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    Solvent resistant polymers with improved bakeablity features
    11.
    再颁专利
    Solvent resistant polymers with improved bakeablity features 失效
    耐溶剂聚合物具有改进的可烘烤特性

    公开(公告)号：USRE41083E1

    公开(公告)日：2010-01-19

    申请号：US11190154

    申请日：2005-07-26

    Applicant: Mathias Jarek

    Inventor： Mathias Jarek

    IPC: G03F7/023

    CPC classification number: G03F7/0233 ,  C08F222/40

    Abstract: A radiation-sensitive composition for use in printing plates is described. The composition comprises: (a) at least one novolak; (b) at least one naphthoquinone diazide derivative; and (c) a copolymer comprising units A, B, and a unit C comprising a cyclic terminal urea group, wherein unit A is present in an amount of about 5 to about 50 mol % and has the formula is represented by wherein R1 is selected such that the homopolymer of A is alkali-soluble, unit B is present in an amount of about 20 to about 70 mol % and has the following formula is represented by wherein R2 is selected such that the homopolymer of B has a glass transition temperature greater than 100° C., preferably a glass transition temperature in the range from about 100 to about 380° C., and the unit C comprising a cyclic terminal urea group is present in an amount of about 10 to about 50 mol % and has the formula is represented by wherein X is a spacer group which is preferably selected from the group consisting of (a) a —(CR2)m— chain, (b) a —[CH2—CH2—O]m— chain; and (c) a —[Si(R2)—O]m— unit, wherein m is an integer greater than or equal to 1, more preferably between 2 and 12, the spacer group is connected to one of the carbon ring atoms of the cyclic urea unit or to one of the nitrogen atoms of the cyclic urea unit, and n is an integer greater than or equal to 1, more preferably between 1 and 5; and Y is a group selected from the group consisting of:  wherein each R in units A, B, and C, the —(CR2)m— chain, the —[Si(R2)—O]m— unit, and group Y represents a bond between the cyclic urea and the spacer group X, or is independently selected from hydrogen, aryl, (C1-C12) alkyl, and or halogen.

    Abstract translation: 描述了用于印版的辐射敏感组合物。 组合物包含：（a）至少一种酚醛清漆; （b）至少一种萘醌二叠氮衍生物; 和（c）包含单元A，B和包含环状末端脲基团的单元C的共聚物，其中单元A以约5至约50摩尔％的量存在并具有下式由其中R1选择 使得A的均聚物是碱溶性的，单元B的存在量为约20至约70mol％，并且由下式表示，其中R2选择为使得B的均聚物具有较高的玻璃化转变温度 优选玻璃化转变温度在约100至约380℃的范围内，并且包含环状末端脲基团的单元C的存在量为约10至约50摩尔％，并且具有 式中X为间隔基，优选选自（a）a - （CR 2）m-链，（b）a - [CH 2 -CH 2 -O] m-链; 和（c）a- [Si（R 2）-O] m - 单元，其中m是大于或等于1的整数，更优选在2和12之间，间隔基连接到碳原子之一 环脲单元或环脲单元的氮原子之一，n为大于或等于1，更优选为1至5的整数; 并且Y是选自下组的基团：其中单元A，B和C中的每个R， - （CR 2）m-链， - [Si（R 2）-O] m - 单元和Y基团 表示环状脲和间隔基X之间的键，或独立地选自氢，芳基，（C1-C12）烷基和/或卤素。

    Solvent resistant polymers with improved bakeability features
    13.
    发明授权
    Solvent resistant polymers with improved bakeability features 有权
    具有改善烘烤性能的耐溶剂聚合物

