Abstract:
A high time-resolution ultrasensitive optical detector, using a planar waveguide leakage mode, and methods for making the detector. The detector includes a stacking with a dielectric substrate, a detection element, first and second dielectric layers, and a dielectric superstrate configured to send photon(s) into the light guide formed by the first layer. The thicknesses of the layers is chosen to enable a resonant coupling between the photon(s) and a leakage mode of the guide, the stacking having an absorption resonance linked to the leakage mode for a given polarization of the photon(s).
Abstract:
This detector is intended to detect at least one photon and comprises a dielectric substrate (30), of index nO; a detecting element (32) forming a serpentine, placed on the substrate and generating a signal using the energy of the photon(s); a dielectric grating, formed of lines of index nH, alternating with lines of index nB, avec nH>nO and nH>nB, the grating being placed above the detecting element, the set grating-element presenting a resonant absorption in a given incidence and for a given polarisation; and a superstratum (40) having a refractive index ni, this superstratum being placed above the one-dimensional dielectric grating, nH being furthermore greater than ni.
Abstract:
An ultra-sensitive optical detector with large time resolution, using a surface plasmon. The optical detector is configured to detect at least one photon, and including a dielectric substrate, and on the substrate, at least one bolometric detection component, that generates an electrical signal from the energy of received photon(s). Additionally, at least one coupling component is formed on the substrate, distinct from the detection component and including a metal component, and generates a surface plasmon by interaction with the photon(s) and guiding the plasmon right up to the detection component, which then absorbs the energy of the surface plasmon.
Abstract:
Ultrasensitive optical detector with high resolution in time, using a waveguide, and processes for manufacturing this detectorThis detector, designed to detect at least one photon, comprises a dielectric substrate (2) and at least one detection element on this substrate, designed to generate an electrical signal starting from the energy of the photon(s) received, and a guide element to guide this or these photons the energy of which is then absorbed by the detection element (4) at an absorption zone which is less than 100 nm thick. The detection element is substantially straight on the substrate and is short, and the guide element comprises a single mode light waveguide with strong confinement (6), placed on the detection element. The invention is applicable particularly to detection and localisation of operating defects in a semiconducting circuit.