公开(公告)号：US5723206A

公开(公告)日：1998-03-03

申请号：US768635

申请日：1996-12-18

申请人： Kazumi Higashi ,  Amane Mochizuki

发明人： Kazumi Higashi ,  Amane Mochizuki

IPC分类号： B32B15/08 ,  B32B15/088 ,  B32B27/04 ,  B32B27/06 ,  B32B27/34 ,  C08G73/10 ,  H05K1/03 ,  B32B7/02

CPC分类号： B32B15/08 ,  B32B27/34 ,  C08G73/1039 ,  C08G73/1042 ,  C08G73/105 ,  C08G73/1064 ,  C08G73/1082 ,  H05K1/0346 ,  Y10T428/24967 ,  Y10T428/263 ,  Y10T428/264 ,  Y10T428/266 ,  Y10T428/269 ,  Y10T428/31681 ,  Y10T428/31721

摘要： A polyimide-metal foil composite film comprising a conductive metal foil having directly laminated on at least one surface thereof a polyimide resin layer which comprises repeating units represented by formulae (1) and (2) as described hereinabove. The polyimide-metal foil composite film can be used as a circuit substrate having excellent dimensional stability under high temperature.

摘要翻译： 一种聚酰亚胺 - 金属箔复合膜，其包含在至少一个表面上直接层叠的导电性金属箔，其具有如上所述的由式（1）和（2）表示的重复单元的聚酰亚胺树脂层。 聚酰亚胺 - 金属箔复合膜可以用作在高温下具有优异的尺寸稳定性的电路基板。

公开(公告)号：US5645979A

公开(公告)日：1997-07-08

申请号：US708938

申请日：1996-09-06

申请人： Amane Mochizuki ,  Michie Ishii ,  Masako Maeda ,  Kazumi Higashi

发明人： Amane Mochizuki ,  Michie Ishii ,  Masako Maeda ,  Kazumi Higashi

IPC分类号： C08L79/00 ,  G03F7/004 ,  G03F7/038 ,  G03F7/32 ,  G03F7/38

CPC分类号： G03F7/0045 ,  G03F7/038

摘要： A heat-resistant negative-working photoresist composition comprising a resin component having a carbodiimide unit in the molecule, and a compound capable of inducing a basic compound by irradiation with actinic rays. The photosensitive layer formed by the photoresist composition shows a sufficient sensitivity even by a lower irradiation energy and can give a sharp negative-type pattern by irradiation with actinic rays such as ultraviolet rays.

公开(公告)号：US4880895A

公开(公告)日：1989-11-14

申请号：US32643

申请日：1987-03-31

申请人： Kazumi Higashi ,  Yuzuru Noda

发明人： Kazumi Higashi ,  Yuzuru Noda

IPC分类号： C08G73/10 ,  C08L79/08 ,  G02F1/1337

CPC分类号： G02F1/133723 ,  C08G73/1032 ,  C08G73/106 ,  C08G73/1064 ,  C08L79/08

摘要： A polyamide acid solution is disclosed, comprising a polyamide acid comprising as main components at least one recurring unit selected from the recurring units of the formulae (I) to (IV) and a recurring unit of formula (V), dissolved in an organic solvent comprising as a main component an amide type polar solvent having a boiling point of 170.degree. C. or less. The solution is capable of forming a polyimide film which has colorless transparency free from coloration and strong adhesion to a substrate for liquid crystal cell enough to prevent penetration of water into interface between the substrate and film. The solution is particularly useful for forming a liquid crystal oriented film.

摘要翻译： 公开了一种聚酰胺酸溶液，其包含作为主要成分的至少一种选自式（I）至（IV）的重复单元和式（V）的重复单元）的重复单元的聚酰胺酸，其溶解于有机溶剂 包括沸点为170℃以下的酰胺型极性溶剂作为主要成分。 该溶液能够形成聚酰亚胺膜，该聚酰亚胺膜具有无色的透明性，并且对于液晶单元的基底具有很强的粘附性，足以防止水渗入基底和膜之间的界面。 该溶液对于形成液晶取向膜特别有用。