公开(公告)号：US20050153212A1

公开(公告)日：2005-07-14

申请号：US10707778

申请日：2004-01-12

申请人： Mark Lavin ,  Lars Liebmann ,  Scott Mansfield ,  Maharaj Mukherjee ,  Zengqin Zhao

发明人： Mark Lavin ,  Lars Liebmann ,  Scott Mansfield ,  Maharaj Mukherjee ,  Zengqin Zhao

IPC分类号： G03C5/00 ,  G03F1/14 ,  G03F9/00 ,  G06F17/50

CPC分类号： G03F1/36

摘要： A method is disclosed for providing associated shapes of an optical lithography mask in relation to predetermined main shapes of the mask. The method includes generating simplified layout patterns from the predetermined main shapes of the mask. Such layout patterns are generated by eliminating detail of the main shapes which leads to unmanufacturable associated shapes while preserving geometrically relevant shape information. The associated shapes are then generated relative to the simplified mask patterns.

摘要翻译： 公开了一种相对于掩模的预定主要形状提供光学光刻掩模的相关形状的方法。 该方法包括从掩模的预定主要形状生成简化的布局图案。 通过消除导致不可制造的相关形状的主要形状的细节来产生这种布局图案，同时保留几何相关的形状信息。 然后相对于简化的掩模图案生成相关联的形状。

公开(公告)号：US20050091014A1

公开(公告)日：2005-04-28

申请号：US10694473

申请日：2003-10-27

申请人： Gregg Gallatin ,  Emanuel Gofman ,  Kafai Lai ,  Mark Lavin ,  Maharaj Mukherjee ,  Dov Ramm ,  Alan Rosenbluth ,  Shlomo Shlafman

发明人： Gregg Gallatin ,  Emanuel Gofman ,  Kafai Lai ,  Mark Lavin ,  Maharaj Mukherjee ,  Dov Ramm ,  Alan Rosenbluth ,  Shlomo Shlafman

IPC分类号： G03F1/08 ,  G03F1/14 ,  G03F7/20 ,  G06F17/10 ,  G06F17/50 ,  H01L21/00 ,  H01L21/027

CPC分类号： G03F1/36

摘要： Methods, and a program storage device for executing such methods, for performing model-based optical proximity correction by providing a mask matrix having a region of interest (ROI) and locating a plurality of points of interest within the mask matrix. A first polygon having a number of vertices representative of the located points of interest is computed, followed by determining a spatial relation between its vertices and the ROI. The vertices of the first polygon are then pinned to boundaries of and within the ROI such that a second polygon is formed on the ROI. The process is repeated for all vertices of the first polygon such that the second polygon is collapsed onto the ROI. This collapsed second polygon is then used to correct for optical proximity.

摘要翻译： 方法和用于执行这种方法的程序存储装置，用于通过提供具有感兴趣区域（ROI）的掩模矩阵并且在掩模矩阵内定位多个感兴趣点来执行基于模型的光学邻近校正。 计算具有代表所述定位的兴趣点的顶点数的第一多边形，然后确定其顶点和ROI之间的空间关系。 然后将第一多边形的顶点固定在ROI的边界和内部，使得在ROI上形成第二多边形。 对第一多边形的所有顶点重复该过程，使得第二多边形折叠到ROI上。 然后使用这个折叠的第二个多边形来校正光学接近度。

公开(公告)号：US07669175B2

公开(公告)日：2010-02-23

申请号：US11747485

申请日：2007-05-11

申请人： James A. Culp ,  Maharaj Mukherjee ,  Timothy G. Dunham ,  Mark Lavin

发明人： James A. Culp ,  Maharaj Mukherjee ,  Timothy G. Dunham ,  Mark Lavin

IPC分类号： G06F17/50

CPC分类号： G06F17/5068 ,  G06F2217/12 ,  Y02P90/265

摘要： A method of designing a layout for manufacturing an integrated circuit is provided, in which computationally intensive portions of the design process, such as simulation of an image transferred through a mask design, or simulation of electrical characteristics of a circuit, are performed more efficiently by only performing such computations on single instance of computational subunits that have an identical geometrical context. Thus, rather than performing such computations based on the functional layout, for which typical design process steps result in significant flattening of the functional hierarchy, and therefore increase the cost of computation, the invention performs simulations on computational subunits stored in a hierarchy based on geometrical context, which minimizes the cost of simulation. The resulting simulation results are subsequently assembled according to the functional layout.

