摘要:
An image display device equalizes an amount of shift in Vth of a driving element for each pixel. Provided are a light-emitting element (D1) that emits light corresponding to current flowing therethrough; a driving element (Q1) that is connected to the light-emitting element (D1) and controls light emission of the light-emitting element (D1); and a controller (U1) that detects a threshold voltage of the driving element (D1) and controls an applied voltage to the driving element (D1) based on the detected threshold voltage. The controller (U1) applies voltages for a reverse or forward bias to the driving element (D1) based on a comparison result between the threshold voltage and a predetermined threshold when the light-emitting element (D1) does not emit light.
摘要:
An image display device equalizes an amount of shift in Vth of a driving element for each pixel. Provided are a light-emitting element (D1) that emits light corresponding to current flowing therethrough; a driving element (Q1) that is connected to the light-emitting element (D1) and controls light emission of the light-emitting element (D1); and a controller (U1) that detects a threshold voltage of the driving element (D1) and controls an applied voltage to the driving element (D1) based on the detected threshold voltage. The controller (U1) applies voltages for a reverse or forward bias to the driving element (D1) based on a comparison result between the threshold voltage and a predetermined threshold when the light-emitting element (D1) does not emit light.
摘要:
A sealing layer covers more surely both of a display region and a peripheral region on a substrate. A dummy structure (36) is formed in the peripheral region (15) of the substrate. The dummy structure (36) contains, for instance, at least one of the materials constituting an organic EL display structure (18). The dummy structure (36) is located in the peripheral region so that the volume per unit area of the sealing layer (40) in the peripheral region (15) is substantially the same as that in the display region (13).
摘要:
A voltage compensation type pixel circuit of an AMOLED display device includes a driving transistor serially connected to a light emitting element between high-potential and low-potential power lines to drive the light emitting element in response to a voltage supplied to a first node, a first program transistor for supplying a data voltage of a data line to a second node in response to a scan signal of a scan line, a second program transistor for supplying a reference voltage from a reference voltage supply line to the first node in response to the scan signal of the scan line, a merge transistor for connecting the first and second nodes in response to a merge signal of a merge line, a storage capacitor connected between a third node and the second node interposed between the driving transistor and the light emitting element to store a voltage which corresponds to the data voltage in which the threshold voltage is compensated, and first and second reset transistors for initializing at least two of the first, second, and third nodes to an initialization voltage of an initialization voltage line in response to a reset signal of a reset line.
摘要:
In the liquid crystal display 10, consisting of a first substrate (12) and a second substrate (14) facing each other, either or both of the first substrate (12) and the second substrate (14) is/are disposed in a non-display region, the spacers 18 consisting of a photosensitive resin regulating the cell gaps 16 between both substrates 12 and 14, and liquid crystal 20 sandwiched between the first substrate (12) and the second substrate (14), either a dynamic hardness value or a plastic deformation hardness value is within a fixed range.
摘要:
A method of manufacturing a color liquid crystal display element. The method includes the steps of: forming coloring layers composed of a plurality of colors on a transparent substrate on which a thin film transistor structure, a gate line and a data line are formed; forming a transparent conductive film over the entire transparent substrate on which the coloring layers are formed; coating the entire surface of the transparent conductive film with a negative resist; exposing the negative resist to a light using the gate line and the data line as a photomask, the light being emitted from a light source facing a back side of the transparent substrate, the light substantially having wavelength bands excluding 390 nm to 440 nm; developing and baking the exposed negative resist; and etching and removing the transparent conductive film in a portion where the negative resist is removed.