    公开(公告)号：US06645689B2

    公开(公告)日：2003-11-11

    申请号：US10096651

    申请日：2002-03-13

    Applicant: Mathias Jarek

    Inventor： Mathias Jarek

    IPC: G03F7023

    CPC classification number: G03F7/0233 ,  C08F222/40

    Abstract: A radiation-sensitive composition for use in printing plates is described. The composition comprises: (a) at least one novolak; (b) at least one naphthoquinone diazide derivative; and (c) a copolymer comprising units A, B, and a unit C comprising a cyclic terminal urea group, wherein unit A is present in an amount of about 5 to about 50 mol % and has the formula wherein R1 is selected such that the homopolymer of A is alkali-soluble, unit B is present in an amount of about 20 to about 70 mol % and has the following formula wherein R2 is selected such that the homopolymer of B has a glass transition temperature greater than 100° C., preferably a glass transition temperature in the range from about 100 to about 380° C., and the unit C comprising a cyclic terminal urea group is present in an amount of about 10 to about 50 mol % and has the formula wherein X is a spacer group which is preferably selected from the group consisting of (a) a —(CR2)m— chain, (b) a —[CH2—CH2—O]m— chain; and (c) a —[Si(R2)—O]m— unit, wherein m is an integer greater than or equal to 1, more preferably between 2 and 12, the spacer group is connected to one of the carbon ring atoms of the cyclic urea unit or to one of the nitrogen atoms of the cyclic urea unit, and n is an integer greater than or equal to 1, more preferably between 1 and 5; and Y is a group selected from the group consisting of:  and  wherein each R in units A, B, and C, the —(CR2)m— chain, the —[Si(R2)—O]m— unit, and group Y is independently selected from hydrogen, aryl, (C1-C12) alkyl, and halogen.

    Abstract translation: 描述了用于印版的辐射敏感组合物。 组合物包含：（a）至少一种酚醛清漆; （b）至少一种萘醌二叠氮衍生物; 和（c）包含单元A，B和包含环状末端脲基团的单元C的共聚物，其中单元A以约5至约50摩尔％的量存在并且具有式 A的均聚物是碱溶性的，单元B的存在量为约20至约70mol％，并且具有以下化学式R 2，使得B的均聚物具有大于100的玻璃化转变温度 优选玻璃化转变温度在约100至约380℃的范围内，并且包含环状末端脲基团的单元C的存在量为约10至约50摩尔％，并且具有式 是优选选自（a）a - （CR 2）m-链，（b）a - [CH 2 -CH 2 -O] m - 链的间隔基; 和（c）a- [Si（R 2）-O] m - 单元，其中m是大于或等于1的整数，更优选在2和12之间，间隔基连接到碳原子之一 环脲单元或环脲单元的氮原子之一，n为大于或等于1，更优选为1至5的整数; 且Y为选自以下的基团：其中，单元A，B和C各自的R， - （CR 2）m - 链， - [Si（R 2）-O] m - 单元和Y基团是 独立地选自氢，芳基，（C1-C12）烷基和卤素。

    NEGATIVE-WORKING LITHOGRAPHIC PRINTING PLATE PRECURSORS
    14.
    发明申请
    NEGATIVE-WORKING LITHOGRAPHIC PRINTING PLATE PRECURSORS 有权
    负离子平版印刷机前驱板

    公开(公告)号：US20130323643A1

    公开(公告)日：2013-12-05

    申请号：US13482151

    申请日：2012-05-29

    Applicant: Domenico Balbinot ,  Mathias Jarek

    Inventor： Domenico Balbinot ,  Mathias Jarek

    IPC: G03F7/11 ,  G03F7/20

    CPC classification number: B41C1/1016 ,  B41C2201/02 ,  B41C2201/14 ,  B41C2210/04 ,  B41C2210/06 ,  B41C2210/10 ,  B41C2210/22 ,  B41C2210/24 ,  G03F7/027 ,  G03F7/092

    Abstract: Negative-working lithographic printing plate precursor a negative-working imagable layer and an outermost water-soluble overcoat layer that is disposed directly on the negative-working imagable layer. The outermost water-soluble overcoat layer comprises: (1) one or more film-forming water-soluble polymeric binders, and (2) organic wax particles dispersed therein. The organic wax particles have an average largest dimension of at least 0.05 μm and up to and including 0.7 μm, as determined from a scanning electron micrographic of the dried outermost water-soluble overcoat layer. Useful organic wax particles include fluorinated or non-fluorinated hydrocarbon wax particles.