摘要翻译： 提供了一种设计用于制造集成电路的布局的方法，其中，通过设计处理的计算密集部分（诸如通过掩模设计传送的图像的模拟）或电路的电特性的模拟被更高效地执行 仅在具有相同几何上下文的计算子单元的单个实例上执行这样的计算。 因此，不是基于功能布局执行这样的计算，而是通过典型的设计过程步骤导致功能层次结构的显着平坦化，从而增加计算成本，本发明对基于几何的层次结构存储的计算子单元进行模拟 上下文，最大限度地降低了模拟成本。 随后根据功能布局组合得到的模拟结果。

公开(公告)号：US20050091634A1

公开(公告)日：2005-04-28

申请号：US10694339

申请日：2003-10-27

申请人： Gregg Gallatin ,  Emanuel Gofman ,  Kafai Lai ,  Mark Lavin ,  Maharaj Mukherjee ,  Dov Ramm ,  Alan Rosenbluth ,  Shlomo Shlafman

发明人： Gregg Gallatin ,  Emanuel Gofman ,  Kafai Lai ,  Mark Lavin ,  Maharaj Mukherjee ,  Dov Ramm ,  Alan Rosenbluth ,  Shlomo Shlafman

IPC分类号： G03F1/08 ,  G03F1/14 ,  G03F7/20 ,  G06F17/50 ,  H01L21/027 ,  H01L21/82

CPC分类号： G03F1/36 ,  G03F1/68 ,  G06F17/5068

摘要： Methods, and program storage devices, for performing model-based optical lithography corrections by partitioning a cell array layout, having a plurality of polygons thereon, into a plurality of cells covering the layout. This layout is representative of a desired design data hierarchy. A density map is then generated corresponding to interactions between the polygons and plurality of cells, and then the densities within each cell are convolved. An interaction map is formed using the convolved densities, followed by truncating the interaction map to form a map of truncated cells. Substantially identical groupings of the truncated cells are then segregated respectively into differing ones of a plurality of buckets, whereby each of these buckets comprise a single set of identical groupings of truncated cells. A hierarchal arrangement is generated using these buckets, and the desired design data hierarchy enforced using the hierarchal arrangement to ultimately correct for optical lithography.

摘要翻译： 方法和程序存储装置，用于通过将具有多个多边形的单元阵列布局划分成覆盖布局的多个单元来执行基于模型的光学光刻校正。 该布局代表了所需的设计数据层次结构。 然后根据多边形与多个单元之间的相互作用产生密度图，然后卷积每个单元内的密度。 使用卷积密度形成交互图，然后截断交互图以形成截断单元格的图。 截短的细胞的基本相同的分组然后分别分离成多个桶中的不同的桶，由此这些桶中的每一个都包含一组相同的截断细胞组。 使用这些存储桶生成层次排列，并且使用层级排列来强制执行所需的设计数据层级，以最终校正光学光刻。

公开(公告)号：US20080059939A1

公开(公告)日：2008-03-06

申请号：US11874274

申请日：2007-10-18

申请人： Gregg Gallatin ,  Emanuel Gofman ,  Kafai Lai ,  Mark Lavin ,  Maharaj Mukherjee ,  Dov Ramm ,  Alan Rosenbluth ,  Shlomo Shlafman

发明人： Gregg Gallatin ,  Emanuel Gofman ,  Kafai Lai ,  Mark Lavin ,  Maharaj Mukherjee ,  Dov Ramm ,  Alan Rosenbluth ,  Shlomo Shlafman

IPC分类号： G06F17/50

CPC分类号： G03F1/36

摘要： Methods, and a program storage device for executing such methods, for performing model-based optical proximity correction by providing a mask matrix having a region of interest (ROI) and locating a plurality of points of interest within the mask matrix. A first polygon having a number of vertices representative of the located points of interest is computed, followed by determining a spatial relation between its vertices and the ROI. The vertices of the first polygon are then pinned to boundaries of and within the ROI such that a second polygon is formed on the ROI. The process is repeated for all vertices of the first polygon such that the second polygon is collapsed onto the ROI. This collapsed second polygon is then used to correct for optical proximity.

