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公开(公告)号:US20150353795A1
公开(公告)日:2015-12-10
申请号:US14763070
申请日:2014-01-22
Applicant: KONICA MINOLTA, INC.
Inventor: Natsuki ITO , Akihiro MAEZAWA , Atsushi TAKAHASHI , Keisuke MIZOGUCHI , Chie INUI
IPC: C09K3/14
CPC classification number: C09K3/1445 , C01F17/0043 , C01P2002/60 , C01P2004/32 , C01P2004/62 , C01P2004/64 , C01P2004/80 , C01P2004/84 , C23C18/1216 , C23C18/1229
Abstract: An object of the present invention is to provide an inorganic core/shell particle to be contained in an abrasive material that contains a reduced amount of cerium, can polish harder workpieces at a high polishing rate, and can decrease the surface roughness of the workpieces. The inorganic core/shell particle P of the present invention is to be contained in an abrasive material and includes a core (1) containing a salt of at least one element selected from yttrium (Y), titanium (Ti), strontium (Sr), barium (Ba), samarium (Sm), europium (Eu), gadolinium (Gd), and terbium (Tb) and a shell (2) containing a salt of at least one element selected from these eight elements and a salt of cerium (Ce), wherein the crystallites in the shell (2) have an average diameter within a range of 4 to 30 nm.
Abstract translation: 本发明的目的在于提供一种含有少量铈的研磨材料的无机核/壳粒子,能够以高抛光速度对较硬的工件进行抛光,能够降低工件的表面粗糙度。 本发明的无机核/壳粒子P包含在研磨材料中,并且包括含有选自钇(Y),钛(Ti),锶(Sr) ,钡(Ba),钐(Sm),铕(Eu),钆(Gd)和铽(Tb)和含有选自这八元素中的至少一种元素的盐的壳(2) (Ce),其中壳(2)中的微晶的平均直径在4〜30nm的范围内。
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公开(公告)号:US20150306788A1
公开(公告)日:2015-10-29
申请号:US14379060
申请日:2013-02-14
Applicant: KONICA MINOLTA, INC.
Inventor: Yuuki NAGAI , Akihiro MAEZAWA , Atsushi TAKAHASHI
CPC classification number: B28D5/007 , B01D21/02 , B01D2221/14 , B24B57/00 , C02F11/14 , C02F2103/12 , Y02P70/179
Abstract: Technique to provide an abrasive regeneration method which, from a used abrasive, can recover an abrasive by an efficient method and can thereafter obtain a high-purity regenerated abrasive by a simple method. This abrasive regeneration method uses an abrasive comprising at least one type of abrasive selected from diamond, boron nitride, silicon carbide, alumina, alumina zirconia, zirconium oxide and cerium oxide. The abrasive regeneration involves a slurry recovery step (A) for recovering an abrasive slurry discharged from a polishing machine, a separation and concentration step (B) for adding an alkaline earth metal salt as an inorganic salt to the recovered abrasive slurry to aggregate the abrasive, and separating and concentrating the abrasive from a mother liquor, an abrasive recovery step (C) for recovering the separated and concentrated abrasive, and a second concentration step (D) for filter-treating the concentrated abrasive.
Abstract translation: 提供一种研磨再生方法,其从使用的研磨剂中可以通过有效的方法回收磨料,然后可以通过简单的方法获得高纯度再生磨料。 该磨料再生方法使用包含选自金刚石,氮化硼,碳化硅,氧化铝,氧化铝氧化锆,氧化锆和氧化铈中的至少一种类型的磨料的磨料。 研磨再生包括用于回收从抛光机排出的磨料浆料的浆料回收步骤(A),用于将回收的磨料浆料中的碱土金属盐作为无机盐添加到分离和浓缩步骤(B)中以将磨料 ,以及从母液中分离和浓缩研磨剂,用于回收分离和浓缩研磨剂的研磨回收步骤(C)和用于过滤处理浓缩磨料的第二浓缩步骤(D)。
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公开(公告)号:US20140138899A1
公开(公告)日:2014-05-22
申请号:US14083484
申请日:2013-11-19
Applicant: Konica Minolta , Inc.
Inventor: Hiroshi OYAMA , Kenji IZUMIYA , Kiyoto KOJIMA , Atsushi TAKAHASHI
IPC: B65H5/26
CPC classification number: B65H5/26 , B65H1/266 , B65H7/08 , B65H9/006 , B65H2402/10 , B65H2405/15 , B65H2405/332 , B65H2513/10 , B65H2513/42 , B65H2513/53 , B65H2801/06 , B65H2220/01 , B65H2220/02
Abstract: A paper feed apparatus is capable of correcting the skew of a sheet irrespective of a differential conveyance distance. The paper feed apparatus is provided with a first Large volume paper feed apparatus 100A having a control unit 130 which performs first correction control to correct the skew of a sheet by controlling a first conveyance unit 110 and forming a loop of the sheet P before a paper stop rollers 110d, and also performs second correction control to correct the skew of a sheet by controlling a second conveyance unit 120 and forming a loop of the sheet before a paper stop rollers 110d. In this case, the control unit 130 controls the first conveyance unit 110 and the second conveyance unit 120 in order that the skew correcting ability of the second correction control becomes greater than the skew correcting ability of the first correction control.
Abstract translation: 进纸装置能够校正纸张的歪斜,而与差分输送距离无关。 供纸装置设置有具有控制单元130的第一大容量供纸装置100A,控制单元130通过控制第一输送单元110进行第一校正控制以校正薄片的歪斜,并在纸张之前形成纸张P的回路 停止辊110d,并且还执行第二校正控制以通过控制第二输送单元120并在纸张停止辊110d之前形成纸张的环来校正纸张的歪斜。 在这种情况下,控制单元130控制第一输送单元110和第二输送单元120,以使得第二校正控制的偏斜校正能力变得大于第一校正控制的倾斜校正能力。
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