    Abstract translation: 负性平版印刷版前驱物是负作用的成像层和最外层的水溶性外涂层，其直接设置在负性可成像层上。 最外面的水溶性外涂层包括：（1）一种或多种成膜水溶性聚合物粘合剂，和（2）分散在其中的有机蜡颗粒。 有机蜡颗粒的平均最大尺寸为至少0.05μm，并且至多并包括0.7μm，由干燥的最外层水溶性外涂层的扫描电子显微镜确定。 有用的有机蜡颗粒包括氟化或非氟化烃蜡颗粒。

    PREPARING LITHOGRAPHIC PRINTING PLATES
    16.
    发明申请
    PREPARING LITHOGRAPHIC PRINTING PLATES 审中-公开
    制备平版印刷版

    公开(公告)号：US20120199028A1

    公开(公告)日：2012-08-09

    申请号：US13022714

    申请日：2011-02-08

    Applicant: Mathias Jarek ,  Domenico Balbinot

    Inventor： Mathias Jarek ,  Domenico Balbinot

    IPC: B41N3/00 ,  G03F7/26

    CPC classification number: B41N3/08 ,  B41C2201/02 ,  B41C2210/04 ,  G03F7/027 ,  G03F7/305 ,  G03F7/322

    Abstract: Negative-working lithographic printing plate precursors can be imaged and then processed using a single processing solution in a processing apparatus without rinsing or gumming before the resulting lithographic printing plates are used for printing. The single processing solution (developer) comprises at least 2.5 weight % of a nonionic surfactant having an HLB value greater than 15 and at least 5 weight % of a polar organic solvent. Processing is accomplished without replenishment and reduced sludge formation is seen at the end of the processing cycle.

    Abstract translation: 负工作平版印刷版前体可以成像，然后使用处理设备中的单一处理溶液进行成像，而不用冲洗或上胶，然后将所得平版印刷版用于印刷。 单一处理溶液（显影剂）包含至少2.5重量％的HLB值大于15的非离子表面活性剂和至少5重量％的极性有机溶剂。 处理完成而无需补充，并且在处理周期结束时可以看到减少的污泥形成。

    On-press development of imaged elements
    17.
    发明授权
    On-press development of imaged elements 失效
    成像元件的新闻发展

    公开(公告)号：US08221960B2

    公开(公告)日：2012-07-17

    申请号：US12477226

    申请日：2009-06-03

    Applicant: Domenico Balbinot ,  Mathias Jarek

    Inventor： Domenico Balbinot ,  Mathias Jarek

    IPC: G03F7/00 ,  G03F7/26 ,  G03C1/00 ,  B41F1/18

    CPC classification number: B41C1/1025 ,  B41C2201/04 ,  B41C2201/14 ,  B41C2210/04 ,  B41C2210/08 ,  B41C2210/24 ,  B41C2210/26 ,  B41C2210/264 ,  B41C2210/266 ,  Y10T428/24917

    Abstract: Images can be provided using a method comprising thermally imaging a negative-working imageable element to provide an imaged element with exposed regions and non-exposed regions, the exposed regions consisting essentially of coalesced core-shell particles, and developing the imaged element on-press to remove only the non-exposed regions using a lithographic printing ink, fountain solution, or both. The imageable element comprises a single thermally-sensitive imageable layer consisting essentially of an infrared radiation absorbing compound and core-shell particles that coalesce upon thermal imaging. The core of the core-shell particles is composed of a hydrophobic thermoplastic polymer, the shell of the core-shell particles is composed of a hydrophilic polymer that is covalently bonded to the core hydrophobic thermoplastic polymer, and the thermally-sensitive imageable layer comprises less than 10 weight % of free polymer.