摘要翻译： 方法和用于执行这种方法的程序存储装置，用于通过提供具有感兴趣区域（ROI）的掩模矩阵并且在掩模矩阵内定位多个感兴趣点来执行基于模型的光学邻近校正。 计算具有代表所述定位的兴趣点的顶点数的第一多边形，然后确定其顶点和ROI之间的空间关系。 然后将第一多边形的顶点固定在ROI的边界和内部，使得在ROI上形成第二多边形。 对第一多边形的所有顶点重复该过程，使得第二多边形折叠到ROI上。 然后使用这个折叠的第二个多边形来校正光学接近度。

公开(公告)号：US20060023932A1

公开(公告)日：2006-02-02

申请号：US10710648

申请日：2004-07-27

申请人： David DeMaris ,  Mark Lavin ,  William Leipold ,  Daniel Maynard ,  Maharaj Mukherjee

发明人： David DeMaris ,  Mark Lavin ,  William Leipold ,  Daniel Maynard ,  Maharaj Mukherjee

IPC分类号： G06K9/00 ,  G06F17/50

CPC分类号： G06F17/5081 ,  G06F2217/12 ,  Y02P90/265

摘要： A system and method of synthesizing layout patterns to test an optical proximity correction algorithm. The method comprises the steps of: embodying Walsh patterns in a set of Walsh pattern matrices; processing groups of matrices from the set of Walsh pattern matrices to form a set of test matrices; mapping the set of test matrices to a test pattern set.

摘要翻译： 一种合成布局图案以测试光学邻近校正算法的系统和方法。 该方法包括以下步骤：在一组沃尔什模式矩阵中体现沃尔什模式; 从所述一组沃尔什图案矩阵中处理​​矩阵组以形成一组测试矩阵; 将测试矩阵的集合映射到测试模式集合。

公开(公告)号：US20050094863A1

公开(公告)日：2005-05-05

申请号：US10605849

申请日：2003-10-30

申请人： Bette Bergman Reuter ,  David DeMaris ,  Mark Lavin ,  William Leipold ,  Daniel Maynard ,  Maharaj Mukherjee

发明人： Bette Bergman Reuter ,  David DeMaris ,  Mark Lavin ,  William Leipold ,  Daniel Maynard ,  Maharaj Mukherjee

IPC分类号： G06K9/00 ,  G06T7/00

CPC分类号： G06T7/001 ,  G06T2207/30148

摘要： Disclosed is a method of locating systematic defects in integrated circuits. The invention first performs a preliminary extracting and index processing of the circuit design and then performs feature searching. When performing the preliminary extracting and index processing the invention establishes a window grid for the circuit design and merges basis patterns with shapes in the circuit design within each window of the window grid. The invention transforms shapes in a each window into feature vectors by finding intersections between the basis patterns and the shapes in the windows. Then, the invention clusters the feature vectors to produce an index of feature vectors. After performing the extracting and index processing, the invention performs the process of feature searching by first identifying a defect region window of the circuit layout and similarly merging basis patterns with shapes in the defect region window. This merging process can include rotating and mirroring the shapes in the defect region. The invention similarly transforms shapes in the defect region window into defect vectors by finding intersections between basis patterns and the shapes in the defect region. Then, the invention can easily find feature vectors that are similar to the defect vector using, for example, representative feature vectors from the index of feature vectors. Then, the similarities and differences between the defect vectors and the feature vectors can be analyzed.

摘要翻译： 公开了一种定位集成电路系统缺陷的方法。 本发明首先进行电路设计的初步提取和索引处理，然后执行特征搜索。 当执行初步提取和索引处理时，本发明建立了用于电路设计的窗口网格，并且将窗体网格的每个窗口内的电路设计中的形状与基本图案合并。 本发明通过在窗口中找到基本图案和形状之间的交点来将每个窗口中的形状转换为特征向量。 然后，本发明聚集特征向量以产生特征向量的索引。 在执行提取和索引处理之后，本发明通过首先识别电路布局的缺陷区域窗口并且将基本模式与缺陷区域窗口中的形状类似地合并来执行特征搜索的处理。 该合并过程可以包括旋转和镜像缺陷区域中的形状。 本发明类似地通过在缺陷区域中找到基础图案和形状之间的交点来将缺陷区域窗口中的形状转换为缺陷向量。 然后，本发明可以使用例如来自特征向量的索引的代表性特征向量容易地找到与缺陷向量相似的特征向量。 然后，可以分析缺陷向量和特征向量之间的相似性和差异。

公开(公告)号：US20050091631A1

公开(公告)日：2005-04-28

申请号：US10694466

申请日：2003-10-27

申请人： Gregg Gallatin ,  Emanuel Gofman ,  Kafai Lai ,  Mark Lavin ,  Maharaj Mukherjee ,  Dov Ramm ,  Alan Rosenbluth ,  Shlomo Shlafman

发明人： Gregg Gallatin ,  Emanuel Gofman ,  Kafai Lai ,  Mark Lavin ,  Maharaj Mukherjee ,  Dov Ramm ,  Alan Rosenbluth ,  Shlomo Shlafman

IPC分类号： G03F1/08 ,  G03F1/14 ,  H01L21/027 ,  G06F17/50

CPC分类号： G03F1/36 ,  G03F1/70

摘要： A method for calculating long-range image contributions from mask polygons. An algorithm is introduced having application to Optical Proximity Correction in optical lithography. A finite integral for each sector of a polygon replaces an infinite integral. Integrating over two triangles, rather than integrating on the full sector, achieves a finite integral. An analytical approach is presented for a power law kernel to reduce the numerical integration of a sector to an analytical expression evaluation. The mask polygon is divided into regions to calculate interaction effects, such as intermediate-range and long-range effects, by truncating the mask instead of truncating the kernel function.

