imaging pupil plane not blocked by the central obscuration.

    Fit-to-pitch overlay measurement targets
    12.
    发明授权
    Fit-to-pitch overlay measurement targets 有权
    适合间距覆盖测量目标

    公开(公告)号:US09123649B1

    公开(公告)日:2015-09-01

    申请号:US14160154

    申请日:2014-01-21

    Abstract: Various target configurations are disclosed. A target may include multiple lines spaced equally apart according to a pitch distance. The target may also include a first mark having at least one edge parallel to the lines, wherein the edge is configured to have at least one of: a periodically repetitive edge pattern having an amplitude that is a multiple of the pitch, a length that is a multiple of the pitch, or a thickness that is a multiple of the pitch. The target may further include a second mark having at least one edge parallel to the plurality of lines, wherein the edge is configured to have at least one of: a periodically repetitive edge pattern having a second amplitude that is a multiple of the pitch, a length that is a multiple of the pitch, or a thickness that is a multiple of the pitch.

    Abstract translation: 公开了各种目标结构。 目标可以包括根据间距距离间隔相等的多条线。 目标还可以包括具有平行于线路的至少一个边缘的第一标记,其中边缘被配置为具有以下至少一个:周期性重复边缘图案,其幅度是音高的倍数,长度是 间距的倍数,或者是音高倍数的厚度。 目标还可以包括具有平行于多条线的至少一个边缘的第二标记,其中边缘被配置为具有以下至少一个:周期性重复边缘图案,具有作为间距的倍数的第二幅度, 长度是音高的倍数,或者是音高倍数的厚度。

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