摘要:
A method of making a relief image printing element from a photosensitive printing blank is provided. A photosensitive printing blank with a laser ablatable layer disposed on at least one photocurable layer is ablated with a laser to create an in situ mask. The printing blank is then exposed to at least one source of actinic radiation through the in situ mask to selectively cross link and cure portions of the photo curable layer. Diffusion of oxygen into the at least one photocurable layer is limited during the exposing step and preferably at least one of the type, power and incident angle of illumination of the at least one source of actinic radiation is altered during the exposure step. The resulting relief image comprises dots and a dot shape that provide optimal print performance on various substrates, including corrugated board.
摘要:
A continuous flow projection lithography system to form microstructures using an optical array incorporated in a continuous coating process is provided. A mask is placed at a distance from the array. Each element of the array projects one image of the mask onto a substrate, effectively forming an array thereon. A coating process allows flows that can be used to define functional regions of particles or supporting layers that prevent adhesion of crosslinked polymers to surfaces.
摘要:
A method for making a microstructured tool having interspersed topographies, and for producing articles therefrom, includes modifying a molding tool, by coating a radiation curable resin (430) on the first microstructured surface of the molding tool (490), contacting a second molding tool (480) having a second microstructured surface against the radiation curable resin (430) coated on the first microstructured surface of the first molding tool (490), exposing the radiation curable resin to a patterned (450,451,452) irradiation (440), separating the second molding tool (480) from the partially cured resin, and then removing non-irradiated radiation curable resin (region 432) from the molding tool (490) to provide a modified microstructured surface (region 431) on the molding tool. Articles having discontinuous or different microstructural features are also claimed.
摘要:
Synthesis of monodisperse PEG-based microparticles with stable coupling chemistries. Biomolecules are conjugated to monodisperse PEG microparticles using non-amine chemistries, such as sulfhydryl groups, azide, or alkyne-based chemistries.
摘要:
The present invention provides a mold including a pattern to be transferred to a resin coated on a substrate, by performing an imprint process, the mold comprising a first portion including a first surface which include a pattern portion provided with the pattern and a peripheral portion surrounding the pattern portion, and a second surface which is opposite to the first surface, and a second portion which surrounds the first portion and is thicker than the first portion, wherein a concave portion is formed by the second surface of the first portion and an inner surface of the second portion, and the concave portion is provided with a light-shielding portion in a region on an opposite side to the peripheral portion.
摘要:
A continuous flow projection lithography system to form microstructures using an optical array incorporated in a continuous coating process is provided. A mask is placed at a distance from the array. Each element of the array projects one image of the mask onto a substrate, effectively forming an array thereon. A coating process allows flows that can be used to define functional regions of particles or supporting layers that prevent adhesion of crosslinked polymers to surfaces.
摘要:
A method of making a relief printing element in a liquid photopolymer platemaking process is described. The method comprises the steps of: (a) selectively exposing the liquid photopolymer to actinic radiation through a negative to crosslink and cure portions of the liquid photopolymer; and (b) reclaiming uncured portions of the liquid photopolymer to be reused in the platemaking process. The step of reclaiming uncured portions of the liquid photopolymer comprises (i) heating the printing element to decrease the viscosity of the uncured liquid photopolymer; and (ii) removing uncured liquid photopolymer from the surface of the relief image printing element so that recovery of uncured liquid photopolymer from the surface of the relief image printing element is enhanced.
摘要:
An apparatus, a method, and a plate made by the method, e.g., using the apparatus. The apparatus includes a light tunnel of light reflective walls with polygonal cross-section like a kaleidoscope, and a light source, located at one end to produce light radiation to the inside of the light tunnel towards the other end. Light entering the light tunnel towards an inner reflective surface of a wall is reflected off the inner reflective surface so that it can emerge from the other end to cure a plate having photo-curable material thereon.
摘要:
The present invention relates to a color printed liquid permeable laminated structure comprising a first liquid permeable layer and a second liquid permeable layer, the first layer is color printed on at least one of its surfaces prior to being laminated to the second layer and stabilizing the laminated structure with a bonding means. These color printed laminated structures are particularly suitable for use in disposable absorbent articles for feminine protection, typically as so called ‘secondary’ topsheet in face to face relation with so called ‘primary’ topsheet, through which they are visible.
摘要:
The invention provides a method and an apparatus for preparing a relief printing form from a photosensitive element. More specifically, this invention describes a method and an apparatus for preparing a relief form in an environment having controlled oxygen concentration during exposure to actinic radiation. The method includes forming an in-situ mask on a photosensitive element, exposing the element to actinic radiation through the in-situ mask in an environment having an inert gas and a concentration of oxygen between 190,000 and 100 ppm, and treating the exposed element to form the relief printing form having a pattern of raised surface areas.