公开(公告)号：US10953425B2

公开(公告)日：2021-03-23

申请号：US15962580

申请日：2018-04-25

Applicant: PALO ALTO RESEARCH CENTER INCORPORATED

Inventor： Herwin Jerome Unidad ,  Ravi Neelakantan ,  Jamie Kalb ,  Elif Karatay

IPC: B05B12/32 ,  B05B12/18 ,  B05B3/02 ,  B05B7/00 ,  B05B12/26 ,  B05B3/10 ,  B01J13/00 ,  B05B9/03

Abstract: An aerosol creation system can include a pair of counter-rotating rollers configured to be positioned adjacent each other and define a nip between each other, a fluid source configured to provide a fluid to the nip, a driving element configured to drive the pair of counter-rotating rollers to rotate in counter rotation with respect to each other and cause the fluid to be drawn through the nip, and a collection shell configured to be positioned substantially around the pair of counter-rotating rollers, the collection shell having a nozzle configured to allow passage of the fluid from the nip.

公开(公告)号：US20200207015A1

公开(公告)日：2020-07-02

申请号：US16237464

申请日：2018-12-31

Applicant: Xerox Corporation ,  Palo Alto Research Center Incorporated

Inventor： Ashish V. Pattekar ,  Warren Jackson ,  Anne Plochowietz ,  Jengping Lu ,  Jamie Kalb ,  Christopher L. Chua ,  Carolyn Moorlag ,  Eugene Beh

IPC: B29C64/171 ,  B29C64/112 ,  B29C64/194 ,  B29C64/209 ,  B29C64/268 ,  B29C64/35

Abstract: A method for providing high-speed three dimensional (3D) printing is provided. The method includes producing at least one three dimensional (3D) printed part. Producing the 3D part includes continuously constructing to extend outwardly a diameter of a rotating cylindrical core via continuous deposition of a layer, and defining a first pattern in the continuously deposited layer corresponding to a cross-section of the at least one 3D printed part.

公开(公告)号：US20200173026A1

公开(公告)日：2020-06-04

申请号：US16781813

申请日：2020-02-04

Applicant: Xerox Corporation ,  Palo Alto Research Center Incorporated

Inventor： Yunda Wang ,  Sourobh Raychaudhuri ,  JengPing Lu ,  Eugene M. Chow ,  Julie A. Bert ,  David Biegelsen ,  George A. Gibson ,  Jamie Kalb

IPC: C23C16/50 ,  H01L23/00 ,  H01L21/67

Abstract: Disclosed herein are implementations of a particles-transferring system, particle transferring unit, and method of transferring particles in a pattern. In one implementation, a particles-transferring system includes a first substrate including a first surface to support particles in a pattern, particle transferring unit including an outer surface to be offset from the first surface by a first gap, and second substrate including a second surface to be offset from the outer surface by a second gap. The particle transferring unit removes the particles from the first surface in response to the particles being within the first gap, secures the particles in the pattern to the outer surface, and transports the particles in the pattern. The second substrate removes the particles in the pattern from the particle transferring unit in response to the particles being within the second gap. The particles are to be secured in the pattern to the second surface.

公开(公告)号：US10604843B2

公开(公告)日：2020-03-31

申请号：US15591959

申请日：2017-05-10

Applicant: Xerox Corporation ,  Palo Alto Research Center Incorporated

Inventor： Yunda Wang ,  Sourobh Raychaudhuri ,  JengPing Lu ,  Eugene M. Chow ,  Julie A. Bert ,  David Biegelsen ,  George A. Gibson ,  Jamie Kalb

IPC: C23C16/50 ,  H01L23/00 ,  H01L21/67

Abstract: Disclosed herein are implementations of a particles-transferring system, particle transferring unit, and method of transferring particles in a pattern. In one implementation, a particles-transferring system includes a first substrate including a first surface to support particles in a pattern, particle transferring unit including an outer surface to be offset from the first surface by a first gap, and second substrate including a second surface to be offset from the outer surface by a second gap. The particle transferring unit removes the particles from the first surface in response to the particles being within the first gap, secures the particles in the pattern to the outer surface, and transports the particles in the pattern. The second substrate removes the particles in the pattern from the particle transferring unit in response to the particles being within the second gap. The particles are to be secured in the pattern to the second surface.