摘要翻译： 一种用于从掩模多边形计算长距离图像贡献的方法。 引入了一种应用于光学光刻中的光学邻近校正的算法。 多边形的每个扇区的有限积分代替无限积分。 整合在两个三角形上，而不是整体上整合，实现了一个有限积分。 针对幂律内核提出了一种分析方法，以减少一个部门与分析表达式评估的数值整合。 掩模多边形被划分为区域，以通过截断掩码而不是截断内核函数来计算交互效应，例如中间范围和远程效果。

公开(公告)号：US20050091013A1

公开(公告)日：2005-04-28

申请号：US10694465

申请日：2003-10-27

申请人： Gregg Gallatin ,  Emanuel Gofman ,  Kafai Lai ,  Mark Lavin ,  Maharaj Mukherjee ,  Dov Ramm ,  Alan Rosenbluth ,  Shlomo Shlafman

发明人： Gregg Gallatin ,  Emanuel Gofman ,  Kafai Lai ,  Mark Lavin ,  Maharaj Mukherjee ,  Dov Ramm ,  Alan Rosenbluth ,  Shlomo Shlafman

IPC分类号： G03F1/08 ,  G03F1/14 ,  G03F7/20 ,  G06F17/10 ,  H01L21/00 ,  H01L21/027

CPC分类号： G03F7/70441 ,  G03F1/36 ,  G03F1/70 ,  G03F7/705

摘要： A first method to compute a phase map within an optical proximity correction simulation kernel utilizes simulated wavefront information from randomly generated data. A second method uses measured data from optical tools. A phase map is created by analytically embedding a randomly generated two-dimensional array of complex numbers of wavefront information, and performing an inverse Fourier Transform on the resultant array. A filtering function requires the amplitude of each element of the array to be multiplied by a Gaussian function. A power law is then applied to the array. The elements of the array are shuffled, and converted from the phasor form to real/imaginary form. A two-dimensional Fast Fourier Transform is applied. The array is then unshuffled, and converted back to phasor form.

摘要翻译： 计算光学邻近校正模拟核心内的相位图的第一种方法利用来自随机产生的数据的模拟波阵面信息。 第二种方法使用来自光学工具的测量数据。 通过分析地嵌入复数数目的波阵面信息的随机生成的二维阵列并在所得到的阵列上执行逆傅里叶变换来创建相位图。 滤波函数要求阵列的每个元素的幅度乘以高斯函数。 然后将幂律应用于阵列。 数组的元素被洗牌，并从相量形式转换为实数/虚数形式。 应用二维快速傅立叶变换。 然后数组被清洗，并转换回到相量形式。

公开(公告)号：US08949671B2

公开(公告)日：2015-02-03

申请号：US12022453

申请日：2008-01-30

申请人： Maharaj Mukherjee

发明人： Maharaj Mukherjee

IPC分类号： G06F11/00 ,  G06F11/07

CPC分类号： G06F11/0766 ,  G06F11/0718

摘要： A method is provided for diagnosing failures in an object-oriented software system. The method comprises collecting runtime diagnostic information; maintaining a record of the diagnostic information in a storage buffer; and dynamically updating the record of the diagnostic information to include a group of the diagnostic information collected over a most recent occurrence of a predetermined interval. The diagnostic information includes at least one set of call stack information for at least one currently running application and at least one set of other information. Each of the at least one set of other information is selected from a set of memory access information, a set of data access information, and a set of paging information for each currently executing process.

摘要翻译： 提供了一种用于诊断面向对象软件系统中的故障的方法。 该方法包括收集运行时诊断信息; 在存储缓冲器中保存诊断信息的记录; 动态地更新所述诊断信息的记录，以包括在预定间隔的最近出现时收集的一组诊断信息。 所述诊断信息包括用于至少一个当前运行的应用和至少一组其他信息的至少一组呼叫栈信息。 从一组存储器访问信息，一组数据访问信息和用于每个当前执行的处理的一组寻呼信息中选择至少一组其他信息中的每一个。