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公开(公告)号：US20090288569A1
公开(公告)日：2009-11-26
申请号：US12428592
申请日：2009-04-23
IPC分类号： B41C3/08
CPC分类号： G03F7/36
摘要： This invention provides an apparatus and process for forming a printing form from a photosensitive element having an exterior surface and a composition layer capable of being partially liquefied. The apparatus includes a displaceable heater for heating the composition layer, means for removing at least a portion of the composition layer from the element, and means for displacing the displaceable heater to a predetermined distance from the exterior surface. Positioning the displaceable heater at the predetermined distance assures reproducible removal of the liquefied composition from the various types of photosensitive elements that can be thermally treated in the apparatus, resulting in the printing forms having improved relief surface uniformity.
摘要翻译： 本发明提供一种用于从具有外表面和能够部分液化的组合物层的感光元件形成印刷形式的装置和方法。 该装置包括用于加热组合物层的可移位加热器，用于从元件去除组合物层的至少一部分的装置，以及用于使可移动加热器移位到距离外表面预定距离的装置。 将可置换加热器定位在预定距离处，确保液体组合物可以从设备中可以热处理的各种类型的感光元件中去除，从而使印刷形式具有改进的浮雕表面均匀性。
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公开(公告)号：US20090191483A1
公开(公告)日：2009-07-30
申请号：US12401106
申请日：2009-03-10
CPC分类号： G03F7/70858 , G03F1/003 , G03F1/68 , G03F7/2012
摘要： The invention provides a method and an apparatus for preparing a relief printing form from a photosensitive element. More specifically, this invention describes a method and an apparatus for preparing a relief form in an environment having controlled oxygen concentration during exposure to actinic radiation. The method includes forming an in-situ mask on a photosensitive element, exposing the element to actinic radiation through the in-situ mask in an environment having an inert gas and a concentration of oxygen between 190,000 and 100 ppm, and treating the exposed element to form the relief printing form having a pattern of raised surface areas.
摘要翻译： 本发明提供一种用于从感光元件制备凸版印刷版的方法和装置。 更具体地说，本发明描述了一种用于在暴露于光化辐射期间具有受控氧浓度的环境中制备浮雕形式的方法和装置。 该方法包括在感光元件上形成原位掩模，在具有惰性气体和氧浓度在190,000至100ppm之间的环境中将元件暴露于通过原位掩模的光化辐射，并将暴露的元件处理 形成具有凸起表面积的图案的凸版印刷版。
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公开(公告)号：US08241835B2
公开(公告)日：2012-08-14
申请号：US12401106
申请日：2009-03-10
CPC分类号： G03F7/70858 , G03F1/003 , G03F1/68 , G03F7/2012
摘要： A relief printing form is prepared from a photosensitive element in an environment having controlled oxygen concentration during exposure to actinic radiation. An in situ mask is formed on a photosensitive element, the element is exposed to actinic radiation through the in-situ mask in an environment having an inert gas and a concentration of oxygen between 190,000 and 100 ppm, and the exposed element is treated to form the relief printing form having a pattern of raised surface areas.
摘要翻译： 在曝光于光化辐射期间具有受控氧浓度的环境中的光敏元件制备浮雕印刷形式。 在感光元件上形成原位掩模，该元件在具有惰性气体和氧浓度在190,000至100ppm之间的环境中通过原位掩模暴露于光化辐射，并且将暴露的元件处理形成 凸版印刷形式具有凸起表面积的图案。
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14.发明申请APPARATUS AND METHOD FOR TREATING A CYLINDRICALLY-SHAPED ELEMENT HAVING A CLAMP ASSEMBLY 审中-公开用于处理具有夹紧组件的圆柱形元件的装置和方法公开(公告)号：US20090297715A1
公开(公告)日：2009-12-03
申请号：US12431780
申请日：2009-04-29
申请人： HELMUT LUETKE , Carl Bernard Arnold , Soeren Joergensen , Andreas Koch , Robert A. McMillen , Ib Vestergaard
发明人： HELMUT LUETKE , Carl Bernard Arnold , Soeren Joergensen , Andreas Koch , Robert A. McMillen , Ib Vestergaard
CPC分类号： G03F7/34
摘要： The invention relates to an apparatus and process for treating a cylindrically-shaped element that includes means for supporting the element by contacting an interior surface of the element, means for providing a treatment medium adjacent an exterior surface of the element opposite the interior surface, and clamping means for biasing the supporting means to a preset position at one end thereof and adapted to open and close around the supporting means, or, clamping means for biasing the providing means to a preset position at one end thereof and adapted to open and close around the supporting means.
摘要翻译： 本发明涉及一种用于处理圆柱形元件的装置和方法，该装置和方法包括用于通过接触该元件的内表面来支撑该元件的装置，用于提供邻近与该内表面相对的该元件的外表面的处理介质的装置，以及 用于将支撑装置偏压到其一端处的预设位置并适于围绕支撑装置打开和关闭的夹紧装置，或用于将提供装置偏压到其一端处的预设位置并适于围绕 支持手段。
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公开(公告)号：US4717639A
公开(公告)日：1988-01-05
申请号：US805525
申请日：1985-12-06
IPC分类号： B41N1/24 , G03F7/26 , G03G13/26 , H05K3/00 , H05K3/06 , H05K3/10 , H05K3/28 , G03G13/20 , B05D3/02 , B05D3/10 , B05D5/12
CPC分类号： G03G13/26 , H05K3/0079 , H05K2203/1105 , H05K2203/1355 , H05K3/061 , H05K3/108 , H05K3/28
摘要： Process for formation of a hardened, insoluble or crosslinked stencil or resist image on a substrate, e.g., having a metal surface such as copper, and modifying the substrate or image surface comprising:A. forming an image on the substrate by applying a solvent-soluble thermoplastic copolymer of ethylene and .alpha.,.beta.-ethylenically unsaturated acid having an acid number of at least about 30, the copolymer reacting thermochemically with the substrate;B. fusing at a temperature and for a duration to induce the thermochemical reaction at a rate sufficient to partially insolubilize, harden or crosslink the polymeric image and adhere the polymeric image to the substrate surface to facilitate subsequent removal therefrom;C. modifying the uncovered substrate surface or the polymeric image surface, e.g., etching, plating, depositing, soldering; andD. removing the polymeric image.The image can be formed on the substrate by printing, electrostatic means, etc. The image may comprise particulate material having a plurality of fibers. The process is useful in making conductive printed circuits, chemical milling, etc.
摘要翻译： 在基材上形成硬化的，不溶的或交联的模板或抗蚀剂图像的方法，例如具有诸如铜的金属表面，以及修饰基材或图像表面，包括：A.通过涂布溶剂 - 乙烯和α，β-乙烯不饱和酸的可溶性热塑性共聚物，其酸值至少约为30，该共聚物与底物热化学反应; B.在温度和持续时间下融化以以足以部分使不透水化，硬化或交联聚合物图像并将聚合物图像粘附到基材表面以便于随后从其中除去的速率引发热化学反应; C.修改未覆盖的基底表面或聚合物图像表面，例如蚀刻，电镀，沉积，焊接; 和D.去除聚合物图像。 图像可以通过印刷，静电装置等在基板上形成。图像可以包括具有多根纤维的颗粒材料。 该工艺可用于制造导电印刷电路，化学铣削等
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