MOLD
    5.
    发明申请
    MOLD 审中-公开
    模子

    公开(公告)号:US20150004275A1

    公开(公告)日:2015-01-01

    申请号:US14311759

    申请日:2014-06-23

    IPC分类号: G03F7/00

    摘要: The present invention provides a mold including a pattern to be transferred to a resin coated on a substrate, by performing an imprint process, the mold comprising a first portion including a first surface which include a pattern portion provided with the pattern and a peripheral portion surrounding the pattern portion, and a second surface which is opposite to the first surface, and a second portion which surrounds the first portion and is thicker than the first portion, wherein a concave portion is formed by the second surface of the first portion and an inner surface of the second portion, and the concave portion is provided with a light-shielding portion in a region on an opposite side to the peripheral portion.

    摘要翻译: 本发明提供了一种模具,其包括通过进行压印处理而转印到涂覆在树脂上的树脂的图案,该模具包括第一部分,第一部分包括第一表面,第一表面包括设置有图案的图案部分和围绕 图案部分和与第一表面相对的第二表面,以及包围第一部分并且比第一部分厚的第二部分,其中凹部由第一部分的第二表面形成,并且内部 第二部分的表面,并且凹部在与周边部分相对的一侧的区域中设置有遮光部分。

    A FLOW LITHOGRAPHY TECHNIQUE TO FORM MICROSTRUCTURES USING OPTICAL ARRAYS
    6.
    发明申请
    A FLOW LITHOGRAPHY TECHNIQUE TO FORM MICROSTRUCTURES USING OPTICAL ARRAYS 有权
    使用光学阵列形成微结构的流动平移技术

    公开(公告)号:US20140268077A1

    公开(公告)日:2014-09-18

    申请号:US13835631

    申请日:2013-03-15

    IPC分类号: G03F7/20

    摘要: A continuous flow projection lithography system to form microstructures using an optical array incorporated in a continuous coating process is provided. A mask is placed at a distance from the array. Each element of the array projects one image of the mask onto a substrate, effectively forming an array thereon. A coating process allows flows that can be used to define functional regions of particles or supporting layers that prevent adhesion of crosslinked polymers to surfaces.

    摘要翻译: 提供了一种使用结合在连续涂布工艺中的光学阵列来形成微结构的连续流动投影光刻系统。 将掩模放置在离阵列一定距离处。 阵列的每个元素将掩模的一个图像投射到基板上,从而有效地在其上形成阵列。 涂覆工艺允许可用于限定防止交联聚合物粘附到表面的颗粒或支撑层的功能区域的流动。

    Liquid Platemaking Process
    7.
    发明申请
    Liquid Platemaking Process 有权
    液体制版工艺

    公开(公告)号:US20130316290A1

    公开(公告)日:2013-11-28

    申请号:US13477556

    申请日:2012-05-22

    申请人: Ryan W. Vest

    发明人: Ryan W. Vest

    IPC分类号: G03F7/20

    CPC分类号: G03F7/40 G03F7/2012

    摘要: A method of making a relief printing element in a liquid photopolymer platemaking process is described. The method comprises the steps of: (a) selectively exposing the liquid photopolymer to actinic radiation through a negative to crosslink and cure portions of the liquid photopolymer; and (b) reclaiming uncured portions of the liquid photopolymer to be reused in the platemaking process. The step of reclaiming uncured portions of the liquid photopolymer comprises (i) heating the printing element to decrease the viscosity of the uncured liquid photopolymer; and (ii) removing uncured liquid photopolymer from the surface of the relief image printing element so that recovery of uncured liquid photopolymer from the surface of the relief image printing element is enhanced.

    摘要翻译: 描述了在液体光聚合物制版工艺中制备凸版印刷元件的方法。 该方法包括以下步骤:(a)通过负极将液体光聚合物选择性地暴露于光化辐射以交联和固化液态光聚合物的一部分; 和(b)回收在制版过程中待再利用的液体光聚合物的未固化部分。 回收液态光聚合物的未固化部分的步骤包括(i)加热印刷元件以降低未固化的液体光聚合物的粘度; 和(ii)从浮雕图像印刷元件的表面除去未固化的液体光聚合物,从而提高了从浮雕图像打印元件的表面回收未固化的液体光聚合物。

    Curing of photo-curable printing plates using a light tunnel of mirrored walls and having a polygonal cross-section like a kaleidoscope
    8.
    发明授权
    Curing of photo-curable printing plates using a light tunnel of mirrored walls and having a polygonal cross-section like a kaleidoscope 有权
    使用镜面壁的光通道固化光固化印版,并具有像万花筒的多边形横截面

    公开(公告)号:US08578854B2

    公开(公告)日:2013-11-12

    申请号:US12467055

    申请日:2009-05-15

    申请人: Wolfgang Sievers

    发明人: Wolfgang Sievers

    IPC分类号: G03F7/207

    摘要: An apparatus, a method, and a plate made by the method, e.g., using the apparatus. The apparatus includes a light tunnel of light reflective walls with polygonal cross-section like a kaleidoscope, and a light source, located at one end to produce light radiation to the inside of the light tunnel towards the other end. Light entering the light tunnel towards an inner reflective surface of a wall is reflected off the inner reflective surface so that it can emerge from the other end to cure a plate having photo-curable material thereon.

    摘要翻译: 通过该方法制造的装置,方法和板,例如使用该装置。 该装置包括具有像万花筒的多边形横截面的光反射壁的光通道和位于一端的光源,以产生朝向另一端的光通道内部的光辐射。 进入光通道朝向内壁反射表面的光从内部反射表面反射出来,从而可以从另一端出来固化其上具有光固化材料的板。

    APPARATUS AND METHOD FOR PREPARING RELIEF PRINTING FORM
    10.
    发明申请
    APPARATUS AND METHOD FOR PREPARING RELIEF PRINTING FORM 有权
    制备缓解印刷形式的装置和方法

    公开(公告)号:US20130148089A1

    公开(公告)日:2013-06-13

    申请号:US13493004

    申请日:2012-06-11

    IPC分类号: G03F7/20

    摘要: The invention provides a method and an apparatus for preparing a relief printing form from a photosensitive element. More specifically, this invention describes a method and an apparatus for preparing a relief form in an environment having controlled oxygen concentration during exposure to actinic radiation. The method includes forming an in-situ mask on a photosensitive element, exposing the element to actinic radiation through the in-situ mask in an environment having an inert gas and a concentration of oxygen between 190,000 and 100 ppm, and treating the exposed element to form the relief printing form having a pattern of raised surface areas.

    摘要翻译: 本发明提供一种用于从感光元件制备凸版印刷版的方法和装置。 更具体地说,本发明描述了一种用于在暴露于光化辐射期间具有受控氧浓度的环境中制备浮雕形式的方法和装置。 该方法包括在感光元件上形成原位掩模,在具有惰性气体和氧浓度在190,000至100ppm之间的环境中将元件暴露于通过原位掩模的光化辐射,并将暴露的元件处理 形成具有凸起表面积的图案的凸版印刷版。