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    Method and Apparatus for Continuous Removal of Water Vapors from Gases
    13.
    发明申请
    Method and Apparatus for Continuous Removal of Water Vapors from Gases 审中-公开

    公开(公告)号：US20180200668A1

    公开(公告)日：2018-07-19

    申请号：US15410106

    申请日：2017-01-19

    申请人： Larry Baxter ,  Aaron Sayre ,  Stephanie Burt ,  Nathan Davis

    发明人： Larry Baxter ,  Aaron Sayre ,  Stephanie Burt ,  Nathan Davis

    IPC分类号： B01D53/26 ,  B01D5/00

    CPC分类号： B01D53/263 ,  B01D5/0027 ,  B01D5/003 ,  B01D5/0054 ,  B01D5/0087 ,  B01D53/265 ,  B01D2252/103 ,  B01D2252/30 ,  B01D2252/504 ,  B01D2258/0283 ,  C10L3/106 ,  C10L2290/12 ,  C10L2290/541

    摘要： A method for continuously removing water vapor from a carrier gas is disclosed. This method includes, first, causing direct contact of the carrier gas with a liquid mixture in a separation chamber, the carrier gas condensing at a lower temperature than the water vapor. A combination of chemical effects cause the water vapor to condense, complex, or both condense and complex with the liquid mixture. The liquid mixture is chosen from the group consisting of: first, a combination of components that can be maintained in a liquid phase at a temperature below the water vapor's condensation point, whereby the water vapor condenses into the liquid mixture; second, a combination of components where at least one component forms a chemical complex with the water vapor and thereby extracts at least a portion of the water vapor from the carrier gas; and third, a combination of components that can both be maintained in a liquid phase at a temperature below the water vapor's condensation point, and wherein at least one component forms a chemical complex with the water vapor and thereby extracts at least a portion of the water vapor from the carrier gas. The liquid mixture is then reconstituted after passing through the separation chamber by a chemical separation process chosen to remove an equivalent amount of the water vapor from the liquid mixture as was removed from the carrier gas. The reconstituted liquid mixture is restored to temperature and pressure through heat exchange, compression, and expansion, as necessary, in preparation for recycling back to the separation chamber. The liquid mixture is then returned to the separation chamber. In this manner, the carrier gas leaving the exchanger has between 1% and 100% of the water vapor removed.