    Abstract translation: 可以使用包括热成像负性可成像元件以提供具有暴露区域和非曝光区域的成像元件的方法来提供图像，所述暴露区域基本上由聚结的核 - 壳颗粒组成，并且将成像元件在印刷机上显影 以使用平版印刷油墨，润版液或两者仅去除非曝光区域。 可成像元件包括基本上由红外辐射吸收化合物和在热成像时聚结的核 - 壳颗粒组成的单一热敏可成像层。 核 - 壳颗粒的核心由疏水性热塑性聚合物组成，核 - 壳颗粒的壳由共价结合到芯疏水性热塑性聚合物上的亲水性聚合物组成，热敏可成像层包含较少 超过10重量％的游离聚合物。

    METHOD OF MAKING LITHOGRAPHIC PRINTING PLATES
    18.
    发明申请
    METHOD OF MAKING LITHOGRAPHIC PRINTING PLATES 审中-公开
    制作平版印刷版的方法

    公开(公告)号：US20110177456A1

    公开(公告)日：2011-07-21

    申请号：US12691273

    申请日：2010-01-21

    Applicant: Mathias Jarek ,  Domenico Balbinot

    Inventor： Mathias Jarek ,  Domenico Balbinot

    IPC: G03F7/20

    CPC classification number: G03F7/027 ,  G03F7/092 ,  G03F7/322

    Abstract: Lithographic printing plates can be provided by imagewise exposing a negative-working lithographic printing plate precursor comprising an aluminum-containing substrate having thereon an imageable layer, to provide exposed and non-exposed regions in the imageable layer. This imaged element is then processed to remove the non-exposed regions in the imageable layer and to gum the resulting image in a single step without an intermediate rinsing step by using an aqueous alkaline solution having a pH of at least 9. The aqueous alkaline solution includes an organic amine having a boiling point of less than 300° C., a film-forming hydrophilic polymer, and optionally an anionic or nonionic surfactant.

    Abstract translation: 可以通过成像曝光包含其上具有可成像层的含铝基底的负性平版印刷版原版以在可成像层中提供曝光和未曝光的区域来提供平版印刷版。 然后处理该成像元件以除去可成像层中的未曝光区域，并且通过使用pH为至少为9的碱性水溶液，在单步骤中对所得图像进行胶化，而不进行中间漂洗步骤。碱性水溶液 包括沸点低于300℃的有机胺，成膜亲水性聚合物和任选的阴离子或非离子表面活性剂。

    Copolymer for improving the chemical and developer resistance of positive working printing plates
    20.
    发明授权
    Copolymer for improving the chemical and developer resistance of positive working printing plates 有权
    用于提高正性印刷版的化学和显影剂抗性的共聚物

    公开(公告)号：US06525152B1

    公开(公告)日：2003-02-25

    申请号：US09630917

    申请日：2000-08-02

    Applicant: Mathias Jarek

    Inventor： Mathias Jarek

    IPC: C08F22240

    CPC classification number: C08F222/40 ,  G03F7/0233 ,  C08F220/06 ,  C08F220/56 ,  C08F2220/281 ,  C08F220/58 ,  C08F222/16 ,  C08F220/36

    Abstract: Copolymers useful in radiation-sensitive layers of printing plates have the units A, B and C wherein unit A is present in an amount of 5 to a maximum of 50 mol % and R1 and R4 are selected such that the homopolymer of A is alkali-soluble, B is present in an amount of 20-70 mol % and R2, R6 and R7 are selected such that the homopolymer of B has a high glass transition temperature, and C is present in an amount of 10-50 mol % and R3 and R5 are selected such that the homopolymer of C is water-soluble and that unit A is different from unit C.

    Abstract translation: 可用于印版的辐射敏感层的共聚物具有单元A，B和C，其中单元A以5至最大50mol％的量存在，并且选择R 1和R 4以使得A的均聚物是碱溶性的 ，B的含量为20-70摩尔％，R2，R6和R7的选择使得B的均聚物具有高玻璃化转变温度，C以10-50摩尔％的量存在，R3和 选择R5使得C的均聚物是水溶性的，并且单元A不同于单元C.

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